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Stress-strain Analysis of p-type GaN Films Material
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作者 LIAO Xiu-ying ZHU Yan-ling +5 位作者 YANG Xiao-bo ZHAO Hong ZHAO Wen-bo ZHOU Xun ZOU Ze-ya zeng qing-gao 《Semiconductor Photonics and Technology》 CAS 2008年第4期224-228,273,共6页
The crystal quality of p-GaN film depends on the stress-strain during the process of material growth at a certain extent. A smooth high-quality GaN epitaxial layer was grown on sapphire substrate using standard low-te... The crystal quality of p-GaN film depends on the stress-strain during the process of material growth at a certain extent. A smooth high-quality GaN epitaxial layer was grown on sapphire substrate using standard low-temperature(LT) buffer layer by MOCVD. And by testing analysis of correlative experiments,we found that the stress-strain of p-type GaN could be changed by annealing,enhancing the crystal quality. 展开更多
关键词 MOCVD GAN STRESS-STRAIN ANNEAL
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