The H-terminated diamond films, which exhibit high surface conductivity, have been used in high-frequency and high-power electronic devices. In this paper, the surface conductive channel on specimens from the same dia...The H-terminated diamond films, which exhibit high surface conductivity, have been used in high-frequency and high-power electronic devices. In this paper, the surface conductive channel on specimens from the same diamond film was obtained by hydrogen plasma treatment and by heating under a hydrogen atmosphere, respectively, and the surface carrier transport characteristics of both samples were compared and evaluated. The results show that the carrier mobility and carrier density of the sample treated by hydrogen plasma are 15 cm^2·V^（-1）·s^（-1） and greater than 5 × 1012 cm^（-2）, respectively, and that the carrier mobilities measured at five different areas are similar. Compared to the hydrogen-plasma-treated specimen, the thermally hydrogenated specimen exhibits a lower surface conductivity, a carrier density one order of magnitude lower, and a carrier mobility that varies from 2 to 33 cm^2·V^（-1）·s^（-1）. The activated hydrogen atoms restructure the diamond surface, remove the scratches, and passivate the surface states via the etching effect during the hydrogen plasma treatment process, which maintains a higher carrier density and a more stable carrier mobility.展开更多
Fluorinated amorphous hydrogenated a-C∶F∶H carbon thin films were deposited using radio frequency plasma enhanced chemical vapor deposition（RF-PECVD） reactor with CF4 and CH4 as source gases and were annealed in a...Fluorinated amorphous hydrogenated a-C∶F∶H carbon thin films were deposited using radio frequency plasma enhanced chemical vapor deposition（RF-PECVD） reactor with CF4 and CH4 as source gases and were annealed in a N2 atmosphere. The properties of these films were evaluated by FTIR spectrometry, UV-VIS spectrophotometry and single-wavelength spectroscopic ellipsometry. A correspondence relativity connection between the deposition rate and technology was found. The chemical bonding structures and the content of CHx and CFx in the films are transformed and the optical band gap decreases monotonically with increasing temperature after annealing. The dielectric constant is increased with decreasing content of F in the films and the optical band gap is decreased with decreasing the content of H in the film.展开更多
Structural un-uniformity and electrical anisotropy of μc-Si∶H film are investigated in this paper. It is found that the structure of μc-Si∶H film along the direction perpendicular to the substrate is not uniform, ...Structural un-uniformity and electrical anisotropy of μc-Si∶H film are investigated in this paper. It is found that the structure of μc-Si∶H film along the direction perpendicular to the substrate is not uniform, which is modulated by film thickness. In addition, there is a dark conductivity anisotropy along the direction parallel(σ∥) and perpendicular(σ⊥)to the substrate in μc-Si∶H film. The reasons for such an property of μc-Si∶H film and the effect of oxygen contamination are analyzed.展开更多
Hexagonal nano-crystalline boron carbonitride (h-BCN) films grown on Si (100) substrate have been precisely investigated. The films were synthesized by radio frequency plasma enhanced chemical vapor deposition using t...Hexagonal nano-crystalline boron carbonitride (h-BCN) films grown on Si (100) substrate have been precisely investigated. The films were synthesized by radio frequency plasma enhanced chemical vapor deposition using tris-dimethylamino borane as a single-source molecular precursor. The deposition was performed by setting RF power at 400 - 800 W. The reaction pressure was at 2.6 Pa and the substrate temperature was recorded at 700°C - 800°C. Formation of the nano-crystalline h-BCN compound has been confirmed by X-ray diffraction analysis. The diffraction peaks at 26.3° together with a small unknown peak at 29.2° were elucidated due to the formation of an h-BCN structure. The films composed of B, C, and N atoms with different B-N, B-C, C-N chemical bonds in forming the sp2-BCN atomic configuration studied by X-ray photoelectron spectroscopy. Orientation and local structures of the h-BCN hybrid were studied by near-edge X-ray absorption fine structure (NEXAFS) measurements. The dominant presence of p* and s* resonance peaks of the sp2-hybrid orbitals in the B K-edge NEXAFS spectra revealed the formation of the sp2-BCN configuration around B atoms like-BN3 in h-BN. The orientation was suggested on the basis of the polarization dependence of B K-edge and N K-edge of the NEXAFS spectra.展开更多
Electronic transport properties of magnetically disordered R(-3)c phase Fe1.5Ti0.5O3-δ thin films epitaxially grown on Al2O3(0001) substrates have been studied. The measured magnetization in configurations with the m...Electronic transport properties of magnetically disordered R(-3)c phase Fe1.5Ti0.5O3-δ thin films epitaxially grown on Al2O3(0001) substrates have been studied. The measured magnetization in configurations with the magnetic field perpendicular and parallel to the film plane shows weak values of 0.1μB/formula compared to the theoretical value of 2μB/formula and a strong anisotropy with no saturation in perpendicular configuration. These properties are associated with the ato- mic scale disorder of Ti/Fe ions along c-axis. At zero-magnetic field and within the temperature range of 80 K to 400 K, the conduction mechanism appears to be Efros-Shklovskii variable range hopping with a carrier localization length of ξ0= 0.86nm. Magneto-resistance (MR) is positive in perpendicular configuration, while it is negative in parallel configuration, with significant values of MR = 27%- 37% at room temperature at 9 Tesla. Electron localization lengths were deduced from experiment for different external magnetic fields. The origin of magneto-resistance observed in experiment, is discussed.展开更多
基金financially supported by the National Natural Science Foundation of China (No. 51402013)the China Postdoctoral Science Foundation (No. 2015T80037)the Fundamental Research Funds for Central Universities (No. FRF-TP-15-052A2)
文摘The H-terminated diamond films, which exhibit high surface conductivity, have been used in high-frequency and high-power electronic devices. In this paper, the surface conductive channel on specimens from the same diamond film was obtained by hydrogen plasma treatment and by heating under a hydrogen atmosphere, respectively, and the surface carrier transport characteristics of both samples were compared and evaluated. The results show that the carrier mobility and carrier density of the sample treated by hydrogen plasma are 15 cm^2·V^（-1）·s^（-1） and greater than 5 × 1012 cm^（-2）, respectively, and that the carrier mobilities measured at five different areas are similar. Compared to the hydrogen-plasma-treated specimen, the thermally hydrogenated specimen exhibits a lower surface conductivity, a carrier density one order of magnitude lower, and a carrier mobility that varies from 2 to 33 cm^2·V^（-1）·s^（-1）. The activated hydrogen atoms restructure the diamond surface, remove the scratches, and passivate the surface states via the etching effect during the hydrogen plasma treatment process, which maintains a higher carrier density and a more stable carrier mobility.
文摘Fluorinated amorphous hydrogenated a-C∶F∶H carbon thin films were deposited using radio frequency plasma enhanced chemical vapor deposition（RF-PECVD） reactor with CF4 and CH4 as source gases and were annealed in a N2 atmosphere. The properties of these films were evaluated by FTIR spectrometry, UV-VIS spectrophotometry and single-wavelength spectroscopic ellipsometry. A correspondence relativity connection between the deposition rate and technology was found. The chemical bonding structures and the content of CHx and CFx in the films are transformed and the optical band gap decreases monotonically with increasing temperature after annealing. The dielectric constant is increased with decreasing content of F in the films and the optical band gap is decreased with decreasing the content of H in the film.
文摘Structural un-uniformity and electrical anisotropy of μc-Si∶H film are investigated in this paper. It is found that the structure of μc-Si∶H film along the direction perpendicular to the substrate is not uniform, which is modulated by film thickness. In addition, there is a dark conductivity anisotropy along the direction parallel(σ∥) and perpendicular(σ⊥)to the substrate in μc-Si∶H film. The reasons for such an property of μc-Si∶H film and the effect of oxygen contamination are analyzed.
文摘Hexagonal nano-crystalline boron carbonitride (h-BCN) films grown on Si (100) substrate have been precisely investigated. The films were synthesized by radio frequency plasma enhanced chemical vapor deposition using tris-dimethylamino borane as a single-source molecular precursor. The deposition was performed by setting RF power at 400 - 800 W. The reaction pressure was at 2.6 Pa and the substrate temperature was recorded at 700°C - 800°C. Formation of the nano-crystalline h-BCN compound has been confirmed by X-ray diffraction analysis. The diffraction peaks at 26.3° together with a small unknown peak at 29.2° were elucidated due to the formation of an h-BCN structure. The films composed of B, C, and N atoms with different B-N, B-C, C-N chemical bonds in forming the sp2-BCN atomic configuration studied by X-ray photoelectron spectroscopy. Orientation and local structures of the h-BCN hybrid were studied by near-edge X-ray absorption fine structure (NEXAFS) measurements. The dominant presence of p* and s* resonance peaks of the sp2-hybrid orbitals in the B K-edge NEXAFS spectra revealed the formation of the sp2-BCN configuration around B atoms like-BN3 in h-BN. The orientation was suggested on the basis of the polarization dependence of B K-edge and N K-edge of the NEXAFS spectra.
文摘Electronic transport properties of magnetically disordered R(-3)c phase Fe1.5Ti0.5O3-δ thin films epitaxially grown on Al2O3(0001) substrates have been studied. The measured magnetization in configurations with the magnetic field perpendicular and parallel to the film plane shows weak values of 0.1μB/formula compared to the theoretical value of 2μB/formula and a strong anisotropy with no saturation in perpendicular configuration. These properties are associated with the ato- mic scale disorder of Ti/Fe ions along c-axis. At zero-magnetic field and within the temperature range of 80 K to 400 K, the conduction mechanism appears to be Efros-Shklovskii variable range hopping with a carrier localization length of ξ0= 0.86nm. Magneto-resistance (MR) is positive in perpendicular configuration, while it is negative in parallel configuration, with significant values of MR = 27%- 37% at room temperature at 9 Tesla. Electron localization lengths were deduced from experiment for different external magnetic fields. The origin of magneto-resistance observed in experiment, is discussed.
