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A DFT theoretical study of CH_4 dissociation on gold-alloyed Ni(111)surface 被引量:2
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作者 Hongyan Liu Ruixia Yan +2 位作者 Riguang Zhang Baojun Wang Kechang Xie 《Journal of Natural Gas Chemistry》 EI CAS CSCD 2011年第6期611-617,共7页
A density-functional theory(DFT)method has been conducted to systematically investigate the adsorption of CHx(x=0~4)as well as the dissociation of CHx(x=1~4)on(111)facets of gold-alloyed Ni surface.The resul... A density-functional theory(DFT)method has been conducted to systematically investigate the adsorption of CHx(x=0~4)as well as the dissociation of CHx(x=1~4)on(111)facets of gold-alloyed Ni surface.The results have been compared with those obtained on pure Ni(111)surface.It shows that the adsorption energies of CHx(x=1~3)are lower,and the reaction barriers of CH4 dissociation are higher in the first and the fourth steps on gold-alloyed Ni(111)compared with those on pure Ni(111).In particular,the rate-determining step for CH4 dissociation is considered as the first step of dehydrogenation on gold-alloyed Ni(111),while it is the fourth step of dehydrogenation on pure Ni(111).Furthermore,the activation barrier in rate-determining step is higher by 0.41 eV on gold-alloyed Ni(111)than that on pure Ni(111).From above results,it can be concluded that carbon is not easy to form on gold-alloyed Ni(111)compared with that on pure Ni(111). 展开更多
关键词 ADSORPTION ch4 dissociation reaction barrier d-band center
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Effect of rapidly depressurizing and rising temperature on methane hydrate dissociation 被引量:10
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作者 Qingbai Wu Yingmei Wang Jing Zhan 《Journal of Natural Gas Chemistry》 EI CAS CSCD 2012年第1期91-97,共7页
关键词 dissociation of ch4 hydrate method of rapid depressurization method of rising temperature
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The Effect of Pressure on the Dissociation of H_2/CH_4Gas Mixture during Diamond Films Growth via Chemical Vapor Deposition 被引量:1
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作者 赵庆勋 辛红丽 +2 位作者 韩佳宁 文钦若 杨景发 《Plasma Science and Technology》 SCIE EI CAS CSCD 2002年第1期1113-1118,共6页
Monte Carlo simulations are adopted to study the electron motion in the mixture of H2 and CH4 during diamond synthesis via Glow Plasma-assisted Chemical Vapor Deposition (GPCVD). The non-uniform electric field is used... Monte Carlo simulations are adopted to study the electron motion in the mixture of H2 and CH4 during diamond synthesis via Glow Plasma-assisted Chemical Vapor Deposition (GPCVD). The non-uniform electric field is used and the avalanche of electrons is taken into account in this simulation. The average energy distribution of electrons and the space distribution of effective species such as CH3, CH+3, CH+ and H at various gas pressures are given in this paper, and optimum experimental conditions are inferred from these results. 展开更多
关键词 The Effect of Pressure on the dissociation of H2/ch4Gas Mixture during Diamond Films Growth via Chemical Vapor Deposition CH
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