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1.3-μm InAs/GaAs quantum dots grown on Si substrates
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作者 Fu-Hui Shao Yi Zhang +8 位作者 Xiang-Bin Su Sheng-Wen Xie Jin-Ming Shang yun-hao zhao Chen-Yuan Cai Ren-Chao Che Ying-Qiang Xu Hai-Qiao Ni Zhi-Chuan Niu 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第12期526-531,共6页
We compare the effect of InGaAs/GaAs strained-layer superlattice(SLS) with that of GaAs thick buffer layer(TBL)serving as a dislocation filter layer. The InGaAs/GaAs SLS is found to be more effective than GaAs TBL in ... We compare the effect of InGaAs/GaAs strained-layer superlattice(SLS) with that of GaAs thick buffer layer(TBL)serving as a dislocation filter layer. The InGaAs/GaAs SLS is found to be more effective than GaAs TBL in blocking the propagation of threading dislocations, which are generated at the interface between the GaAs buffer layer and the Si substrate. Through testing and analysis, we conclude that the weaker photoluminescence for quantum dots(QDs) on Si substrate is caused by the quality of capping In_(0.15)Ga_(0.85)As and upper GaAs. We also find that the periodic misfits at the interface are related to the initial stress release of GaAs islands, which guarantees that the upper layers are stress-free. 展开更多
关键词 quantum dots dislocation filter molecular beam epitaxy(MBE) silicon photonics
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