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Effect of Annealing Temperature on the Ferroelectric Properties of BiFeO_3 Thin Films Prepared by Sol-gel Process
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作者 王秀章 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2010年第3期384-387,共4页
Sol-gel process was adopted to prepare BiFeO3 films.BiFeO3 films were deposited on LaNiO3 coated Si(100) substrates annealed at 500 and 550 ℃,respectively.The X-ray diffraction results reveal that BiFeO3 film has a... Sol-gel process was adopted to prepare BiFeO3 films.BiFeO3 films were deposited on LaNiO3 coated Si(100) substrates annealed at 500 and 550 ℃,respectively.The X-ray diffraction results reveal that BiFeO3 film has a rhombohedrally distorted perovskite structure with space group R3c.The film annealed at 500 ℃ has larger remnant polarization(Pr) of 35.3 μC/cm2.For the film annealed at 550 ℃,smaller remnant polarization of Pr=4.8 μC/cm^2 is observed for its low breakdown electric field.Lower leakage conduction is observed in the film annealed at 500 ℃ at low applied field. 展开更多
关键词 MULTIFERROICS bifeo3 thin film sol-gel method FERROELECTRICITY dielectric property
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Off-stoichiometry indexation of BiFeO_3 thin film on silicon by Rutherford backscattering spectrometry
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作者 Ze-Song Wang Ren-Zheng Xiao +6 位作者 Chang-Wei Zou Wei Xie Can-Xin Tian Shu-Wen Xue Gui-Ang Liu Neena Devi De-Jun Fu 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第4期503-508,共6页
BiFeO3 is a multiferroic material with physical properties very sensitive to its stoichiometry.BiFeO3 thin films on silicon substrate are prepared by the sol–gel method combined with layer-by-layer annealing and fina... BiFeO3 is a multiferroic material with physical properties very sensitive to its stoichiometry.BiFeO3 thin films on silicon substrate are prepared by the sol–gel method combined with layer-by-layer annealing and final annealing schemes.X-ray diffraction and scanning electron microscopy are employed to probe the phase structures and surface morphologies.Using Rutherford backscattering spectrometry to quantify the nonstoichiometries of BiFeO3 thin films annealed at 100?C–650?C.The results indicate that Bi and Fe cations are close to the stoichiometry of BiFeO3,whereas the deficiency of O anions possibly plays a key role in contributing to the leakage current of 10^-5 A/cm^2 in a wide range of applied voltage rather than the ferroelectric polarizations of BiFeO3 thin films annealed at high temperature. 展开更多
关键词 bifeo3 thin films off-stoichiometry high temperature annealing backscattering spectrometry
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Interfacial-Strain-Induced Structural and Polarization Evolutions in Epitaxial Multiferroic BiFeO_3(001) Thin Films 被引量:1
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作者 郭海中 Ruiqiang Zhao +13 位作者 Kui-juan Jin Lin Gu Dongdong Xiao Zhenzhong Yang Xiaolong Li Le Wang Xu He Junxing Gu Qian Wan Can Wang Huibin Lu Chen Ge Meng He Guozhen Yang 《功能材料信息》 2015年第3期19-27,共9页
Varying the film thickness is a precise route to tune the interfacial strain to manipulate the properties of the multiferroic materials.Here,to explore the effects of the interfacial strain on the properties of the mu... Varying the film thickness is a precise route to tune the interfacial strain to manipulate the properties of the multiferroic materials.Here,to explore the effects of the interfacial strain on the properties of the multiferroic BiFeO_3films,we investigated thickness-dependent structural and polarization evolutions of the BiFeO_3 films.The epitaxial growth with an atomic stacking sequence of BiO/TiO_2 at the interface was confirmed by scanning transmission electron microscopy.Combining X-ray diffraction experiments and first-principles calculations,a thickness-dependent structural evolution was observed from a fully strained tetragonality to a partially relaxed one without any structural phase transition or rotated twins.The tetragonality(c/a) of the BiFeO_3 films increases as the film thickness decreases,while the polarization is in contrast with this trend,and the size effect including the depolarization field plays a crucial role in this contradiction in thinner films.These findings offer an alternative strategy to manipulate structural and polarization properties by tuning the interfacial strain in epitaxial multiferroic thin films. 展开更多
关键词 功能材料 材料科学 材料 BFO
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Remarkable Improvement of Ferroelectric Properties and Leakage Current in BiFeO_3 Thin Films by Nd Modification
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作者 韩冬 王华 +2 位作者 XU Jiwen ZHANG Xiaowen YANG Ling 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第1期64-67,共4页
Ferroelectric and leakage properties are important for ferroelectric applications. Pure and Nd-doped(x=0.05-0.20) BiFeO3 thin films were fabricated by sol-gel method on FTO substrates. The phase structure, surface m... Ferroelectric and leakage properties are important for ferroelectric applications. Pure and Nd-doped(x=0.05-0.20) BiFeO3 thin films were fabricated by sol-gel method on FTO substrates. The phase structure, surface morphology, leakage current, ferroelectric properties, and optical properties of BiFeO3-based thin films were investigated. The substitution of Nd^3+ ions for the Bi^3+ site converts the structure from rhombohedral to coexisting tetragonal and orthorhombic. Nd doping improves the crystallinity of BiFeO3 thin films. The leakage current of Nd-doped BiFeO3 decreases by two to three orders of magnitude compared with that of pure BiFeO3. Among the samples, 15% Nd-doped BiFeO3 exhibits the strongest ferroelectric polarization of 17.96 μC/cm^2. Furthermore, the absorption edges of Bi1-xNdxFeO3 thin films show a slight red-shift after Nd doping. 展开更多
关键词 bifeo3 thin film FERROELECTRIC leakage current SOL-GEL
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Preparation of BiFeO_3 thin films by pulsed laser deposition method
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作者 张冠军 程晋荣 +2 位作者 陈蕊 俞圣雯 孟中岩 《中国有色金属学会会刊:英文版》 CSCD 2006年第B01期123-125,共3页
BiFeO3 (BFO) thin films were prepared on Pt(111)/TiO2/SiO2/Si(100) substrates by the pulsed-laser deposition (PLD) technique at a low temperature of 450℃. The XRD results indicate that the BFO thin films are of perov... BiFeO3 (BFO) thin films were prepared on Pt(111)/TiO2/SiO2/Si(100) substrates by the pulsed-laser deposition (PLD) technique at a low temperature of 450℃. The XRD results indicate that the BFO thin films are of perovskite structure with the presence of small amount of second phases. The oxygen pressures have great effect on the crystalline structures and dielectric properties of BFO thin films. The dielectric constant of the BFO thin films decreases with increasing oxygen pressures, achieving 186, 171 and 160 at the frequency of 104 Hz for the oxygen pressures of 0.666, 1.333 and 13.332 Pa, respectively. The BFO thin films prepared at the oxygen pressure of 0.666 Pa reveal a saturated hysteresis loop with the remanent polarization of 7.5 μC/cm2 and the coercive field of 176 kV/cm. 展开更多
关键词 bifeo3 薄膜 脉冲激光沉积法 制备 结构 介电性质
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Dielectric properties of BiFeO_3-PbTiO_3 thin films prepared by PLD
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作者 陈蕊 俞圣雯 +2 位作者 张冠军 程晋荣 孟中岩 《中国有色金属学会会刊:英文版》 CSCD 2006年第B01期116-118,共3页
BiFeO3-PbTiO3 (BFO-PT) thin films were prepared on Pt/TiO2/SiO2/Si substrates by pulsed-laser deposition (PLD) technique under different oxygen pressures. The structures of the films were characterized by means of XRD... BiFeO3-PbTiO3 (BFO-PT) thin films were prepared on Pt/TiO2/SiO2/Si substrates by pulsed-laser deposition (PLD) technique under different oxygen pressures. The structures of the films were characterized by means of XRD. The current densities were performed to check the conductivity of the films. The dielectric constant and loss factor (tanδ) of the films were measured. The results show that the BFO-PT layers are mainly perovskite structured; the film deposited under 6.665 Pa exhibits low leakage current, low dielectric loss (0.017-0.041) and saturated hysteresis loop with polarization (Pr) value and coercive field (Ec) of 3 μC/cm2 and 109 kV/cm. 展开更多
关键词 bifeo3-PbTiO3薄膜 脉冲激光沉积法 制备 介电性质 铁电性质
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Local leakage current behaviours of BiFeO_3 films 被引量:1
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作者 邹成 陈斌 +5 位作者 朱小健 左正笏 刘宜伟 陈远富 詹清峰 李润伟 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第11期493-498,共6页
The leakage current behaviours of polycrystalline BiFeO3 thin films are investigated by using both conductive atomic force microscopy and current-voltage characteristic measurements. The local charge transport pathway... The leakage current behaviours of polycrystalline BiFeO3 thin films are investigated by using both conductive atomic force microscopy and current-voltage characteristic measurements. The local charge transport pathways are found to be located mainly at the grain boundaries of the films. The leakage current density can be tuned by changing the post-annealing temperature, the annealing time, the bias voltage and the light illumination, which can be used to improve the performances of the ferroelectric devices based on the BiFeOa films. A possible leakage mechanism is proposed to interpret the charge transports in the polycrystalline BiFeO3 films. 展开更多
关键词 polycrystalline bifeo3 thin films local leakage current conductive atomic force microscopy
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CSD法在亲水性的FTO基板上制备BiFeO3薄膜及其电性能的研究 被引量:3
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作者 程蒙 谈国强 +2 位作者 夏傲 任慧君 王艳 《功能材料》 EI CAS CSCD 北大核心 2012年第2期250-252,共3页
利用化学溶液沉积法在亲水性的FTO基板上制备BiFeO3薄膜。利用XRD、FE-SEM、XPS、Agi-lent E4980A精密LCR仪及TF-Analyzer2000等分析手段对BiFeO3薄膜进行表征。结果表明,薄膜为纯相的结晶良好的多晶BiFeO3薄膜,由100~300nm的BiFeO3晶... 利用化学溶液沉积法在亲水性的FTO基板上制备BiFeO3薄膜。利用XRD、FE-SEM、XPS、Agi-lent E4980A精密LCR仪及TF-Analyzer2000等分析手段对BiFeO3薄膜进行表征。结果表明,薄膜为纯相的结晶良好的多晶BiFeO3薄膜,由100~300nm的BiFeO3晶粒紧密的堆积而成,表面均匀平整。薄膜厚度为450nm。Fe的氧化态为Fe3+,并没有Fe2+出现。在10kHz时,介电常数和损耗分别为134和0.005。薄膜的剩余极化率为0.58μC/cm2,在0~250kV/cm的测试电场下漏导电流步伐保持在10-6 A/cm2以下。 展开更多
关键词 bifeo3 多铁薄膜 化学溶液沉积法 亲水性
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(110)取向BiFeO3薄膜界面诱导结构特性研究 被引量:2
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作者 冯燕朋 唐云龙 +1 位作者 朱银莲 马秀良 《电子显微学报》 CAS CSCD 北大核心 2020年第6期680-686,共7页
在正交(010)取向的GdScO3衬底上设计并生长了(110)取向BiFeO3薄膜和PbTiO3/BiFeO3双层膜,并利用像差校正扫描透射电子显微镜对其界面结构进行了细致的研究。发现在BiFeO3/GdScO3界面以上两个单胞范围内BiFeO3的极化消失,可能形成了正交... 在正交(010)取向的GdScO3衬底上设计并生长了(110)取向BiFeO3薄膜和PbTiO3/BiFeO3双层膜,并利用像差校正扫描透射电子显微镜对其界面结构进行了细致的研究。发现在BiFeO3/GdScO3界面以上两个单胞范围内BiFeO3的极化消失,可能形成了正交结构,第3~4个单胞范围的BiFeO3极化由于界面效应而受到一定的抑制;同时发现在PbTiO3/BiFeO3界面附近的PbTiO3面外晶格参数有所减小,这可能与其极化方向转向面内方向有关。 展开更多
关键词 铁电薄膜 bifeo3 (110)取向 界面结构
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溶胶-凝胶法制备BiFeO_3薄膜的结构及物性研究 被引量:20
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作者 李丽 刘保亭 +2 位作者 张新 闫小兵 郭颖楠 《人工晶体学报》 EI CAS CSCD 北大核心 2008年第6期1430-1434,共5页
应用溶胶-凝胶法在Pt/Ti/SiO2/Si(001)基片上制备了BiFeO3薄膜,构架了Pt/BiFeO3/Pt电容器。采用X射线衍射仪和铁电测试仪研究了Pt/BiFeO3/Pt电容器的结构和物理性能。实验发现BiFeO3最佳的结晶温度为600℃,X射线衍射图谱显示BiFeO3薄膜... 应用溶胶-凝胶法在Pt/Ti/SiO2/Si(001)基片上制备了BiFeO3薄膜,构架了Pt/BiFeO3/Pt电容器。采用X射线衍射仪和铁电测试仪研究了Pt/BiFeO3/Pt电容器的结构和物理性能。实验发现BiFeO3最佳的结晶温度为600℃,X射线衍射图谱显示BiFeO3薄膜结晶状况良好,原子力显微镜照片显示BiFeO3表面颗粒均匀。Pt/BiFeO3/Pt电容器具有良好的电学性能,在驱动电压为5V的情况下,Pt/BiFeO3/Pt电容器的电滞回线具有良好的对称性,漏电流密度小于10-4A/cm2,研究发现BiFeO3薄膜log(J)/log(E)关系满足空间电荷限制电流传导机制。 展开更多
关键词 铁酸铋薄膜 溶胶-凝胶法 铁电性能 漏电流
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BiFeO_3薄膜的液相自组装制备与表征 被引量:5
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作者 谈国强 博海洋 +2 位作者 苗鸿雁 夏傲 贺中亮 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2010年第1期83-86,共4页
利用自组装单层膜技术,以三氯十八烷基硅烷(OTS)为模板,以硝酸铋和硝酸铁为原料,柠檬酸为络合剂,在玻璃基片上制备了铁酸铋晶态薄膜.探讨了薄膜的煅烧温度和沉积温度对BiFeO3薄膜的影响.通过X射线衍射(XRD)、扫描电镜(SEM)及原子力显微... 利用自组装单层膜技术,以三氯十八烷基硅烷(OTS)为模板,以硝酸铋和硝酸铁为原料,柠檬酸为络合剂,在玻璃基片上制备了铁酸铋晶态薄膜.探讨了薄膜的煅烧温度和沉积温度对BiFeO3薄膜的影响.通过X射线衍射(XRD)、扫描电镜(SEM)及原子力显微镜(AFM)测试手段对BiFeO3薄膜的物相组成、显微结构和表面形貌进行了表征,EDS能谱测试为铁酸铋薄膜的化学组成提供了有力的证据.结果表明:利用自组装技术在600℃热处理后成功制备出了纯净的BiFeO3晶态薄膜,当沉积温度为70~80℃时铁酸铋薄膜结晶良好,样品表面均匀、致密. 展开更多
关键词 OTS-SAMs 铁酸铋 薄膜
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BiFeO_3薄膜研究进展 被引量:11
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作者 张琼 苗鸿雁 谈国强 《硅酸盐通报》 CAS CSCD 北大核心 2007年第1期118-122,共5页
BiFeO3是少数的在室温下同时具有铁磁性和铁电性的铁磁电材料之一,在信息存储、传感器和自旋电子器件等方面都有潜在的应用前景。本文通过对BiFeO3薄膜的结构、磁性起源、制备工艺和应用领域等方面的综述,提出并设计了水热法和仿生法这... BiFeO3是少数的在室温下同时具有铁磁性和铁电性的铁磁电材料之一,在信息存储、传感器和自旋电子器件等方面都有潜在的应用前景。本文通过对BiFeO3薄膜的结构、磁性起源、制备工艺和应用领域等方面的综述,提出并设计了水热法和仿生法这两种新的制备BiFeO3薄膜的湿化学方法,并展望了BiFeO3薄膜今后的研究和发展趋势。 展开更多
关键词 bifeo3薄膜 铁磁电材料 研究进展
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化学液相法制备BiFeO_3薄膜 被引量:2
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作者 刘珊 李剑 潘伟 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2007年第A01期918-920,共3页
以硝酸铋、硝酸铁以及柠檬酸为原料通过化学液相法在普通载玻片、(100)Si片和(100)ITO玻璃上分别制备了不同厚度的BiFeO3薄膜,研究了热处理温度对BiFeO3的形成以及微观形貌的影响。Si片上的薄膜由于与衬底之间的反应,得到纯BiFeO3相热... 以硝酸铋、硝酸铁以及柠檬酸为原料通过化学液相法在普通载玻片、(100)Si片和(100)ITO玻璃上分别制备了不同厚度的BiFeO3薄膜,研究了热处理温度对BiFeO3的形成以及微观形貌的影响。Si片上的薄膜由于与衬底之间的反应,得到纯BiFeO3相热处理温度需低于650℃,而在普通载玻片和ITO玻璃衬底上,525℃到650℃均可以得到结晶良好的纯BiFeO3薄膜。550℃热处理得到的BiFeO3薄膜中的晶粒尺寸大约在70~80nm之间,650℃热处理得到的晶粒尺寸约有140nm。磁性能测试证明薄膜有弱铁磁性,饱和磁化强度约在7000~9000A/m。 展开更多
关键词 bifeo3 薄膜 化学液相法
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偏轴磁控溅射法外延BiFeO_3薄膜的介电性能与阻变效应 被引量:1
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作者 宋建民 代秀红 +5 位作者 梁杰通 赵磊 周阳 葛大勇 孟旭东 刘保亭 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2018年第9期1017-1021,共5页
利用偏轴射频磁控溅射法,在(001)SrTiO_3(STO)单晶基片上制备了Pt/BiFeO_3/La_(0.5)Sr_(0.5)CoO_3/STO(Pt/BFO/LSCO/STO)异质结电容器。研究了BiFeO_3薄膜的结构和物理性能。原子力显微镜(AFM)和X射线衍射(XRD)分析表明:BFO薄膜结晶质... 利用偏轴射频磁控溅射法,在(001)SrTiO_3(STO)单晶基片上制备了Pt/BiFeO_3/La_(0.5)Sr_(0.5)CoO_3/STO(Pt/BFO/LSCO/STO)异质结电容器。研究了BiFeO_3薄膜的结构和物理性能。原子力显微镜(AFM)和X射线衍射(XRD)分析表明:BFO薄膜结晶质量良好,且为单相(00l)外延钙钛矿结构。介电性能测试结果发现:在5 V驱动电压下,Pt/BFO/LSCO电容器呈现饱和的蝶形回线,调谐率和介电损耗分别为14.1%和0.19。此外,阻变机制研究表明:在0→5→0 V正向电压和0→–5→0 V负向电压下,阻变均为高阻向低阻转变规律,呈现为铁电二极管的阻变开关行为。通过I–V曲线拟合,得到0→5→0→–5 V时阻变机制为空间电荷限制电流陷阱能级的填充和脱陷,而–5→0 V时符合界面限制的F-N隧穿机制。 展开更多
关键词 铁酸铋薄膜 介电常数 阻变效应 导电机制
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Dy^(3+)掺杂BiFeO_3薄膜的晶格转变和磁性能研究(英文) 被引量:1
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作者 刘珊 李剑 潘伟 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2009年第A02期653-655,共3页
以硝酸铋、硝酸铁以及硝酸镝等无机硝酸盐为原料通过化学液相法在Pt(111)/Ti/SiO2/Si上制备了Dy3+掺杂的BiFeO3薄膜,研究了Dy3+掺杂量的变化对Bi1-xDyxFeO3薄膜的晶体结构和磁性的影响。Dy3+掺杂量不高于10%的Bi1-xDyxFeO3薄膜可以得到... 以硝酸铋、硝酸铁以及硝酸镝等无机硝酸盐为原料通过化学液相法在Pt(111)/Ti/SiO2/Si上制备了Dy3+掺杂的BiFeO3薄膜,研究了Dy3+掺杂量的变化对Bi1-xDyxFeO3薄膜的晶体结构和磁性的影响。Dy3+掺杂量不高于10%的Bi1-xDyxFeO3薄膜可以得到与纯BiFeO3相同的晶体结构。随着Dy3+掺杂量的进一步增大,Bi1-xDyxFeO3薄膜的晶体结构发生变化,晶格从菱心结构转变为单斜或四方结构。磁性测试显示:随着Dy3+掺杂量的增加Bi1-xDyxFeO3薄膜的磁性增强,同时从无饱和磁化强度和零磁滞的S型磁化曲线的形状判断,薄膜由于铁磁反铁磁转变时两磁性相竞争表现出自旋玻璃态的特征。 展开更多
关键词 稀土离子掺杂 bifeo3薄膜 磁性 化学液相法
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BiFeO_3薄膜的图案化制备及性能研究 被引量:2
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作者 谈国强 赵高扬 +2 位作者 王艳 程蒙 任慧君 《陕西科技大学学报(自然科学版)》 2012年第4期22-26,共5页
采用短波紫外光照射仪(λ=184.9nm)作为光刻设备,在光掩膜的覆盖下,将沉积在(111)Si基板上的十八烷基三氯硅烷(OTS)自组装单分子层(SAMs)进行刻蚀形成图案,并结合溶胶-凝胶法在功能化的OTS-SAMs表面制备图案化BiFeO3薄膜,并对BiFeO3薄... 采用短波紫外光照射仪(λ=184.9nm)作为光刻设备,在光掩膜的覆盖下,将沉积在(111)Si基板上的十八烷基三氯硅烷(OTS)自组装单分子层(SAMs)进行刻蚀形成图案,并结合溶胶-凝胶法在功能化的OTS-SAMs表面制备图案化BiFeO3薄膜,并对BiFeO3薄膜性能进行研究.结果表明,所得图案化BiFeO3薄膜为六方扭曲的钙钛矿结构,图案边缘轮廓清晰,宽度在200μm左右;在最大测试电场为385kV/cm下,所得电滞回线有较好的对称性和饱和性,剩余极化强度为0.17μC/cm2,饱和极化强度为3.8μC/cm2,矫顽场强为19kV/cm.在1kHz~1MHz的频率范围内,介电常数随频率增加逐渐减小,介电损耗较小. 展开更多
关键词 bifeo3 薄膜 铁电性 介电性 图案化
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退火气氛对BiFeO_3薄膜电性能的影响 被引量:1
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作者 王国强 刘红日 《华中师范大学学报(自然科学版)》 CAS CSCD 北大核心 2011年第3期396-400,共5页
采用溶胶-凝胶法在氟掺杂SnO2/glass(FTO/glass)衬底上制备BiFeO3(BFO)薄膜,薄膜的退火气氛分别是空气、氧气、氮气,退火温度为500°C.XRD衍射图样表明BiFeO3薄膜结晶充分,没有杂相.剖面扫描电镜测试结果表明薄膜的厚度为600nm.铁... 采用溶胶-凝胶法在氟掺杂SnO2/glass(FTO/glass)衬底上制备BiFeO3(BFO)薄膜,薄膜的退火气氛分别是空气、氧气、氮气,退火温度为500°C.XRD衍射图样表明BiFeO3薄膜结晶充分,没有杂相.剖面扫描电镜测试结果表明薄膜的厚度为600nm.铁电性测试表明在空气中退火的BiFeO3薄膜能够观察到饱和电滞回线,其剩余极化强度为53.9μC/cm2;在氧气和氮气气氛中退火的BiFeO3薄膜的剩余极化强度分别为53.6μC/cm2和39.2μC/cm2.在空气和氧气气氛中退火的BiFeO3薄膜,在相同的测试频率时表现出相近的介电常数.此外,在不同气氛中退火制备的BiFeO3薄膜具有不同的漏电流特性. 展开更多
关键词 bifeo3薄膜 溶胶-凝胶法 X射线衍射 铁电性 介电性能
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溶胶-凝胶法制备0.1BiFeO_3-0.9SrBi_2Nb_2O_9铁电薄膜的结构和光学性质研究 被引量:1
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作者 杨向荣 顾豪爽 +3 位作者 胡永明 尤晶 袁颖 胡正龙 《功能材料》 EI CAS CSCD 北大核心 2007年第9期1437-1439,共3页
采用硝酸铋[Bi(NO3)3.5H2O]、硝酸锶[Sr(NO3)2]、硝酸铁[Fe(NO3)3.9H2O]和乙醇铌[Nb(OC2H5)5]作为起始原料,乙二醇甲醚[C3H8O2]作为溶剂配制掺Fe的SrBi2Nb2O9前驱体溶液,利用溶胶-凝胶法在石英衬底上制备出0.1BiFeO3-0.9 Sr-Bi2Nb2O9铁... 采用硝酸铋[Bi(NO3)3.5H2O]、硝酸锶[Sr(NO3)2]、硝酸铁[Fe(NO3)3.9H2O]和乙醇铌[Nb(OC2H5)5]作为起始原料,乙二醇甲醚[C3H8O2]作为溶剂配制掺Fe的SrBi2Nb2O9前驱体溶液,利用溶胶-凝胶法在石英衬底上制备出0.1BiFeO3-0.9 Sr-Bi2Nb2O9铁电薄膜。研究了该薄膜的表面形貌、组分、晶体结构和光学性质。结果表明,经400℃退火后薄膜为非晶结构,而在空气中经600℃退火1h后,沉积的薄膜晶化成钙钛矿结构。制备的薄膜表面平整,颗粒分布均匀,表现出良好的光透过性,该薄膜的光学能隙大约为2.5eV。 展开更多
关键词 bifeo3一SrBi2Nb2O9 铁电薄膜 溶胶-凝胶 光学性质
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sol-gel法制备BiLaFeO_3薄膜及其电性能 被引量:2
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作者 刘红日 《电子元件与材料》 CAS CSCD 北大核心 2005年第9期8-10,共3页
用sol-gel方法在LaNiO3包覆的Si衬底上制备了(010)择优取向的BiFeO3以及Bi0.95La0.05FeO3薄膜,XRD分析结果表明,通过La的掺杂BiFeO3的择优取向度由77.0%增加到96.6%;铁电性的测试表明,通过La掺杂,使薄膜的介电性和铁电性得到了增强,剩... 用sol-gel方法在LaNiO3包覆的Si衬底上制备了(010)择优取向的BiFeO3以及Bi0.95La0.05FeO3薄膜,XRD分析结果表明,通过La的掺杂BiFeO3的择优取向度由77.0%增加到96.6%;铁电性的测试表明,通过La掺杂,使薄膜的介电性和铁电性得到了增强,剩余极化强度由0.15×10–6C/cm2增加到0.2×10–6C/cm2。 展开更多
关键词 无机非金属材料 铁磁电材料 bifeo3薄膜 择优取向 掺杂 铁电性
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Effect of Tb Doping on Structural and Electrical Properties of BiFeO_3 Thin Films Prepared by Sol-Gel Technique 被引量:2
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作者 Guohua Dong Guoqiang Tan +2 位作者 Wenlong Liu Ao Xia Huijun Ren 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2014年第4期365-370,共6页
Bil_xTbxFe03 thin films were prepared on Sn02 (fluorine doped tin oxide) substrates by a sol-gel method. The structural and electrical properties of the BiFe03 thin films were characterized and tested. The results i... Bil_xTbxFe03 thin films were prepared on Sn02 (fluorine doped tin oxide) substrates by a sol-gel method. The structural and electrical properties of the BiFe03 thin films were characterized and tested. The results indicated that the diffraction peak of the Tb-doped BiFe03 films was shifted towards right as the doping amounts were increased. The structure was transformed from the rhombohedral to tetragonal/orthorhombic phase. The Bio.sgTbo.11Fe03 thin film showed the well-developed P-E loops, which enhanced remnant polarization (Pr = 88.05 μC/cm2) at room temperature. The dielectric constant and dielectric loss of Bio.sgTbo.llFe03 thin film at 100 kHz were 185 and 0.018, respectively. Furthermore, the Bio.seTbo.llFe03 thin film showed a relatively low leakage current density of 2.07×10-5 A/cm2 at an applied electric field of 150 kV/cm. The X- ray photoelectron spectroscopy (XPS) spectra indicated that the presence of Fe2+ ions in the Bio.egTbo.11Fe03 thin film was less than that in the pure BiFe03. 展开更多
关键词 bifeo3 thin films Tb doping Sol-gel method Ferroelectric properties
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