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K-shell excitation dielectronic recombination resonance strengths of highly charged Helike to O-like Xe ions
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作者 Tianheng XU Gang XIONG +4 位作者 Jun XIAO Yang YANG Roger HUTTON yarning zou Ke YAO 《Plasma Science and Technology》 SCIE EI CAS CSCD 2018年第7期72-76,共5页
Dielectronic recombination is an important process in high temperature plasmas. In the present work, the KLn (n=L, M, N and O) DR resonance strengths of He-like to O-like xenon ions are measured at the Shanghai elec... Dielectronic recombination is an important process in high temperature plasmas. In the present work, the KLn (n=L, M, N and O) DR resonance strengths of He-like to O-like xenon ions are measured at the Shanghai electron beam ion trap using a fast electron beam energy scanning method. The experiment uncertainty reaches about 6% with significant improvement of statistics. A relativistic configuration interaction calculation is also made. Theoretical results agree with the experiment results within 15% in most cases. 展开更多
关键词 dielectronic recombination (DR) electron ion beam trap (EBIT)
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