ZnO nanorod arrays （NRs） were synthesized on the fluorine-doped SnO2 transparent conductive glass （FTO） by a simple chemical bath deposition （CBD） method combined with alkali-etched method in potassium hydroxide...ZnO nanorod arrays （NRs） were synthesized on the fluorine-doped SnO2 transparent conductive glass （FTO） by a simple chemical bath deposition （CBD） method combined with alkali-etched method in potassium hydroxide （KOH） solution. X-ray diffraction （XRD）, scanning electron microscopy （SEM） and current-voltage （I-V） curve were used to characterize the structure, morphologies and optoelectronic properties. The results demonstrated that ZnO NRs had wurtzite structures, the morphologies and photovoltaic properties of ZnO NRs were closely related to the concentration of KOH and etching time, well-aligned and uniformly distributed ZnO NRs were obtained after etching with 0.1 mol/L KOH for 1 h. ZnO NRs treated by KOH had been proved to have superior photovoltaic properties compared with high density ZnO NRs. When using ZnO NRs etched with 0.1 mol/L KOH for 1 h as the anode of solar cell, the conversion efficiency, short circuit current and open circuit voltage, compared with the unetched ZnO NRs, increased by 0.71%, 2.79 mA and 0.03 V, respectively.展开更多
Epoxy resin(EP)tends to accumulate a large amount of charge on its surface when exposed to a high-voltage DC electric field,which leads to a reduction in its insulative performance and an increase in potential safety ...Epoxy resin(EP)tends to accumulate a large amount of charge on its surface when exposed to a high-voltage DC electric field,which leads to a reduction in its insulative performance and an increase in potential safety risks in power systems.To suppress charge accumulation,improve the flashover voltage of the EP,and reduce the risk of gas insulated switchgear(GIS)/gas insulated transmission line(GIL)failure,we used two plasma-etching methods,i.e.,atmospheric-pressure dielectric barrier discharge(DBD)and the atmospheric-pressure plasma jet(APPJ),to modify the surface of the EP.The surface morphology and electrical properties of the modified materials were explored as a function of time.The results show that after DBD treatment,the roughness of the sample increases by 103.9 nm,the conductivity increases by3.9×10^(-18)S,and the flashover voltage increases by 14.4%;after APPJ treatment,the roughness of the sample increases by 223.5 nm,the conductivity increases by 3.4×10^(-17)S,and the flashover voltage increases by 18%.This shows that both plasma-etching methods can improve the insulation properties of materials by improving the surface-charge characteristics.The two methods are compared with each other:the APPJ treatment method is better at improving the surface roughness and electrical properties of materials,and this flexible treatment method has greater potential in industrial applications.展开更多
Plasma etching technology is used to treat Polypropylene fiber with different fineness. The result shows that the plasma etching treatment is useful to improve the wicking property of polypropylene, although too much ...Plasma etching technology is used to treat Polypropylene fiber with different fineness. The result shows that the plasma etching treatment is useful to improve the wicking property of polypropylene, although too much time of treatment may be converse to the wicking property. A surface roughness theory is applied to explain the reason why the plasma can improve the wicking property. In this experiment, fibers with different treating time under certain voltage(180 V) and pressure(0.1 mm Hg)are used as experimental sample.展开更多
Copper-graphite composites were prepared by spark plasma sintering(SPS)using coppercoated graphite powder.Hydrophobic surfaces were successfully constructed by chemical etching and surface treatment.The density,metall...Copper-graphite composites were prepared by spark plasma sintering(SPS)using coppercoated graphite powder.Hydrophobic surfaces were successfully constructed by chemical etching and surface treatment.The density,metallographic structure,microstructure,Shore hardness,resistivity,water contact angle,and friction/wear properties of the composites were investigated using the Archimedes drainage method,a metallographic microscope,a scanning electron microscope,a hardness tester,a resistometer,a surface science tester,and a friction tester.The results showed that the relative density and Shore hardness of the copper-graphite composites increased slightly from 90.04%and 56 HSD to 92.66%and 59 HSD,respectively,when the sintering temperature increased from 700 to 900℃.The copper and graphite phases in the copper-graphite composites were uniformly distributed with a continuous and network-like structure at various sintering temperatures.The interface between the copper and graphite was in good condition,without any obvious cracks or voids.The optimum process for hydrophobic surface construction included etching with a 1 mol/L K_(2)Cr_(2)O_(7)-H_(2)SO_(4)solution for 1 min,and soaking in a 0.09 mol/L cetylbenzene sulfonic acid alcohol solution for 1 h.The contact angle of the copper-graphite composite reached 130°.Hydrophobic treatment was beneficial for reducing the friction coefficient(from 0.18-0.19 to 0.13-0.15)and the wear rate(from 4.1-6.2×10^(-3)to 1.1-2.1×10^(-3)mm^(3)/(N·m)),demonstrating obvious antifriction and wear-resisting properties.The resistivities of the hydrophobic-treated samples increased slightly,from(4-8)×10^(-7)Ω·m to(5-15)×10^(-7)Ω·m,meeting the resistivity requirements of copper-graphite composite pantograph sliders and current receiver sliders in actual working conditions.展开更多
Cu-Ni core-shell nanowires, with an inner Cu core diameter of about 60 nm and varying Ni shell thicknesses （10, 30, 50, 60, and 80 nm）, were successfully fabricated in porous polycarbonate （PC） ion- track template...Cu-Ni core-shell nanowires, with an inner Cu core diameter of about 60 nm and varying Ni shell thicknesses （10, 30, 50, 60, and 80 nm）, were successfully fabricated in porous polycarbonate （PC） ion- track templates by a two-step etching and electrodeposition method. In our experiment, the thickness of Ni shell can be effectively tuned through the etching time of templates. The core-shell structure was confirmed by scanning electron microscopy （SEM） and transmission electron microscopy （TEM）. The X-ray diffraction （XRD） pattern elucidates the co-existence of characteristic peaks for both Cu and Ni, indicating no other phases were formed during preparation. Magnetic hysteresis loops measured via vibrating sample magnetometry （VSM） revealed that Cu-Ni core-shell nanowires with thinner Ni shell exhibited obviously diamagnetic character and together with a weak ferromagnetic activity, whereas ferromagnetic behavior was primarily measured for the wires with thicker Ni shell. With increasing Ni shell thickness, the squareness and coercivity value became smaller due to the shape anisotropy and the formation of multi-domain structure.展开更多
Plasma etching technique used in the modification of fibres,yarns and fabrics of wool is re-ported.The experimental results show that the method is useful for improving wettability and re-ducing shrinkage of wool,it m...Plasma etching technique used in the modification of fibres,yarns and fabrics of wool is re-ported.The experimental results show that the method is useful for improving wettability and re-ducing shrinkage of wool,it may be used to increase the strength of tops and yarns,and to enhancethe hand and colour of the final products.In addition,the characteristic features of the plasmamodified wool and discussions of possible mechanisms of the action are presented.展开更多
Thiolate-protected atomically precise nanoclusters(NCs)demonstrate a series of unique luminescent characteristics attributed to their various peculiar electronic structures.Therefore,fluorescent NCs present extraordin...Thiolate-protected atomically precise nanoclusters(NCs)demonstrate a series of unique luminescent characteristics attributed to their various peculiar electronic structures.Therefore,fluorescent NCs present extraordinary practical values in biosensing and bioimaging research fields.Nevertheless,restricted by the types of fluorescent NCs,there are great difficulties in promoting the development of NCs in fluorescent research areas.As a result,it is of significant necessity for researchers to develop new synthetic pathways to produce high-quality fluorescent NCs.According to the analysis about the structural characteristics of fluorescent NCs,some general features like longer motif and higher ligand-to-metal ratio can be found,consistent to some presented regularities in etching reaction.Consequently,in this work,we used Au_(25)(MHA)_(18)(MHA=6-mercaptohexanoic acid)as a model nanocluster and utilized the etching reaction to systematically explore etching products and their corresponding luminescent properties.Moreover,we also identified three main reaction processes in the entire etching reaction process,which can generate new metal nanocluster species with various fluorescent properties.Hence,the etching reaction will provide a good platform to produce new luminescent metal NC species.展开更多
Porous silicon (PS) was fabricated by laser-induced etching (LIE) process. The objective of this study is to investigate the selected LIE parameters to control size and shape of nanostructures,which are considered imp...Porous silicon (PS) was fabricated by laser-induced etching (LIE) process. The objective of this study is to investigate the selected LIE parameters to control size and shape of nanostructures,which are considered important factors in semiconductor device applications. Photoluminescence output intensity becomes stronger due to the increase in the number of emitted photons on the porous surface. There is a dramatic increase in photoluminescence intensity due to the increase of porosity as a function of laser power density. The increase in electrolyte concentration is an important parameter to accelerate the dissolution reaction on the interface layer between the electrolyte solution and wafer surface. PS spectra displayed a stronger Raman intensity than crystalline bulk Si;also the PS spectrum was shifted and broadened as a function of LIE parameters.展开更多
An effective method based on laser etching and driving layer strategy was proposed to prepare patterned Ag nanoparticles(Ag NPs)on fluorine-doped tin oxide(FTO)/glass substrate and thus to enhance the photoelectric pr...An effective method based on laser etching and driving layer strategy was proposed to prepare patterned Ag nanoparticles(Ag NPs)on fluorine-doped tin oxide(FTO)/glass substrate and thus to enhance the photoelectric properties.This method successively included depositing an aluminum-doped zinc oxide(AZO)driving layer,laser etching,depositing an Ag layer,furnace annealing and laser removal.Different AZO and Ag layer thicknesses were adopted,and the surface morphology,crystal structure and photoelectric properties were investigated.An Ag NPs/FTO/glass sample without an AZO driving layer was prepared for comparison.It was found that furnace annealing of the Ag layer combined with the AZO driving layer,rather than that without the AZO driving layer,was more conducive to generating patterned Ag NPs.Using a 20-nmthick AZO layer and a 150-nm-thick Ag layer led to the formation of uniformly distributed Ag NPs being aligned along the laser-etched grooves to form a pattern.The as-obtained sample had the best comprehensive photoelectric property with an average transmittance of 79.95%,a sheet resistance of 7.11Ω/sq and the highest figure of merit of 1.50×10^(-2)Ω^(-1),confirming the feasibility of the proposed method and providing enlightenment for related researches of transparent conductive oxide-based films.展开更多
基金Project (21171027) supported by the National Natural Science Foundation of ChinaProject (K1001020-11) supported by the Science and Technology Key Project of Changsha City, ChinaProject ([2010]70) supported by Science and Technology Innovative Research Team in Higher Educational Institutions of Hunan Province, China
文摘ZnO nanorod arrays （NRs） were synthesized on the fluorine-doped SnO2 transparent conductive glass （FTO） by a simple chemical bath deposition （CBD） method combined with alkali-etched method in potassium hydroxide （KOH） solution. X-ray diffraction （XRD）, scanning electron microscopy （SEM） and current-voltage （I-V） curve were used to characterize the structure, morphologies and optoelectronic properties. The results demonstrated that ZnO NRs had wurtzite structures, the morphologies and photovoltaic properties of ZnO NRs were closely related to the concentration of KOH and etching time, well-aligned and uniformly distributed ZnO NRs were obtained after etching with 0.1 mol/L KOH for 1 h. ZnO NRs treated by KOH had been proved to have superior photovoltaic properties compared with high density ZnO NRs. When using ZnO NRs etched with 0.1 mol/L KOH for 1 h as the anode of solar cell, the conversion efficiency, short circuit current and open circuit voltage, compared with the unetched ZnO NRs, increased by 0.71%, 2.79 mA and 0.03 V, respectively.
基金supported by National Natural Science Foundation of China(Nos.51777076,51507066)the Fundamental Research Funds for the Central Universities(Nos.2019MS083,2018MS084)the Self-topic Fund of State Key Laboratory of Alternate Electrical Power System with Renewable Energy Sources(Nos.LAPS202116,LAPS202103)。
文摘Epoxy resin(EP)tends to accumulate a large amount of charge on its surface when exposed to a high-voltage DC electric field,which leads to a reduction in its insulative performance and an increase in potential safety risks in power systems.To suppress charge accumulation,improve the flashover voltage of the EP,and reduce the risk of gas insulated switchgear(GIS)/gas insulated transmission line(GIL)failure,we used two plasma-etching methods,i.e.,atmospheric-pressure dielectric barrier discharge(DBD)and the atmospheric-pressure plasma jet(APPJ),to modify the surface of the EP.The surface morphology and electrical properties of the modified materials were explored as a function of time.The results show that after DBD treatment,the roughness of the sample increases by 103.9 nm,the conductivity increases by3.9×10^(-18)S,and the flashover voltage increases by 14.4%;after APPJ treatment,the roughness of the sample increases by 223.5 nm,the conductivity increases by 3.4×10^(-17)S,and the flashover voltage increases by 18%.This shows that both plasma-etching methods can improve the insulation properties of materials by improving the surface-charge characteristics.The two methods are compared with each other:the APPJ treatment method is better at improving the surface roughness and electrical properties of materials,and this flexible treatment method has greater potential in industrial applications.
文摘Plasma etching technology is used to treat Polypropylene fiber with different fineness. The result shows that the plasma etching treatment is useful to improve the wicking property of polypropylene, although too much time of treatment may be converse to the wicking property. A surface roughness theory is applied to explain the reason why the plasma can improve the wicking property. In this experiment, fibers with different treating time under certain voltage(180 V) and pressure(0.1 mm Hg)are used as experimental sample.
基金the Open Subject of The State Key Laboratory of Heavy Duty AC Drive Electric Locomotive Systems Integration(No.172195100710)。
文摘Copper-graphite composites were prepared by spark plasma sintering(SPS)using coppercoated graphite powder.Hydrophobic surfaces were successfully constructed by chemical etching and surface treatment.The density,metallographic structure,microstructure,Shore hardness,resistivity,water contact angle,and friction/wear properties of the composites were investigated using the Archimedes drainage method,a metallographic microscope,a scanning electron microscope,a hardness tester,a resistometer,a surface science tester,and a friction tester.The results showed that the relative density and Shore hardness of the copper-graphite composites increased slightly from 90.04%and 56 HSD to 92.66%and 59 HSD,respectively,when the sintering temperature increased from 700 to 900℃.The copper and graphite phases in the copper-graphite composites were uniformly distributed with a continuous and network-like structure at various sintering temperatures.The interface between the copper and graphite was in good condition,without any obvious cracks or voids.The optimum process for hydrophobic surface construction included etching with a 1 mol/L K_(2)Cr_(2)O_(7)-H_(2)SO_(4)solution for 1 min,and soaking in a 0.09 mol/L cetylbenzene sulfonic acid alcohol solution for 1 h.The contact angle of the copper-graphite composite reached 130°.Hydrophobic treatment was beneficial for reducing the friction coefficient(from 0.18-0.19 to 0.13-0.15)and the wear rate(from 4.1-6.2×10^(-3)to 1.1-2.1×10^(-3)mm^(3)/(N·m)),demonstrating obvious antifriction and wear-resisting properties.The resistivities of the hydrophobic-treated samples increased slightly,from(4-8)×10^(-7)Ω·m to(5-15)×10^(-7)Ω·m,meeting the resistivity requirements of copper-graphite composite pantograph sliders and current receiver sliders in actual working conditions.
基金Funded by the National Natural Science Foundation of China(Nos.11175221,11179003,11005134,11375241,and 11275237)the West Light Foundation of Chinese Academy of Sciences(CAS)
文摘Cu-Ni core-shell nanowires, with an inner Cu core diameter of about 60 nm and varying Ni shell thicknesses （10, 30, 50, 60, and 80 nm）, were successfully fabricated in porous polycarbonate （PC） ion- track templates by a two-step etching and electrodeposition method. In our experiment, the thickness of Ni shell can be effectively tuned through the etching time of templates. The core-shell structure was confirmed by scanning electron microscopy （SEM） and transmission electron microscopy （TEM）. The X-ray diffraction （XRD） pattern elucidates the co-existence of characteristic peaks for both Cu and Ni, indicating no other phases were formed during preparation. Magnetic hysteresis loops measured via vibrating sample magnetometry （VSM） revealed that Cu-Ni core-shell nanowires with thinner Ni shell exhibited obviously diamagnetic character and together with a weak ferromagnetic activity, whereas ferromagnetic behavior was primarily measured for the wires with thicker Ni shell. With increasing Ni shell thickness, the squareness and coercivity value became smaller due to the shape anisotropy and the formation of multi-domain structure.
文摘Plasma etching technique used in the modification of fibres,yarns and fabrics of wool is re-ported.The experimental results show that the method is useful for improving wettability and re-ducing shrinkage of wool,it may be used to increase the strength of tops and yarns,and to enhancethe hand and colour of the final products.In addition,the characteristic features of the plasmamodified wool and discussions of possible mechanisms of the action are presented.
基金support from the National Natural Science Foundation of China(No.22071174)the Ministry of Eduction,Singapore(Academica Research Grant,Nos.R-279-000-538-114,R-279-000-580-112).
文摘Thiolate-protected atomically precise nanoclusters(NCs)demonstrate a series of unique luminescent characteristics attributed to their various peculiar electronic structures.Therefore,fluorescent NCs present extraordinary practical values in biosensing and bioimaging research fields.Nevertheless,restricted by the types of fluorescent NCs,there are great difficulties in promoting the development of NCs in fluorescent research areas.As a result,it is of significant necessity for researchers to develop new synthetic pathways to produce high-quality fluorescent NCs.According to the analysis about the structural characteristics of fluorescent NCs,some general features like longer motif and higher ligand-to-metal ratio can be found,consistent to some presented regularities in etching reaction.Consequently,in this work,we used Au_(25)(MHA)_(18)(MHA=6-mercaptohexanoic acid)as a model nanocluster and utilized the etching reaction to systematically explore etching products and their corresponding luminescent properties.Moreover,we also identified three main reaction processes in the entire etching reaction process,which can generate new metal nanocluster species with various fluorescent properties.Hence,the etching reaction will provide a good platform to produce new luminescent metal NC species.
文摘Porous silicon (PS) was fabricated by laser-induced etching (LIE) process. The objective of this study is to investigate the selected LIE parameters to control size and shape of nanostructures,which are considered important factors in semiconductor device applications. Photoluminescence output intensity becomes stronger due to the increase in the number of emitted photons on the porous surface. There is a dramatic increase in photoluminescence intensity due to the increase of porosity as a function of laser power density. The increase in electrolyte concentration is an important parameter to accelerate the dissolution reaction on the interface layer between the electrolyte solution and wafer surface. PS spectra displayed a stronger Raman intensity than crystalline bulk Si;also the PS spectrum was shifted and broadened as a function of LIE parameters.
基金supported by the National Natural Science Foundation of China(Nos.51805220 and 61405078)the Jiangsu University Study-abroad Fund(No.UJS-2017-013)support of the Young Backbone Teacher Cultivating Project of Jiangsu University(No.5521220008)。
文摘An effective method based on laser etching and driving layer strategy was proposed to prepare patterned Ag nanoparticles(Ag NPs)on fluorine-doped tin oxide(FTO)/glass substrate and thus to enhance the photoelectric properties.This method successively included depositing an aluminum-doped zinc oxide(AZO)driving layer,laser etching,depositing an Ag layer,furnace annealing and laser removal.Different AZO and Ag layer thicknesses were adopted,and the surface morphology,crystal structure and photoelectric properties were investigated.An Ag NPs/FTO/glass sample without an AZO driving layer was prepared for comparison.It was found that furnace annealing of the Ag layer combined with the AZO driving layer,rather than that without the AZO driving layer,was more conducive to generating patterned Ag NPs.Using a 20-nmthick AZO layer and a 150-nm-thick Ag layer led to the formation of uniformly distributed Ag NPs being aligned along the laser-etched grooves to form a pattern.The as-obtained sample had the best comprehensive photoelectric property with an average transmittance of 79.95%,a sheet resistance of 7.11Ω/sq and the highest figure of merit of 1.50×10^(-2)Ω^(-1),confirming the feasibility of the proposed method and providing enlightenment for related researches of transparent conductive oxide-based films.
