The Effect of Pressure on the Dissociation of H_2/CH_4Gas Mixture during Diamond Films Growth via Chemical Vapor Deposition

Monte Carlo simulations are adopted to study the electron motion in the mixture of H2 and CH4 during diamond synthesis via Glow Plasma-assisted Chemical Vapor Deposition (GPCVD). The non-uniform electric field is used and the avalanche of electrons is taken into account in this simulation. The average energy distribution of electrons and the space distribution of effective species such as CH3, CH+3, CH+ and H at various gas pressures are given in this paper, and optimum experimental conditions are inferred from these results.

C_2H_4-O_2混合气体直接起爆的临界能量

主要基于化学动力学和Ng模型,对C2H4-O2混合气体的爆轰胞格尺寸进行预测;结合Lee表面积能量模型,预测物质在不同初始压力和化学当量比的条件下,直接起爆引起球面爆轰的临界起爆能量。直接起爆实验主要采用高压电点火提供起爆能量,起爆能量通过放电过程中电流的输出信号确定。结果表明,理论预测与实验值较吻合。首先,通过化学动力学计算得出ZND模型的爆轰参数,利用Ng模型得出爆轰胞格尺寸与ZND诱导区长度之间的比例因数A在不同初始压力与当量比的条件下分别为:A=43.815(1+p1/p0)-0.123 71和A=8.531exp(φ/3.135)+28.644,在此基础上对爆轰胞格尺寸进行定量预测。胞格尺寸的理论预测与实验结果吻合。其次,把爆轰胞格尺寸作为中间特征参数并结合Lee的表面积能量模型,提出可以预测临界起爆能量的定量模型,并得出C2H4-O2混合气体直接起爆的临界起爆能量与初始压力和化学当量比的参量拟合关系分别为Ec=0.332(p1/p0)-2.017和Ec=exp[3.951(φ-1.401)2-1.9]。