Off-axis electron holography of manganite-based heterojunctions:Interface potential and charge distribution

The interfacial electrical potentials and charge distributions of two manganite-based heterojunctions, i.e.,La_(0.67)Ca_(0.33)MnO_3/SrTiO_3:0.05 wt% Nb(LCMO/STON) and La_(0.67)Ca_(0.33)MnO_3/LaMnO_3/SrTiO_3:0.05 wt% Nb(simplified as LCMO/LMO/STON), are studied by means of off-axis electron holography in a transmission electron microscope.The influences of buffer layer on the microstructure and magnetic properties of the LCMO films are explored. The results show that when a buffer layer of LaMnO_3 is introduced, the tensile strain between the STON substrate and LCMO film reduces, misfit dislocation density decreases near the interfaces of the heterojunctions, and a positive magnetoresistance is observed. For the LCMO/STON junction, positive and negative charges accumulate near the interface between the substrate and the film. For the LCMO/LMO/STON junction, a complex charge distribution takes place across the interface, where notable negative charges accumulate. The difference between the charge distributions near the interface may shed light on the observed generation of positive magnetoresistance in the junction with a buffer layer.

Evolution of electrical and magnetotransport properties with lattice strain in La0.7Sr0.3MnO3 film

In this paper,we investigate the effects of lattice strain on the electrical and magnetotransport properties of La0.7Sr0.3MnO3(LSMO)films by changing film thickness and substrate.For electrical properties,a resistivity upturn emerges in LSMO films,i.e.,LSMO/STO and LSMO/LSAT with small lattice strain at a low temperature,which originates from the weak localization effect.Increasing film thickness weakens the weak localization effect,resulting in the disappearance of resistivity upturn.While in LSMO films with a large lattice strain(i.e.,LSMO/LAO),an unexpected semiconductor behavior is observed due to the linear defects.For magnetotransport properties,an anomalous in-plane magnetoresistance peak(pMR)occurs at low temperatures in LSMO films with small lattice strain,which is caused by two-dimensional electron gas(2DEG).Increasing film thickness suppresses the 2DEG,which weakens the pMR.Besides,it is found that the film orientation has no influence on the formation of 2DEG.While in LSMO/LAO films,the 2DEG cannot form due to the existence of linear defects.This work can provide an efficient way to regulate the film transport properties.