Beta gallium oxide(β-Ga_(2)O_(3)) has attracted significant attention for applications in power electronics due to its ultrawide bandgap of ~ 4.8 eV and the large critical electric field of 8 MV/cm. These properties ...Beta gallium oxide(β-Ga_(2)O_(3)) has attracted significant attention for applications in power electronics due to its ultrawide bandgap of ~ 4.8 eV and the large critical electric field of 8 MV/cm. These properties yield a high Baliga's figures of merit(BFOM) of more than 3000. Though β-Ga_(2)O_(3) possesses superior material properties, the lack of p-type doping is the main obstacle that hinders the development of β-Ga_(2)O_(3)-based power devices for commercial use. Constructing heterojunctions by employing other p-type materials has been proven to be a feasible solution to this issue. Nickel oxide(NiO) is the most promising candidate due to its wide band gap of 3.6–4.0 eV. So far, remarkable progress has been made in NiO/β-Ga_(2)O_(3) heterojunction power devices. This review aims to summarize recent advances in the construction, characterization, and device performance of the NiO/β-Ga_(2)O_(3) heterojunction power devices. The crystallinity, band structure, and carrier transport property of the sputtered NiO/β-Ga_(2)O_(3) heterojunctions are discussed. Various device architectures, including the NiO/β-Ga_(2)O_(3) heterojunction pn diodes(HJDs), junction barrier Schottky(JBS) diodes, and junction field effect transistors(JFET), as well as the edge terminations and super-junctions based on the NiO/β-Ga_(2)O_(3) heterojunction, are described.展开更多
β-Ga_(2)O_(3) Schottky barrier diodes have undergone rapid progress in research and development for power electronic applications.This paper reviews state-of-the-art β-Ga_(2)O_(3) rectifier technologies,including ad...β-Ga_(2)O_(3) Schottky barrier diodes have undergone rapid progress in research and development for power electronic applications.This paper reviews state-of-the-art β-Ga_(2)O_(3) rectifier technologies,including advanced diode architectures that have enabled lower reverse leakage current via the reduced-surface-field effect.Characteristic device properties including onresistance,breakdown voltage,rectification ratio,dynamic switching,and nonideal effects are summarized for the different devices.Notable results on the high-temperature resilience of β-Ga_(2)O_(3) Schottky diodes,together with the enabling thermal packaging solutions,are also presented.展开更多
There is currently great optimism within the electronics community that gallium oxide(Ga_(2)O_(3)) ultra-wide bandgap semiconductors have unprecedented prospects for eventually revolutionizing a rich variety of power ...There is currently great optimism within the electronics community that gallium oxide(Ga_(2)O_(3)) ultra-wide bandgap semiconductors have unprecedented prospects for eventually revolutionizing a rich variety of power electronic applications. Specially, benefiting from its ultra-high bandgap of around 4.8 eV, it is expected that the emerging Ga_(2)O_(3) technology would offer an exciting platform to deliver massively enhanced device performance for power electronics and even completely new applications.展开更多
This work demonstrates high-performance NiO/β-Ga_(2)O_(3) vertical heterojunction diodes(HJDs)with double-layer junc-tion termination extension(DL-JTE)consisting of two p-typed NiO layers with varied lengths.The bott...This work demonstrates high-performance NiO/β-Ga_(2)O_(3) vertical heterojunction diodes(HJDs)with double-layer junc-tion termination extension(DL-JTE)consisting of two p-typed NiO layers with varied lengths.The bottom 60-nm p-NiO layer fully covers theβ-Ga_(2)O_(3) wafer,while the geometry of the upper 60-nm p-NiO layer is 10μm larger than the square anode elec-trode.Compared with a single-layer JTE,the electric field concentration is inhibited by double-layer JTE structure effectively,resulting in the breakdown voltage being improved from 2020 to 2830 V.Moreover,double p-typed NiO layers allow more holes into the Ga_(2)O_(3) drift layer to reduce drift resistance.The specific on-resistance is reduced from 1.93 to 1.34 mΩ·cm^(2).The device with DL-JTE shows a power figure-of-merit(PFOM)of 5.98 GW/cm^(2),which is 2.8 times larger than that of the conven-tional single-layer JTE structure.These results indicate that the double-layer JTE structure provides a viable way of fabricating high-performance Ga_(2)O_(3) HJDs.展开更多
We present an experimental method to obtain neutral beam injection （NBI） power scaling laws with operating parameters of the NBI system on HL-2A, including the beam divergence angle, the beam power transmission effi...We present an experimental method to obtain neutral beam injection （NBI） power scaling laws with operating parameters of the NBI system on HL-2A, including the beam divergence angle, the beam power transmission efficiency, the neutralization efficiency and so on. With the empirical scaling laws, the estimating power can be obtained in every shot of experiment on time, therefore the important parameters such as the energy confinement time can be obtained precisely. The simulation results by the tokamak simulation code （TSC） show that the evolution of the plasma parameters is in good agreement with the experimental results by using the NBI power from the empirical scaling law.展开更多
The Al2O3-ZrO2（3Y）-SiC composite ceramics used in solar thermal power were prepared by micrometric Al2O3,nano-ZrO2 and SiC powders under the condition of pressureless sintering.The bulk density and bending strength ...The Al2O3-ZrO2（3Y）-SiC composite ceramics used in solar thermal power were prepared by micrometric Al2O3,nano-ZrO2 and SiC powders under the condition of pressureless sintering.The bulk density and bending strength of samples with 10vol% nano-ZrO2 sintered at 1480℃ were 3.222 g/cm3 and 160.4MPa,respectively.The bending strength of samples after 7 times thermal shock tests （quenching from 1000℃ to 25℃ in air medium） is 132.0MPa,loss rate of bending strength is only 17%.The effect of nano-ZrO2 content on the microstructure and performance of Al2O3-ZrO2（3Y）-SiC composite ceramic was investigated.The experimental results show that the bending strength of samples with above 10vol% nano-ZrO2 content has decreased,because the volume expansion resulting from t-ZrO2 to m-ZrO2 phase transformation is excessive;Adding proper nano-ZrO2 would be contributed to improve the thermal shock resistance of the composite ceramics.The Al2O3-ZrO2（3Y）-SiC composite ceramic has promising potential application in solar thermal power.展开更多
The 10 nm p-NiO thin film is prepared by thermal oxidation of Ni onβ-Ga_(2)O_(3)to form NiO/β-Ga_(2)O_(3)p-n heterojunction diodes(HJDs).The NiO/β-Ga_(2)O_(3)HJDs exhibit excellent electrostatic properties,with a h...The 10 nm p-NiO thin film is prepared by thermal oxidation of Ni onβ-Ga_(2)O_(3)to form NiO/β-Ga_(2)O_(3)p-n heterojunction diodes(HJDs).The NiO/β-Ga_(2)O_(3)HJDs exhibit excellent electrostatic properties,with a high breakdown voltage of 465 V,a specific on-resistance(Ron,sp)of 3.39 mΩ·cm^(2),and a turn-on voltage(V on)of 1.85 V,yielding a static Baliga's figure of merit(FOM)of 256 MW/cm^(2).Also,the HJDs have a low turn-on voltage,which reduces conduction loss dramatically,and a rectification ratio of up to 108.Meanwhile,the HJDs'reverse leakage current is essentially unaffected at temperatures below 170?C,and their leakage level may be controlled below 10^(-10)A.This indicates that p-NiO/β-Ga_(2)O_(3)HJDs with good thermal stability and high-temperature operating ability can be a good option for high-performanceβ-Ga_(2)O_(3)power devices.展开更多
Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships amon...Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.展开更多
基金supported by the Guangdong Basic and Applied Basic Research Foundation under Grant No. 2022A1515012163。
文摘Beta gallium oxide(β-Ga_(2)O_(3)) has attracted significant attention for applications in power electronics due to its ultrawide bandgap of ~ 4.8 eV and the large critical electric field of 8 MV/cm. These properties yield a high Baliga's figures of merit(BFOM) of more than 3000. Though β-Ga_(2)O_(3) possesses superior material properties, the lack of p-type doping is the main obstacle that hinders the development of β-Ga_(2)O_(3)-based power devices for commercial use. Constructing heterojunctions by employing other p-type materials has been proven to be a feasible solution to this issue. Nickel oxide(NiO) is the most promising candidate due to its wide band gap of 3.6–4.0 eV. So far, remarkable progress has been made in NiO/β-Ga_(2)O_(3) heterojunction power devices. This review aims to summarize recent advances in the construction, characterization, and device performance of the NiO/β-Ga_(2)O_(3) heterojunction power devices. The crystallinity, band structure, and carrier transport property of the sputtered NiO/β-Ga_(2)O_(3) heterojunctions are discussed. Various device architectures, including the NiO/β-Ga_(2)O_(3) heterojunction pn diodes(HJDs), junction barrier Schottky(JBS) diodes, and junction field effect transistors(JFET), as well as the edge terminations and super-junctions based on the NiO/β-Ga_(2)O_(3) heterojunction, are described.
文摘β-Ga_(2)O_(3) Schottky barrier diodes have undergone rapid progress in research and development for power electronic applications.This paper reviews state-of-the-art β-Ga_(2)O_(3) rectifier technologies,including advanced diode architectures that have enabled lower reverse leakage current via the reduced-surface-field effect.Characteristic device properties including onresistance,breakdown voltage,rectification ratio,dynamic switching,and nonideal effects are summarized for the different devices.Notable results on the high-temperature resilience of β-Ga_(2)O_(3) Schottky diodes,together with the enabling thermal packaging solutions,are also presented.
文摘There is currently great optimism within the electronics community that gallium oxide(Ga_(2)O_(3)) ultra-wide bandgap semiconductors have unprecedented prospects for eventually revolutionizing a rich variety of power electronic applications. Specially, benefiting from its ultra-high bandgap of around 4.8 eV, it is expected that the emerging Ga_(2)O_(3) technology would offer an exciting platform to deliver massively enhanced device performance for power electronics and even completely new applications.
基金supported by the National Natural Science Foundation of China under Grant U21A20503.
文摘This work demonstrates high-performance NiO/β-Ga_(2)O_(3) vertical heterojunction diodes(HJDs)with double-layer junc-tion termination extension(DL-JTE)consisting of two p-typed NiO layers with varied lengths.The bottom 60-nm p-NiO layer fully covers theβ-Ga_(2)O_(3) wafer,while the geometry of the upper 60-nm p-NiO layer is 10μm larger than the square anode elec-trode.Compared with a single-layer JTE,the electric field concentration is inhibited by double-layer JTE structure effectively,resulting in the breakdown voltage being improved from 2020 to 2830 V.Moreover,double p-typed NiO layers allow more holes into the Ga_(2)O_(3) drift layer to reduce drift resistance.The specific on-resistance is reduced from 1.93 to 1.34 mΩ·cm^(2).The device with DL-JTE shows a power figure-of-merit(PFOM)of 5.98 GW/cm^(2),which is 2.8 times larger than that of the conven-tional single-layer JTE structure.These results indicate that the double-layer JTE structure provides a viable way of fabricating high-performance Ga_(2)O_(3) HJDs.
文摘We present an experimental method to obtain neutral beam injection （NBI） power scaling laws with operating parameters of the NBI system on HL-2A, including the beam divergence angle, the beam power transmission efficiency, the neutralization efficiency and so on. With the empirical scaling laws, the estimating power can be obtained in every shot of experiment on time, therefore the important parameters such as the energy confinement time can be obtained precisely. The simulation results by the tokamak simulation code （TSC） show that the evolution of the plasma parameters is in good agreement with the experimental results by using the NBI power from the empirical scaling law.
文摘The Al2O3-ZrO2（3Y）-SiC composite ceramics used in solar thermal power were prepared by micrometric Al2O3,nano-ZrO2 and SiC powders under the condition of pressureless sintering.The bulk density and bending strength of samples with 10vol% nano-ZrO2 sintered at 1480℃ were 3.222 g/cm3 and 160.4MPa,respectively.The bending strength of samples after 7 times thermal shock tests （quenching from 1000℃ to 25℃ in air medium） is 132.0MPa,loss rate of bending strength is only 17%.The effect of nano-ZrO2 content on the microstructure and performance of Al2O3-ZrO2（3Y）-SiC composite ceramic was investigated.The experimental results show that the bending strength of samples with above 10vol% nano-ZrO2 content has decreased,because the volume expansion resulting from t-ZrO2 to m-ZrO2 phase transformation is excessive;Adding proper nano-ZrO2 would be contributed to improve the thermal shock resistance of the composite ceramics.The Al2O3-ZrO2（3Y）-SiC composite ceramic has promising potential application in solar thermal power.
基金the Technology Innovation and Application Demonstration Key Project of Chongqing Municipality(cstc2019jszx-zdztzxX0005)the Technology Innovation and Application Demonstration Key Project of Chongqing Municipality(cstc2020jscx-gksbX0011)+1 种基金the Science and Technology Research Program of Chongqing Municipal Education Commission(KJQN202100614)the Natural Science Foundation of Chongqing(cstc2021jcyj-bshX0146)。
文摘The 10 nm p-NiO thin film is prepared by thermal oxidation of Ni onβ-Ga_(2)O_(3)to form NiO/β-Ga_(2)O_(3)p-n heterojunction diodes(HJDs).The NiO/β-Ga_(2)O_(3)HJDs exhibit excellent electrostatic properties,with a high breakdown voltage of 465 V,a specific on-resistance(Ron,sp)of 3.39 mΩ·cm^(2),and a turn-on voltage(V on)of 1.85 V,yielding a static Baliga's figure of merit(FOM)of 256 MW/cm^(2).Also,the HJDs have a low turn-on voltage,which reduces conduction loss dramatically,and a rectification ratio of up to 108.Meanwhile,the HJDs'reverse leakage current is essentially unaffected at temperatures below 170?C,and their leakage level may be controlled below 10^(-10)A.This indicates that p-NiO/β-Ga_(2)O_(3)HJDs with good thermal stability and high-temperature operating ability can be a good option for high-performanceβ-Ga_(2)O_(3)power devices.
文摘Total dose effects and single event effects on radiation-hardened power vertical double-diffusion metal oxide semiconductor（VDMOS） devices with composite SiO2-Si3N4 film gates are investigated.The relationships among the important electrical parameters of the samples with different thickness SiO2-Si3N4 films,such as threshold voltage,breakdown voltage,and on-state resistance in accumulated dose,are discussed.The total dose experiment results show that the breakdown voltage and the on-state resistance barely change with the accumulated dose.However,the relationships between the threshold voltages of the samples and the accumulated dose are more complex,and not only positively drift,but also negatively drift.At the end of the total dose experiment,we select the group of samples which have the smaller threshold voltage shift to carry out the single event effect studies.We find that the samples with appropriate thickness ratio SiO2-Si3N4 films have a good radiation-hardening ability.This method may be useful in solving both the SEGR and the total dose problems with the composite SiO2-Si3N4 films.
