Reduction of Electron Leakage of AlGaN-Based Deep Ultraviolet Laser Diodes Using an Inverse-Trapezoidal Electron Blocking Layer

To improve the optical and electrical properties of AlGaN-based deep ultraviolet lasers,an inverse-trapezoidal electron blocking layer is designed.Lasers with three different structural electron blocking layers of rectangular,trapezoidal and inverse-trapezoidal structures are established.The energy band,electron concentration,electron current density,P-I and V-I characteristics,and the photoelectric conversion efficiency of different structural devices are investigated by simulation.The results show that the optical and electrical properties of the inversetrapezoidal electron blocking layer laser are better than those of rectangular and trapezoidal structures,owing to the effectively suppressed electron leakage.

Reduction of Electron Leakage in a Deep Ultraviolet Nitride Laser Diode with a Double-Tapered Electron Blocking Layer

A double-tapered AlGaN electron blocking layer (EBL) is proposed to apply in a deep ultraviolet semiconductor laser diode. Compared with the inverse double-tapered EBL, the laser with the double-tapered EBL shows a higher slope efficiency, which indicates that effective enhancement in the transportation of electrons and holes is achieved. Particularly, comparisons among the double-tapered EBL, the inverse double-tapered EBL, the singletapered EBL and the inverse single-tapered EBL show that the double-tapered EBL has the best performance in terms of current leakage.

Improvement of radiative recombination rate in deep ultraviolet laser diodes with step-like quantum barrier and aluminum-content graded electron blocking layer

The design of the active region structures,including the modifications of structures of the quantum barrier(QB)and electron blocking layer(EBL),in the deep ultraviolet(DUV)Al Ga N laser diode(LD)is investigated numerically with the Crosslight software.The analyses focus on electron and hole injection efficiency,electron leakage,hole diffusion,and radiative recombination rate.Compared with the reference QB structure,the step-like QB structure provides high radiative recombination and maximum output power.Subsequently,a comparative study is conducted on the performance characteristics with four different EBLs.For the EBL with different Al mole fraction layers,the higher Al-content Al Ga N EBL layer is located closely to the active region,leading the electron current leakage to lower,the carrier injection efficiency to increase,and the radiative recombination rate to improve.