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Using 3D TCAD Simulation to Study Charge Collection of a p-n Junction in a 0.18μm Bulk Process
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作者 梁斌 陈书明 刘必慰 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第9期1692-1697,共6页
Single event transient of a real p-n junction in a 0.18μm bulk process is studied by 3D TCAD simulation. The impact of voltage, temperature, substrate concentration, and LET on SET is studied. Our simulation results ... Single event transient of a real p-n junction in a 0.18μm bulk process is studied by 3D TCAD simulation. The impact of voltage, temperature, substrate concentration, and LET on SET is studied. Our simulation results demonstrate that biases in the range 1.62 to 1.98V influence DSET current shape greatly and total collected charge weakly. Peak current and charge collection within 2ns decreases as temperature increases,and temperature has a stronger influence on SET currents than on total charge. Typical variation of substrate concentration in modern VDSM processes has a negligible effect on SEEs. Both peak current and total collection charge increases as LET increases. 展开更多
关键词 charge collection p-n junction very deep sub-micro 3d device simulation RADIATION
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