Needles,as some of the most widely used medical devices,have been effectively applied in human disease prevention,diagnosis,treatment,and rehabilitation.Thin 1D needle can easily penetrate cells/organs by generating h...Needles,as some of the most widely used medical devices,have been effectively applied in human disease prevention,diagnosis,treatment,and rehabilitation.Thin 1D needle can easily penetrate cells/organs by generating highly localized stress with their sharp tips to achieve bioliquid sampling,biosensing,drug delivery,surgery,and other such applications.In this review,we provide an overview of multiscale needle fabrication techniques and their biomedical applications.Needles are classified as nanoneedles,microneedles and millineedles based on the needle diameter,and their fabrication techniques are highlighted.Nanoneedles bridge the inside and outside of cells,achieving intracellular electrical recording,biochemical sensing,and drug delivery.Microneedles penetrate the stratum corneum layer to detect biomarkers/bioelectricity in interstitial fluid and deliver drugs through the skin into the human circulatory system.Millineedles,including puncture,syringe,acupuncture and suture needles,are presented.Finally,conclusions and future perspectives for next-generation nano/micro/milli needles are discussed.展开更多
An approach for the wafer-level synthesis of size- and site-controlled amorphous silicon nanowires （α-SiNWs） is presented in this paper. Microscale Cu pattern arrays are precisely defined on SiO2 films with the hel...An approach for the wafer-level synthesis of size- and site-controlled amorphous silicon nanowires （α-SiNWs） is presented in this paper. Microscale Cu pattern arrays are precisely defined on SiO2 films with the help of photolithography and wet etching. Due to dewetting, Cu atoms shrink to the center of patterns during the annealing process, and react with the SiO2 film to open a diffusion channel for Si atoms to the substrate, α-SiNWs finally grow at the center of Cu patterns, and can be tuned by varying critical factors such as Cu pattern volume, SiO2 thickness, and annealing time. This offers a simple way to synthesize and accurately position a SiNW array on a large area.展开更多
基金National Natural Science Foundation of China(Grant Nos.52175446,51975133,51975597)Guangdong Basic and Applied Basic Research Foundation(Grant Nos.2021A1515011740,2019A1515011011)Shenzhen Fundamental Research Program(Grant No.JCYJ20170818163426597).
文摘Needles,as some of the most widely used medical devices,have been effectively applied in human disease prevention,diagnosis,treatment,and rehabilitation.Thin 1D needle can easily penetrate cells/organs by generating highly localized stress with their sharp tips to achieve bioliquid sampling,biosensing,drug delivery,surgery,and other such applications.In this review,we provide an overview of multiscale needle fabrication techniques and their biomedical applications.Needles are classified as nanoneedles,microneedles and millineedles based on the needle diameter,and their fabrication techniques are highlighted.Nanoneedles bridge the inside and outside of cells,achieving intracellular electrical recording,biochemical sensing,and drug delivery.Microneedles penetrate the stratum corneum layer to detect biomarkers/bioelectricity in interstitial fluid and deliver drugs through the skin into the human circulatory system.Millineedles,including puncture,syringe,acupuncture and suture needles,are presented.Finally,conclusions and future perspectives for next-generation nano/micro/milli needles are discussed.
基金This work was supported by the National Basic Research Program of China （Nos. 2011CB707601, 2011CB707605, and 2012CB934102）, the National Science and Technology Supporting Program （No. 2012BAJ11B01）, the Creative Research of National Natural Science Foundation of China （No. 61021064）, and the National Natural Science Foundation of China （Nos. 60936001, 91123037 and 81201358）.
文摘An approach for the wafer-level synthesis of size- and site-controlled amorphous silicon nanowires （α-SiNWs） is presented in this paper. Microscale Cu pattern arrays are precisely defined on SiO2 films with the help of photolithography and wet etching. Due to dewetting, Cu atoms shrink to the center of patterns during the annealing process, and react with the SiO2 film to open a diffusion channel for Si atoms to the substrate, α-SiNWs finally grow at the center of Cu patterns, and can be tuned by varying critical factors such as Cu pattern volume, SiO2 thickness, and annealing time. This offers a simple way to synthesize and accurately position a SiNW array on a large area.
