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Dual-metal precursors for the universal growth of non-layered 2D transition metal chalcogenides with ordered cation vacancies 被引量:2
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作者 Junyang Tan zongteng zhang +16 位作者 Shengfeng Zeng Shengnan Li Jingwei Wang Rongxu Zheng Fuchen Hou Yinping Wei Yujie Sun Rongjie zhang Shilong Zhao Huiyu Nong Wenjun Chen Lin Gan Xiaolong Zou Yue Zhao Junhao Lin Bilu Liu Hui-Ming Cheng 《Science Bulletin》 SCIE EI CAS CSCD 2022年第16期1649-1658,M0004,共11页
Two-dimensional(2D)transition metal chalcogenides(TMCs)are promising for nanoelectronics and energy applications.Among them,the emerging non-layered TMCs are unique due to their unsaturated dangling bonds on the surfa... Two-dimensional(2D)transition metal chalcogenides(TMCs)are promising for nanoelectronics and energy applications.Among them,the emerging non-layered TMCs are unique due to their unsaturated dangling bonds on the surface and strong intralayer and interlayer bonding.However,the synthesis of non-layered 2D TMCs is challenging and this has made it difficult to study their structures and properties at thin thickness limit.Here,we develop a universal dual-metal precursors method to grow non-layered TMCs in which a mixture of a metal and its chloride serves as the metal source.Taking hexagonal Fe_(1-x)S as an example,the thickness of the Fe_(1-x)S flakes is down to 3 nm with a lateral size of over 100 μm.Importantly,we find ordered cation Fe vacancies in Fe_(1-x)S,which is distinct from layered TMCs like MoS_(2) where anion vacancies are commonly observed.Low-temperature transport measurements and theoretical calculations show that 2D Fe_(1-x)S is a stable semiconductor with a narrow bandgap of60 meV.In addition to Fe_(1-x)S,the method is universal in growing various non-layered 2D TMCs containing ordered cation vacancies,including Fe_(1-x)Se,Co_(1-x)S,Cr_(1-x)S,and V_(1-x)S.This work paves the way to grow and exploit properties of non-layered materials at 2D thickness limit. 展开更多
关键词 Non-layered two-dimensional materials Transition metal chalcogenides Dual-metal precursors Chemical vapor deposition Ordered cation vacancies
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