采用阴极弧离子镀法在H13钢表面制备Ti Al Si N涂层,通过SEM对Ti Al Si N涂层表面和界面形貌进行了观察,通过EDS和XRD对其化学元素和物相进行了分析,利用划痕法测定了其结合强度,并对其界面结合机理进行了探讨。结果表明:Ti Al Si N涂...采用阴极弧离子镀法在H13钢表面制备Ti Al Si N涂层,通过SEM对Ti Al Si N涂层表面和界面形貌进行了观察,通过EDS和XRD对其化学元素和物相进行了分析,利用划痕法测定了其结合强度,并对其界面结合机理进行了探讨。结果表明:Ti Al Si N涂层表面主要成分为Ti、Al、Si和N元素,各元素分布均匀,未产生富集现象;高硬度的Ti Al N是由Al原子以置换方式取代Ti N中部分Ti原子生成的,且Ti N和Al N晶粒得到细化,形成较为致密的结构,使涂层硬度得到了提高;Ti、Al、Si、N等原子在结合界面处发生相互扩散,是形成冶金结合的主要机制;Ti Al SN涂层/H13钢体系具有较好的结合强度,用划痕法测得涂层界面结合强度为44 N。展开更多
The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under...The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere.By varying the sputtering current of the AlSi target in the range of 0-2.5 A,both the Al and Si contents in the films increased gradually from 0 to 19.1% and 11.1% (mole fraction),respectively.The influences of the AlSi cathode DC pulse current on the microstructure,phase constituents,mechanical properties,and oxidation behaviors of the Cr-Al-Si-N films were investigated systematically.The results indicate that the as-deposited Cr-Al-Si-N films possess the typical nanocomposite structure,namely the face centered cubic (Cr,Al)N nano-crystallites are embedded in the amorphous Si3N4 matrix.With increasing the Al and Si contents,the hardness of the film first increases from 20.8 GPa for the CrN film to the peak value of 29.4 GPa for the Cr0.23Al0.14Si0.07 N film,and then decreases gradually.In the meanwhile,the Cr0.23Al0.14Si0.07N film also possesses excellent high-temperature oxidation resistance that is much better than that of the CrN film at 900 or 1000 °C.展开更多
文摘采用阴极弧离子镀法在H13钢表面制备Ti Al Si N涂层,通过SEM对Ti Al Si N涂层表面和界面形貌进行了观察,通过EDS和XRD对其化学元素和物相进行了分析,利用划痕法测定了其结合强度,并对其界面结合机理进行了探讨。结果表明:Ti Al Si N涂层表面主要成分为Ti、Al、Si和N元素,各元素分布均匀,未产生富集现象;高硬度的Ti Al N是由Al原子以置换方式取代Ti N中部分Ti原子生成的,且Ti N和Al N晶粒得到细化,形成较为致密的结构,使涂层硬度得到了提高;Ti、Al、Si、N等原子在结合界面处发生相互扩散,是形成冶金结合的主要机制;Ti Al SN涂层/H13钢体系具有较好的结合强度,用划痕法测得涂层界面结合强度为44 N。
基金supported by a 2-Year Research Grant of Pusan National University,Korea
文摘The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere.By varying the sputtering current of the AlSi target in the range of 0-2.5 A,both the Al and Si contents in the films increased gradually from 0 to 19.1% and 11.1% (mole fraction),respectively.The influences of the AlSi cathode DC pulse current on the microstructure,phase constituents,mechanical properties,and oxidation behaviors of the Cr-Al-Si-N films were investigated systematically.The results indicate that the as-deposited Cr-Al-Si-N films possess the typical nanocomposite structure,namely the face centered cubic (Cr,Al)N nano-crystallites are embedded in the amorphous Si3N4 matrix.With increasing the Al and Si contents,the hardness of the film first increases from 20.8 GPa for the CrN film to the peak value of 29.4 GPa for the Cr0.23Al0.14Si0.07 N film,and then decreases gradually.In the meanwhile,the Cr0.23Al0.14Si0.07N film also possesses excellent high-temperature oxidation resistance that is much better than that of the CrN film at 900 or 1000 °C.
