It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by u...It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.展开更多
In this work, the prerequisite and mode of electromagnetic response of Al nanof ilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was meas...In this work, the prerequisite and mode of electromagnetic response of Al nanof ilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency-film thickness relation as well. Similarity of both plasma frequency-film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms.展开更多
基金This work was supported by the National Natural Science Foundation of China(No.50071017)the National High-Tech Program of China(No.2002A A302507).
文摘It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
文摘In this work, the prerequisite and mode of electromagnetic response of Al nanof ilms to electromagnetic wave field was suggested. Reflectance, transmittance in infrared region and carrier density of the films was measured. With the carrier density of the films, the dependence of their plasma frequencies on the film thickness was obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field was set up by using the measured reflectance and transmittance, which provided plasma frequency-film thickness relation as well. Similarity of both plasma frequency-film thickness relations proved plasma resonance as a mode of electromagnetic response in Al nanofilms.
