期刊文献+
共找到4篇文章
< 1 >
每页显示 20 50 100
(NH_4)_2S_x溶液改善GaAs MESFETs击穿特性的机理研究 被引量:1
1
作者 刘立浩 杨瑞霞 +3 位作者 邢东 郭荣辉 申华军 刘芳芳 《电子器件》 CAS 2003年第1期80-83,共4页
使用 (NH4) 2 Sx 溶液对GaAsMESFETs进行处理。处理后 ,器件各栅偏压下的源漏饱和电流降低了 ,栅漏击穿电压有了显著提高。我们认为负电荷表面态影响着栅边缘的电场 ,负电荷表面态密度的增大会提高器件的击穿电压 ,这就是 (NH4) 2 Sx
关键词 GAAS MESFETS (nh4)2sx处理 击穿电压 负电荷表面态
下载PDF
(NH_4)_2S treatment of the Si (100) surface and its effects on Al/Si Schottky barrier heights
2
作者 胡爱斌 王文武 徐秋霞 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2009年第8期56-59,共4页
The effect of Si (100) surface S passivation was investigated. A thick film with a high roughness value was formed on the Si surface treated by (NH4)2S solution, which was attributed to physical adsorption of S at... The effect of Si (100) surface S passivation was investigated. A thick film with a high roughness value was formed on the Si surface treated by (NH4)2S solution, which was attributed to physical adsorption of S atoms. SEM and XPS analyses reveal that Si surface atoms were chemically bonded with S atoms after Si surface treatment in NH4OH and (NH4)2S mixing solution. This induces a more ideal value for the Schottky barrier height compared with a diode treated only by HF solution, indicating that surface states originating from dangling bonds are passivated with S atoms. 展开更多
关键词 Schottky barrier (nh4)2S treatment dangling bonds I-V
原文传递
The effect of nitridation and sulfur passivation for In0.53Ga0.47As surfaces on their Al/Al2O3/InGaAs MOS capacitors properties
3
作者 林子曾 曹明民 +5 位作者 王盛凯 李琦 肖功利 高喜 刘洪刚 李海鸥 《Journal of Semiconductors》 EI CAS CSCD 2016年第2期155-159,共5页
The impact of nitridation and sulfur passivation for Ino.s3Gao.47As surfaces on the A1/A1203/InGaAs MOS capacitors properties was investigated by comparing the characteristics of frequency dispersion and hysteresis, c... The impact of nitridation and sulfur passivation for Ino.s3Gao.47As surfaces on the A1/A1203/InGaAs MOS capacitors properties was investigated by comparing the characteristics of frequency dispersion and hysteresis, calculating the Dit and ANbt values, and analyzing the interface traps and the leakage current. The results showed that both of the methods could form a passivation-layer on the InGaAs surface. The samples treated by N2 plasma could obtain good interface properties with the smallest frequency dispersion in the accumulation region, and the best hysteresis characteristics and good I-V properties were presented. Also the samples with (NH4)ESx treatment showed the smallest frequency dispersion near the flat-band region and a minimum Dit value of 2.6 x10^11 cm-2 eV-1. 展开更多
关键词 N2 plasma (nh4)2sx treatment interface properties MOS capacitors
原文传递
Reaction intermediates and products characterisation of NH_(3) in desulphurisation with activated coke
4
作者 Wei-li Zhang Meng Wang +1 位作者 Wen-zhe Si Jun-hua Li 《Journal of Iron and Steel Research International》 SCIE EI CAS 2024年第11期2664-2674,共11页
The sulphate is an important factor restricting the efficient and stable operation of the activated coke (AC) flue gas purification system. The simulation experiments and in situ infrared tests of AC taken from desorp... The sulphate is an important factor restricting the efficient and stable operation of the activated coke (AC) flue gas purification system. The simulation experiments and in situ infrared tests of AC taken from desorption tower of the AC flue gas purification system were carried out to first calibrate the thermal desorption characteristics of adsorbed NH_(3) and sulphate and explore the reaction behaviour of NH_(3) with SO_(2) and H_(2)SO_(4). On this basis, some advice for optimising the sulphate generation was put forward to improve the purification efficiency of the AC system. The results show that the temperatures of the desorption of adsorbed NH_(3), the decomposition of (NH_(4))_(2)SO_(4) and NH_(4)HSO_(4) are 224, 276 and 319 ℃, respectively, which lays the foundation for the quantitative analysis of sulphate on AC. Regardless of the NH_(3) amount, only a small portion of H_(2)SO_(4) is converted to sulphate, as the H_(2)SO_(4) deposited in AC pores or agglomerated together could not come into contact with NH_(3). The final reaction product of NH_(3) and SO_(2) is mainly (NH_(4))_(2)SO_(4) which is continuously generated because the newly generated H_(2)SO_(4) is continually exposed to NH_(3), if NH_(3) is enough. The reaction of NH_(3) with H_(2)SO_(4) takes precedence over with NH_(4)HSO_(4). In the initial stages in which H_(2)SO_(4) is exposed to NH_(3), the product is essentially all NH_(4)HSO_(4) as intermediate. Then, it is further converted to (NH_(4))_(2)SO_(4) whose amount reaches equilibrium when the accessible H_(2)SO_(4) is exhausted. All the NH_(3) adsorbed on AC entering the desulphurisation tower generates NH_(4)HSO_(4), but the amount is limited. The remaining SO_(2) entering the denitrification tower mainly generates (NH_(4))_(2)SO_(4);thus, limiting the remaining SO_(2) amount is necessary to guarantee denitrification efficiency. When the NH_(3) injection is changed to the desulphurisation tower, the initial NH_(3) injection rate can be increased to complete the conversion of accessible H_(2)SO_(4) as soon as possible in order to obtain higher denitrification efficiency. 展开更多
关键词 Sulphate generation Activated coke Sintering flue gas treatment nh4HSO4 (nh4)2SO4
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部