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Mirror image:newfangled cell-level layout technique for single-event transient mitigation 被引量:4
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作者 Pengcheng Huang Shuming Chen +3 位作者 Zhengfa Liang Jianjun Chen Chunmei Hu yibai he 《Chinese Science Bulletin》 SCIE EI CAS 2014年第23期2850-2858,共9页
Recent years,the hardening of combinational circuits is becoming a common concern.Unlike the transistor-level hardening technique,the cell-level hardening technique,a divide and conquer strategy,can substantially make... Recent years,the hardening of combinational circuits is becoming a common concern.Unlike the transistor-level hardening technique,the cell-level hardening technique,a divide and conquer strategy,can substantially make use of some typical character in the cell-circuit module to mitigate single event transient(SET)sensitivity.The mirror image(MI)technique proposed in this paper can adequately enhance the charge sharing in those cell-circuits with stage-by-stage inverter-like structure.3D TCAD mixed-mode simulation have been performed in 65 nm twinwell bulk CMOS process,the results indicate that the MI technique can almost reduce the SET pulse width from the anterior-stage PMOS over 25%,and can mitigate the SET pulse width from the posterior-stage PMOS about 10%.The MI technique,a represent of the cell-level technique,may be the future of the hardening of combinational circuits. 展开更多
关键词 单事件 技术 细胞 瞬态 镜像 组合逻辑电路 次布 CMOS工艺
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