La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by...La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by XRD and SEM, and the results indicate that the thin films are grown with mainly (100) oriented and columnar structures. The ferroelectricity and piezoelectricity of the BI-PT films are also measured, and the measured results illustrate that both performances are effectively improved by the La-doping with suitable concentrations. These results will open up wide potential applications of the films in electronic devices.展开更多
An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced long...An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth.展开更多
Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are inve...Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are investigated.The structures of the xBI-(1-x)PT films are characterized by x-ray diffraction and scanning electron microscopy.The results indicate that the thin films are grown with mainly(001) orientation. The chemical compositions of the films are analyzed by scanning electron probe and the results indicate that the loss phenomena of Pb and Bi elements depend on the pressure and temperature during the sputtering process.The sputtering parameters including target composition, substrate temperature, and gas pressure are adjusted to obtain optimum sputtering conditions. To decrease leakage currents,2 mol% La2 O3 is doped in the targets. The P-E hysteresis loops show that the optimized xBI-(1-x)PT(x = 0.24) film has high ferroelectricities with remnant polarization2 Pr = 80μC/cm2 and coercive electric field 2 EC = 300 kV/cm. The Curie temperature is about 640℃. The results show that the films have optimum performance and will have wide applications.展开更多
Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties ...Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties GdTbFeCo thin film were investigated by the variable control method. And the influence mechanism was analyzed in detail. After the sputtering parameters were optimized, it was found that when the distance between target and substrate was 72 ram, the thin film thickness was 120 nm, and the sputtering power, sputtering pressure and sputtering time was 75 W, 0.5 Pa and 613 s, respectively, the coercivity with perpendicular anisotropy could be as high as 6735 Oe, and the squareness ratio of the hysteresis loop was almost equal to 1.展开更多
基金Supported by the National Natural Science Foundation of China under Grant Nos 11174142 and 11304160he National Basic Research Program of China under Grant No 2012CB921504the Special Fund for Public Interest of China under Grant No201510068
文摘La-doped and undoped xBiIn03-(1 - x)PbTi03 (BI-PT) thin films are deposited on (101)SrRuO3/(lOO)Pt/(lO0) MgO substrates by the rf-magnetron sputtering method. The structures of the films are characterized by XRD and SEM, and the results indicate that the thin films are grown with mainly (100) oriented and columnar structures. The ferroelectricity and piezoelectricity of the BI-PT films are also measured, and the measured results illustrate that both performances are effectively improved by the La-doping with suitable concentrations. These results will open up wide potential applications of the films in electronic devices.
基金supported by the National Natural Science Funds of China(No.11205155)Fundamental Research Funds for the Central Universities(WK2310000041)
文摘An accelerator storage ring needs clean ultrahigh vacuum.A TiZrV non-evaporable getter(NEG) film deposited on interior walls of the chamber can realize distributed pumping,effective vacuum improvement and reduced longitudinal pressure gradient.But accumulation of pollutants such as N_2 and O_2 will decrease the adsorption ability of the NEG,leading to a reduction of NEG lifetime.Therefore,an NEG thin film coated with a layer of Pd,which has high diffusion rate and absorption ability for H_2,can extend the service life of NEG and improve the pumping rate of H_2 as well.In this paper,with argon as discharge gas,a magnetron sputtering method is adopted to prepare TiZrV-Pd films in a long straight pipe.By SEM measurement,deposition rates of TiZrV-Pd films are analyzed under different deposition parameters,such as magnetic field strength,gas flow rate,discharge current,discharge voltage and working pressure.By comparing the experimental results with the simulation results based on Sigmund's theory,the Pd deposition rate C can be estimated by the sputtered depth.
基金Supported by the National Natural Science Foundation of China under Grant No 11304160the Special Fund for Public Interest of China under Grant No 201510068,and the NUPTFC under Grant No NY215111
文摘Properties of ferroelectric xBiInO3-(1-x)PbTiO3(xBI-(1-x)PT) thin films deposited on(101) SrRuO3/(200)Pt/(200) MgO substrates by rf magnetron sputtering method and effects of deposition conditions are investigated.The structures of the xBI-(1-x)PT films are characterized by x-ray diffraction and scanning electron microscopy.The results indicate that the thin films are grown with mainly(001) orientation. The chemical compositions of the films are analyzed by scanning electron probe and the results indicate that the loss phenomena of Pb and Bi elements depend on the pressure and temperature during the sputtering process.The sputtering parameters including target composition, substrate temperature, and gas pressure are adjusted to obtain optimum sputtering conditions. To decrease leakage currents,2 mol% La2 O3 is doped in the targets. The P-E hysteresis loops show that the optimized xBI-(1-x)PT(x = 0.24) film has high ferroelectricities with remnant polarization2 Pr = 80μC/cm2 and coercive electric field 2 EC = 300 kV/cm. The Curie temperature is about 640℃. The results show that the films have optimum performance and will have wide applications.
基金Funded by the Major Project of National Natural Science Foundation of China (60490290)
文摘Amorphous GdTbFeCo magnetic thin films were successfully prepared on glass substrates by RF magnetron sputtering system from a mosaic target. The influences of sputtering parameters on the magneto- optical properties GdTbFeCo thin film were investigated by the variable control method. And the influence mechanism was analyzed in detail. After the sputtering parameters were optimized, it was found that when the distance between target and substrate was 72 ram, the thin film thickness was 120 nm, and the sputtering power, sputtering pressure and sputtering time was 75 W, 0.5 Pa and 613 s, respectively, the coercivity with perpendicular anisotropy could be as high as 6735 Oe, and the squareness ratio of the hysteresis loop was almost equal to 1.