In this work, the impact of the substrate annealing temperature on the thickness and roughness of La<sub>2</sub>Ti<sub>2</sub>O<sub>7</sub> thin films was verified. A group of LTO T...In this work, the impact of the substrate annealing temperature on the thickness and roughness of La<sub>2</sub>Ti<sub>2</sub>O<sub>7</sub> thin films was verified. A group of LTO Thin films was grown on Si (100) substrates successfully via pulsed laser deposition technique (PLD) at various annealing temperatures with a constant numbers of pulses and energy per pulse. Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM) were used to investigate the thickness and roughness of the deposited <span style="white-space:normal;">La</span><sub style="white-space:normal;">2</sub><span style="white-space:normal;">Ti</span><sub style="white-space:normal;">2</sub><span style="white-space:normal;">O</span><sub style="white-space:normal;">7</sub> thin films. The average thickness of the thin films was decreased due to the increasing in the annealing temperature linearly;the maximum thickness was found (231 nm) when LTO thin film deposited at 500<span style="white-space:nowrap;"><span style="white-space:nowrap;">°</span><span style="white-space:nowrap;">C</span></span>. The root mean square roughness was increased linearly with increasing the substrate Temperatures. The minimum roughness was found (0.254 nm) when LTO deposited at (500<span style="white-space:nowrap;"><span style="white-space:nowrap;">°</span><span style="white-space:nowrap;">C</span></span>). From the obtained results, its clear evidence that the annealing temperature has an influence on the thickness and roughness of the LTO thin films.展开更多
本文通过传统固相法制备La_2Ti_2O_7陶瓷,研究不同烧结温度和时间对La_2Ti_2O_7陶瓷的铁电性影响,通过XRD和铁电测试手段分别对其晶体结构和铁电性进行表征,并对影响机理作了初步探讨,以探索最佳的制备工艺。结果表明:当烧结温度为1400...本文通过传统固相法制备La_2Ti_2O_7陶瓷,研究不同烧结温度和时间对La_2Ti_2O_7陶瓷的铁电性影响,通过XRD和铁电测试手段分别对其晶体结构和铁电性进行表征,并对影响机理作了初步探讨,以探索最佳的制备工艺。结果表明:当烧结温度为1400℃及烧结时间为24 h时,La_2Ti_2O_7陶瓷的铁电性较好,漏电流最小,其剩余极化Pγ为3.96μC/cm^2,矫顽场Ec为27.8 k V/cm。展开更多
基金Supported by the National Natural Science Foundation of China(11275203,U1732148)National Key Scientific Instrument and Equipment Development Project(2011YQ130018)Technological Development Grant of Hefei Science Center of CAS(2014TDG-HSC002)
文摘In this work, the impact of the substrate annealing temperature on the thickness and roughness of La<sub>2</sub>Ti<sub>2</sub>O<sub>7</sub> thin films was verified. A group of LTO Thin films was grown on Si (100) substrates successfully via pulsed laser deposition technique (PLD) at various annealing temperatures with a constant numbers of pulses and energy per pulse. Scanning Electron Microscope (SEM) and Atomic Force Microscope (AFM) were used to investigate the thickness and roughness of the deposited <span style="white-space:normal;">La</span><sub style="white-space:normal;">2</sub><span style="white-space:normal;">Ti</span><sub style="white-space:normal;">2</sub><span style="white-space:normal;">O</span><sub style="white-space:normal;">7</sub> thin films. The average thickness of the thin films was decreased due to the increasing in the annealing temperature linearly;the maximum thickness was found (231 nm) when LTO thin film deposited at 500<span style="white-space:nowrap;"><span style="white-space:nowrap;">°</span><span style="white-space:nowrap;">C</span></span>. The root mean square roughness was increased linearly with increasing the substrate Temperatures. The minimum roughness was found (0.254 nm) when LTO deposited at (500<span style="white-space:nowrap;"><span style="white-space:nowrap;">°</span><span style="white-space:nowrap;">C</span></span>). From the obtained results, its clear evidence that the annealing temperature has an influence on the thickness and roughness of the LTO thin films.
文摘本文通过传统固相法制备La_2Ti_2O_7陶瓷,研究不同烧结温度和时间对La_2Ti_2O_7陶瓷的铁电性影响,通过XRD和铁电测试手段分别对其晶体结构和铁电性进行表征,并对影响机理作了初步探讨,以探索最佳的制备工艺。结果表明:当烧结温度为1400℃及烧结时间为24 h时,La_2Ti_2O_7陶瓷的铁电性较好,漏电流最小,其剩余极化Pγ为3.96μC/cm^2,矫顽场Ec为27.8 k V/cm。