Diamond-like films have been deposited by dc plasma chemical vapor deposition(CVD).During deposition,the characteristics of the plasma have been measured by means of the Langmuir single probe.The structure of the depo...Diamond-like films have been deposited by dc plasma chemical vapor deposition(CVD).During deposition,the characteristics of the plasma have been measured by means of the Langmuir single probe.The structure of the deposits has been studied by X-ray diffraction,Raman spectroscopy and Fourier transform infrared spectroscopy.展开更多
The continuous diamond films have been deposited on the stainless steel substrate using the hot cathode dc discharge plasma chemical vapor deposition method.The characteristics of diamond film are reported and the pre...The continuous diamond films have been deposited on the stainless steel substrate using the hot cathode dc discharge plasma chemical vapor deposition method.The characteristics of diamond film are reported and the pretreatment of stainless steel substrate before deposition is also described.展开更多
During the course of diamond growth by de plasma chemical vapor deposition and microwave plasma chemical vapor deposition,characteristics of the plasma were measured by Langmuir single probe,double probe,emission spec...During the course of diamond growth by de plasma chemical vapor deposition and microwave plasma chemical vapor deposition,characteristics of the plasma were measured by Langmuir single probe,double probe,emission spectrometer and microwave interferometer.The relationships between plasma parameters and the concentration of hydrocarbon,the power,pressure and the gas flow rate are discussed.展开更多
Diamond thin films were produced by microwave plasma chemical vapor deposition.The deposit is identified by X-ray diffraction,Raman spectroscopy and Scanning electron microscopy.During the course of diamond growth,the...Diamond thin films were produced by microwave plasma chemical vapor deposition.The deposit is identified by X-ray diffraction,Raman spectroscopy and Scanning electron microscopy.During the course of diamond growth,the characteristics of the plasma have been measured by means of the Langmuir double probe and emission spectrometer.展开更多
文摘Diamond-like films have been deposited by dc plasma chemical vapor deposition(CVD).During deposition,the characteristics of the plasma have been measured by means of the Langmuir single probe.The structure of the deposits has been studied by X-ray diffraction,Raman spectroscopy and Fourier transform infrared spectroscopy.
基金the National Natural Science Foundation of China.
文摘The continuous diamond films have been deposited on the stainless steel substrate using the hot cathode dc discharge plasma chemical vapor deposition method.The characteristics of diamond film are reported and the pretreatment of stainless steel substrate before deposition is also described.
文摘During the course of diamond growth by de plasma chemical vapor deposition and microwave plasma chemical vapor deposition,characteristics of the plasma were measured by Langmuir single probe,double probe,emission spectrometer and microwave interferometer.The relationships between plasma parameters and the concentration of hydrocarbon,the power,pressure and the gas flow rate are discussed.
文摘Diamond thin films were produced by microwave plasma chemical vapor deposition.The deposit is identified by X-ray diffraction,Raman spectroscopy and Scanning electron microscopy.During the course of diamond growth,the characteristics of the plasma have been measured by means of the Langmuir double probe and emission spectrometer.
