In this paper, a charge sheet surface potential based model for strained-Si nMOSFETs is presented and validated with numerical simulation. The model considers sub band splitting in the 2-DEG at the top heterointerface...In this paper, a charge sheet surface potential based model for strained-Si nMOSFETs is presented and validated with numerical simulation. The model considers sub band splitting in the 2-DEG at the top heterointerface in SiGe layer and also the dependence of electron concentration at heterointerface with the gate oxide. The model is scalable with strained-Si material parameters with physically derived flat-band voltages. An explicit relation for surface potential as a function of terminal voltages is developed. The model is derived from regional charge-based approach, where regional solutions are physically derived. The model gives an accurate description of drain current both in the weak and strong inversion regions of operation. The results obtained from the model developed are benchmarked with commercial numerical device simulator and is found to be in excellent agreement.展开更多
The electrical characterization of AlGaN/GaN interface is reported.The dependence of two-dimensional electron gas（2-DEG） density at the interface on the Al mole fraction and thickness of AIGaN layer as well as on th...The electrical characterization of AlGaN/GaN interface is reported.The dependence of two-dimensional electron gas（2-DEG） density at the interface on the Al mole fraction and thickness of AIGaN layer as well as on the thickness of GaN cap layer is presented.This information can be used to design and fabricate AlGaN/GaN based MODFET（modulation doped field effect transistor） for optimum DC and RF characteristics.展开更多
文摘In this paper, a charge sheet surface potential based model for strained-Si nMOSFETs is presented and validated with numerical simulation. The model considers sub band splitting in the 2-DEG at the top heterointerface in SiGe layer and also the dependence of electron concentration at heterointerface with the gate oxide. The model is scalable with strained-Si material parameters with physically derived flat-band voltages. An explicit relation for surface potential as a function of terminal voltages is developed. The model is derived from regional charge-based approach, where regional solutions are physically derived. The model gives an accurate description of drain current both in the weak and strong inversion regions of operation. The results obtained from the model developed are benchmarked with commercial numerical device simulator and is found to be in excellent agreement.
文摘The electrical characterization of AlGaN/GaN interface is reported.The dependence of two-dimensional electron gas（2-DEG） density at the interface on the Al mole fraction and thickness of AIGaN layer as well as on the thickness of GaN cap layer is presented.This information can be used to design and fabricate AlGaN/GaN based MODFET（modulation doped field effect transistor） for optimum DC and RF characteristics.
