Surface-sensitive measurements are crucial to many types of researches in condensed matter physics.However,it is difficult to obtain atomically flat surfaces of many single crystals by the commonly used mechanical cle...Surface-sensitive measurements are crucial to many types of researches in condensed matter physics.However,it is difficult to obtain atomically flat surfaces of many single crystals by the commonly used mechanical cleavage.We demonstrate that the grind-polish-sputter-anneal method can be used to obtain atomically flat surfaces on topological materials.Three types of surface-sensitive measurements are performed on CoSi(001)surface with dramatically improved quality of data.This method extends the research area of surface-sensitive measurements to hard-to-cleave alloys,and can be applied to irregular single crystals with selective crystalline planes.It may become a routine process of preparing atomically flat surfaces for surface-sensitive technologies.展开更多
基金Project supported by the Science Fund from the Ministry of Science and Technology of China(Grant Nos.2016YFA0401000,2016YFA0300600,2016YFA0302400,2016YFA0300504,and 2017YFA0302901)the National Natural Science Foundation of China(Grant Nos.11622435,U1832202,11474340,11822412,11574371,11674369,11574394,11774423,and 11774399)+4 种基金the Fund from the Chinese Academy of Sciences(Grant Nos.QYZDB-SSW-SLH043,XDB07000000,and XDB28000000)the Science Challenge Project,China(Grant No.TZ2016004)the K C Wong Education Foundation,China(Grant No.GJTD-2018-01)the Beijing Natural Science Foundation,China(Grant No.Z180008),the Fund from the Beijing Municipal Science and Technology Commission,China(Grant Nos.Z171100002017018,Z181100004218005,and Z181100004218001)the Fundamental Research Funds for the Central Universities,China,and the Research Funds of Renmin University of China(Grant Nos.15XNLQ07,18XNLG14,and 19XNLG17).
文摘Surface-sensitive measurements are crucial to many types of researches in condensed matter physics.However,it is difficult to obtain atomically flat surfaces of many single crystals by the commonly used mechanical cleavage.We demonstrate that the grind-polish-sputter-anneal method can be used to obtain atomically flat surfaces on topological materials.Three types of surface-sensitive measurements are performed on CoSi(001)surface with dramatically improved quality of data.This method extends the research area of surface-sensitive measurements to hard-to-cleave alloys,and can be applied to irregular single crystals with selective crystalline planes.It may become a routine process of preparing atomically flat surfaces for surface-sensitive technologies.
