Several factors affecting the ζ-potential of nanodiamonds were studied. The Chemical Mechanical Modification (CMM) of surface, different surfactants and its dosage, and inorganic ions on the ζ-potential of nanodiamo...Several factors affecting the ζ-potential of nanodiamonds were studied. The Chemical Mechanical Modification (CMM) of surface, different surfactants and its dosage, and inorganic ions on the ζ-potential of nanodiamond sample L were studied using ZETASIZER3000HS and Nexus470. Results show that the ζ-potential changes with its parameters of detonation synthesis and purification. Results also suggest that CMM and subsequent treatments employed can alter apparently the ζ-potential and that some anionic surfactants increase the absolute value of the ζ-potential in the alkaline surrounding.展开更多
The effect of different kinds of surfactants on the size distribution of nanodiamond particles in clean oil was studied. Results show that the dispersing stability of nanodiamond modified with surfactants YS-1 and SB-...The effect of different kinds of surfactants on the size distribution of nanodiamond particles in clean oil was studied. Results show that the dispersing stability of nanodiamond modified with surfactants YS-1 and SB-18 simulta-neously is much better than those modified with either of them because of synergism of the surfactants. And the particle size distribution in the system can be improved remarkably after the adoption of hyperdispersants such as SA-E and SA-F. Anchoring groups of those hyperdispersants can be bonded with the particle surface by chemical and/or hydrogen bonding and their soluble chains are well compatible with the dispersion media. As a result, the particles are uniformly distributed in the system owing to the steric stabilization. A very stable clean-oil based nanodiamond suspension with an average particle size of around 53.2 nm was prepared.展开更多
Mechanochemical Modification (MCM) of nanodiamond surface with DN-10 was studied in relation to the performance of nanodiamond in polishing quartz wafers. Results show that the modified nanodiamond is more stable in t...Mechanochemical Modification (MCM) of nanodiamond surface with DN-10 was studied in relation to the performance of nanodiamond in polishing quartz wafers. Results show that the modified nanodiamond is more stable in the pH range 8~11. A super smooth surface with an average roughness of 0.214 nm was achieved using a nanodia-mond-based slurry regulated by N-(2-hydroxyethyl)ethylenediamine. It is suggested that the principal ultra-fine polishing mechanism of quartz wafer involves atom-level removal under the synergism of chemical and mechanical actions.展开更多
文摘Several factors affecting the ζ-potential of nanodiamonds were studied. The Chemical Mechanical Modification (CMM) of surface, different surfactants and its dosage, and inorganic ions on the ζ-potential of nanodiamond sample L were studied using ZETASIZER3000HS and Nexus470. Results show that the ζ-potential changes with its parameters of detonation synthesis and purification. Results also suggest that CMM and subsequent treatments employed can alter apparently the ζ-potential and that some anionic surfactants increase the absolute value of the ζ-potential in the alkaline surrounding.
文摘The effect of different kinds of surfactants on the size distribution of nanodiamond particles in clean oil was studied. Results show that the dispersing stability of nanodiamond modified with surfactants YS-1 and SB-18 simulta-neously is much better than those modified with either of them because of synergism of the surfactants. And the particle size distribution in the system can be improved remarkably after the adoption of hyperdispersants such as SA-E and SA-F. Anchoring groups of those hyperdispersants can be bonded with the particle surface by chemical and/or hydrogen bonding and their soluble chains are well compatible with the dispersion media. As a result, the particles are uniformly distributed in the system owing to the steric stabilization. A very stable clean-oil based nanodiamond suspension with an average particle size of around 53.2 nm was prepared.
文摘Mechanochemical Modification (MCM) of nanodiamond surface with DN-10 was studied in relation to the performance of nanodiamond in polishing quartz wafers. Results show that the modified nanodiamond is more stable in the pH range 8~11. A super smooth surface with an average roughness of 0.214 nm was achieved using a nanodia-mond-based slurry regulated by N-(2-hydroxyethyl)ethylenediamine. It is suggested that the principal ultra-fine polishing mechanism of quartz wafer involves atom-level removal under the synergism of chemical and mechanical actions.
