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无线通信数据匿名签名安全认证方法研究 被引量:3
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作者 周子涵 周安安 李颖 《计算机仿真》 北大核心 2022年第1期209-212,217,共5页
当前的通信数据匿名签名安全认证方法无法获取不同时刻匿名签名的状态参数,导致传统方法下仍存在匿名用户隐私信息泄露、匿名服务滥用及匿名性较低的问题。现提出无线通信数据匿名签名安全认证方法。通过假设法给定一个匿名签名用户,并... 当前的通信数据匿名签名安全认证方法无法获取不同时刻匿名签名的状态参数,导致传统方法下仍存在匿名用户隐私信息泄露、匿名服务滥用及匿名性较低的问题。现提出无线通信数据匿名签名安全认证方法。通过假设法给定一个匿名签名用户,并将其作为原始数据输入到可置信平台中,将输出数据作为匿名签名设置与认证步骤的已知参数。利用可置信平台与公私密钥和执行信息共同组成数据传输链的方式,分别初步设置在线、离线、单个以及聚合匿名签名,估计设置后匿名签名在各个时刻下的状态参数,与已知参数形成对比,得出各类型匿名签名下的安全认证结果。仿真结果证明,所提方法消息丢失率及数据延迟都较低,且整体耗用较小,可有效实现无线通信数据匿名签名的安全认证。 展开更多
关键词 匿名服务滥用 无线通信数据 可置信平台 公私密钥 执行信息
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Kinetics of leaching lithium from lepidolite using mixture of hydrofluoric and sulfuric acid 被引量:15
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作者 WANG Hai-dong zhou an-an +2 位作者 GUO Hui LÜMeng-hua YU Hai-zhao 《Journal of Central South University》 SCIE EI CAS CSCD 2020年第1期27-36,共10页
The fluorine-based chemical method shows great potential in leaching lithium(Li) from lepidolite. Leaching kinetics of Li in a mixture of sulfuric acid and hydrofluoric acid, which is a typical lixivant for the fluori... The fluorine-based chemical method shows great potential in leaching lithium(Li) from lepidolite. Leaching kinetics of Li in a mixture of sulfuric acid and hydrofluoric acid, which is a typical lixivant for the fluorine-based chemical method, was carried out under crucial factors such as different HF/ore ratios(1:1-3:1 g/mL) and leaching temperatures(50-85℃). The kinetics data fit well with the developed shrinking-core model, indicating that the leaching rate of Li was controlled by the chemical reaction and inner diffusion at the beginning of leaching(0-30 min) as a calculated apparent activation energy(Ea) of 20.62 kJ/mol. The inner diffusion became the rate-limiting step as the leaching continues(60-180 min). Moreover, effects of HF/ore ratio and leaching temperature on selective leaching behavior of Li, Al and Si were discussed. 90% of fluorine mainly existed as HF/F-in leaching solution, which can provide theoretical guidance for further removal or recovery of F. 展开更多
关键词 LEPIDOLITE lithium extraction fluorine-based chemical method hydrofluoric acid selective leaching leaching kinetics
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