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An oxide filled extended trench gate super junction MOSFET structure 被引量:6
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作者 王彩琳 孙军 《Chinese Physics B》 SCIE EI CAS CSCD 2009年第3期1231-1236,共6页
This paper proposes an oxide filled extended trench gate super junction (SJ) MOSFET structure to meet the need of higher frequency power switches application. Compared with the conventional trench gate SJ MOSFET, ne... This paper proposes an oxide filled extended trench gate super junction (SJ) MOSFET structure to meet the need of higher frequency power switches application. Compared with the conventional trench gate SJ MOSFET, new structure has the smaller input and output capacitances, and the remarkable improvements in the breakdown voltage, on-resistance and switching speed. Furthermore, the SJ in the new structure can be realized by the existing trench etching and shallow angle implantation, which offers more freedom to SJ MOSFET device design and fabrication. 展开更多
关键词 power MOSFET super junction trench gate shallow angle implantation
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