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The KP Dispersion Relation Near the Δ~i Valley in Strained Si_(1-x)Ge_x/Si 被引量:1
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作者 宋建军 张鹤鸣 +2 位作者 舒斌 胡辉勇 戴显英 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第3期442-446,共5页
Based on an analysis of symmetry, the dispersion relations near the Ai valley in strained Si1-x Gex (0≤x〈0.45)/ (001), (111), (101)Si are derived using the KP method with perturbation theory. These relations... Based on an analysis of symmetry, the dispersion relations near the Ai valley in strained Si1-x Gex (0≤x〈0.45)/ (001), (111), (101)Si are derived using the KP method with perturbation theory. These relations demonstrate that △^i levels in strained Si1-x Gex are different from the △1 level in relaxed Si1-x Gex, while the longitudinal and transverse masses (m1^* and mt^* ) are unchanged under strain. The energy shift between the △^i levels and the △1 level follows the linear deformation potential theory. Finally,a description of the conduction band (CB) edge in biaxially strained layers is given. 展开更多
关键词 KP method conduction band strained SiGe
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