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A 65-nm 1-Gb NOR floating-gate flash memory with less than 50-ns access time
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作者 Yu Wang zongliang huo +8 位作者 Huamin Cao Ting Li Jing Liu Liyang Pan Xing Zhang Yun Yang Shenfeng Qiu Hanming Wu Ming Liu 《Chinese Science Bulletin》 SCIE EI CAS 2014年第29期3935-3942,共8页
This paper presents a 65-nm 1-Gb NOR-type floating-gate flash memory,in which the cell device and chip circuit are developed and optimized.In order to solve the speed problem of giga-level NOR flash in the deep submic... This paper presents a 65-nm 1-Gb NOR-type floating-gate flash memory,in which the cell device and chip circuit are developed and optimized.In order to solve the speed problem of giga-level NOR flash in the deep submicron process,the models of long bit-line and word-line are first given,by which the capacitive and resistive loads could be estimated.Based on that,the read path and key modules are optimized to enhance the chip access property and reliability.With the measurement results,the flash memory cell presents good endurance and retention properties,and the macro is operated with 1-ls/byte program speed and less than 50-ns read time under 3.3 V supply. 展开更多
关键词 NOR闪存 访问时间 GB 浮栅 NS 深亚微米工艺 芯片电路 速度问题
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Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review
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作者 Yi Song Chengqun Gui +2 位作者 zongliang huo S.W.Ricky Lee Sheng Liu 《International Journal of Mechanical System Dynamics》 2021年第1期35-51,共17页
As one of the most advanced and precise equipment in the world,a photo-lithography scanner is able to fabricate nanometer‐scale devices on a chip.To realize such a small dimension,the optical system is the fundamenta... As one of the most advanced and precise equipment in the world,a photo-lithography scanner is able to fabricate nanometer‐scale devices on a chip.To realize such a small dimension,the optical system is the fundamental,but the me-chanical system often becomes the bottleneck.In the photolithography,the ex-posure is a dynamic process.The accuracy and precision of the movement are determined by the mechanical system,which is even more difficult to control compared with the optical system.In the mechanical system,there are four crucial components:the reticle and wafer stages,the linear motor,the metrology system,and the control system.They work together to secure the reticle and substrate locating at the correct position,which determines the overlay and alignment per-formance in the lithography.In this paper,the principles of these components are reviewed,and the development history of the mechanical system is introduced. 展开更多
关键词 control DYNAMIC mechanical system METROLOGY PHOTOLITHOGRAPHY
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