The effects of atomic number Z on the energy distribution of hot electrons generated by the interaction of 60fs, 130mJ, 800nm, and 7×10^17W/cm^2 laser pulses with metallic targets have been studied experimentally...The effects of atomic number Z on the energy distribution of hot electrons generated by the interaction of 60fs, 130mJ, 800nm, and 7×10^17W/cm^2 laser pulses with metallic targets have been studied experimentally. The results show that the number and the effective temperature of hot electrons increase with the atomic number Z of metallic targets, and the temperature of hot electrons are in the range of 190-230keV, which is consistent with a scaling law of hot electrons temperature.展开更多
The kink effect in current-voltage （IV） characteristic s seriously deteriorates the performance of a GaN-based HEMT. Based on a series of direct current （DC） IV measurements in a GaN-based HEMT with an AlGaN back ...The kink effect in current-voltage （IV） characteristic s seriously deteriorates the performance of a GaN-based HEMT. Based on a series of direct current （DC） IV measurements in a GaN-based HEMT with an AlGaN back barrier, a possible mechanism with electron-trapping and detrapping processes is proposed. Kink-related deep levels are activated by a high drain source voltage （Vds） and located in a GaN channel layer. Both electron trapping and detrapping processes are accomplished with the help of hot electrons from the channel by impact ionization. Moreover, the mechanism is verified by two other DC IV measurements and a model with an expression of the kink current.展开更多
当前,氮化镓(gallium nitride,GaN)高电子迁移率晶体管(high electron mobility transistors,HEMTs)器件已逐渐被广泛应用。然而,退化问题仍然是困扰其高可靠应用的重要因素。特别是开态应力下,器件的退化机理值得深入研究。文章基于实...当前,氮化镓(gallium nitride,GaN)高电子迁移率晶体管(high electron mobility transistors,HEMTs)器件已逐渐被广泛应用。然而,退化问题仍然是困扰其高可靠应用的重要因素。特别是开态应力下,器件的退化机理值得深入研究。文章基于实验测试及仿真,重点研究了氮化镓射频HEMT器件在开态应力下的退化现象与机理。研究结果表明,单一的高漏压应力并不会对器件带来明显退化,而高漏压与大的漏极电流结合则会对器件产生明显退化,这一影响重点集中在栅极与漏极之间的有源区。需要注意的是,栅极偏置电压在沟道电子进入栅下区域的过程中也起到了重要作用。开态应力下,栅极偏压形成的垂直电场会使得器件栅下区域损伤更加严重。文章的研究成果可以为氮化镓射频器件在复杂环境下的高可靠性应用提供重要支撑。展开更多
In spite of their extraordinary performance, AlGaN/GaN high electron mobility transistors （HEMTs） still lack solid reliability. Devices under accelerated DC stress tests （off-state, VDS = 0 state, and on-state step...In spite of their extraordinary performance, AlGaN/GaN high electron mobility transistors （HEMTs） still lack solid reliability. Devices under accelerated DC stress tests （off-state, VDS = 0 state, and on-state step-stress） are investigated to help us identify the degradation mechanisms of the AlGaN/GaN HEMTs. All our findings are consistent with the degradation mechanism based on crystallographic-defect formation due to the inverse piezoelectric effects in Ref. [1] （Joh J and del Alamo J A 2006 IEEE IDEM Tech. Digest p. 415）. However, under the on-state condition, the devices are suffering from both inverse piezoelectric effects and hot electron effects, and so to improve the reliability of the devices both effects should be taken into consideration.展开更多
Based on the hot electron effect in a semiconductor, an overmoded resistive sensor for 0.3-0.4 THz band is investi-gated. The distribution of electromagnetic field components, voltage standing wave ratio （VSWR）, and...Based on the hot electron effect in a semiconductor, an overmoded resistive sensor for 0.3-0.4 THz band is investi-gated. The distribution of electromagnetic field components, voltage standing wave ratio （VSWR）, and the average electric field in the silicon block are obtained by using the three-dimensional finite-difference time-domain （FDTD） method. By adjusting several factors （such as the length, width, height and specific resistance of the silicon block） a novel sensor with optimal structural parameters that can be used as a power measurement device for high power terahertz pulse directly is proposed. The results show that the sensor has a relative sensitivity of about 0.24 kW 1, with a fluctuation of relative sensitivity of no more than ±22%, and the maximum of VSWR is 2.74 for 0.3-0.4 THz band.展开更多
基金Project supported by the National Natural Science Foundation of China （Grant No 10275056） and the Science and Technology 0ffice of Sichuan, China （Grant 04JY029-097）.
文摘The effects of atomic number Z on the energy distribution of hot electrons generated by the interaction of 60fs, 130mJ, 800nm, and 7×10^17W/cm^2 laser pulses with metallic targets have been studied experimentally. The results show that the number and the effective temperature of hot electrons increase with the atomic number Z of metallic targets, and the temperature of hot electrons are in the range of 190-230keV, which is consistent with a scaling law of hot electrons temperature.
基金Project supported by the Program for New Century Excellent Talents in University,China (Grant No.NCET-12-0915)
文摘The kink effect in current-voltage （IV） characteristic s seriously deteriorates the performance of a GaN-based HEMT. Based on a series of direct current （DC） IV measurements in a GaN-based HEMT with an AlGaN back barrier, a possible mechanism with electron-trapping and detrapping processes is proposed. Kink-related deep levels are activated by a high drain source voltage （Vds） and located in a GaN channel layer. Both electron trapping and detrapping processes are accomplished with the help of hot electrons from the channel by impact ionization. Moreover, the mechanism is verified by two other DC IV measurements and a model with an expression of the kink current.
文摘当前,氮化镓(gallium nitride,GaN)高电子迁移率晶体管(high electron mobility transistors,HEMTs)器件已逐渐被广泛应用。然而,退化问题仍然是困扰其高可靠应用的重要因素。特别是开态应力下,器件的退化机理值得深入研究。文章基于实验测试及仿真,重点研究了氮化镓射频HEMT器件在开态应力下的退化现象与机理。研究结果表明,单一的高漏压应力并不会对器件带来明显退化,而高漏压与大的漏极电流结合则会对器件产生明显退化,这一影响重点集中在栅极与漏极之间的有源区。需要注意的是,栅极偏置电压在沟道电子进入栅下区域的过程中也起到了重要作用。开态应力下,栅极偏压形成的垂直电场会使得器件栅下区域损伤更加严重。文章的研究成果可以为氮化镓射频器件在复杂环境下的高可靠性应用提供重要支撑。
基金Project supported by the National Basic Research Program of China (Grant No. 2011CBA00600)the National Natural Science Foundation of China (Grant No. 61106106)the Fundamental Research Funds for the Central Universities (Grant No. K50510250006)
文摘In spite of their extraordinary performance, AlGaN/GaN high electron mobility transistors （HEMTs） still lack solid reliability. Devices under accelerated DC stress tests （off-state, VDS = 0 state, and on-state step-stress） are investigated to help us identify the degradation mechanisms of the AlGaN/GaN HEMTs. All our findings are consistent with the degradation mechanism based on crystallographic-defect formation due to the inverse piezoelectric effects in Ref. [1] （Joh J and del Alamo J A 2006 IEEE IDEM Tech. Digest p. 415）. However, under the on-state condition, the devices are suffering from both inverse piezoelectric effects and hot electron effects, and so to improve the reliability of the devices both effects should be taken into consideration.
基金Project supported by the National Natural Science Foundation of China(Grant No.61231003)
文摘Based on the hot electron effect in a semiconductor, an overmoded resistive sensor for 0.3-0.4 THz band is investi-gated. The distribution of electromagnetic field components, voltage standing wave ratio （VSWR）, and the average electric field in the silicon block are obtained by using the three-dimensional finite-difference time-domain （FDTD） method. By adjusting several factors （such as the length, width, height and specific resistance of the silicon block） a novel sensor with optimal structural parameters that can be used as a power measurement device for high power terahertz pulse directly is proposed. The results show that the sensor has a relative sensitivity of about 0.24 kW 1, with a fluctuation of relative sensitivity of no more than ±22%, and the maximum of VSWR is 2.74 for 0.3-0.4 THz band.
