The plasma density and electron temperature of a multi-source plasma system composed of several collisional inductively coupled plasma （ICP） cells were measured by a doubleprobe. The discharges of the ICP cells were...The plasma density and electron temperature of a multi-source plasma system composed of several collisional inductively coupled plasma （ICP） cells were measured by a doubleprobe. The discharges of the ICP cells were shown to be independent of each other. Furthermore, the total plasma density at simultaneous multi-cell discharge was observed to be approximately equal to the summation of the plasma density when the cells discharge separately. Based on the linear summation phenomenon, it was shown that a larger area plasma with a uniform density and temperature profile could be constructed with multi-collisional ICP cells.展开更多
We simulate the particle transport in a thin film deposition process made by PVD(physical vapor deposition)and present several models for projectile and target collisions in order to compute the mean free path and the...We simulate the particle transport in a thin film deposition process made by PVD(physical vapor deposition)and present several models for projectile and target collisions in order to compute the mean free path and the differential cross section(angular distribution of scattered projectiles)of the scattering process.A detailed description of collision models is of the highest importance in Monte Carlo simulations of high power impulse magnetron sputtering and DC sputtering.We derive an equation for the mean free path for arbitrary interactions(cross sections)that includes the relative velocity between the particles.We apply our results to two major interaction models:hard sphere interaction&screened Coulomb interaction.Both types of interaction separate DC sputtering from HIPIMS.展开更多
基金supported in part by National Natural Science Foundation of China(Nos.10675121,10333030)
文摘The plasma density and electron temperature of a multi-source plasma system composed of several collisional inductively coupled plasma （ICP） cells were measured by a doubleprobe. The discharges of the ICP cells were shown to be independent of each other. Furthermore, the total plasma density at simultaneous multi-cell discharge was observed to be approximately equal to the summation of the plasma density when the cells discharge separately. Based on the linear summation phenomenon, it was shown that a larger area plasma with a uniform density and temperature profile could be constructed with multi-collisional ICP cells.
基金This work was funded by the Federal Ministry of Education and Research under contract number 03 SF 0325 A.We additionally thank Dipl.-Ing.Martin Balzer,FEM,Schwabisch Gmund,Germany for his discussions and for inspiring this work.
文摘We simulate the particle transport in a thin film deposition process made by PVD(physical vapor deposition)and present several models for projectile and target collisions in order to compute the mean free path and the differential cross section(angular distribution of scattered projectiles)of the scattering process.A detailed description of collision models is of the highest importance in Monte Carlo simulations of high power impulse magnetron sputtering and DC sputtering.We derive an equation for the mean free path for arbitrary interactions(cross sections)that includes the relative velocity between the particles.We apply our results to two major interaction models:hard sphere interaction&screened Coulomb interaction.Both types of interaction separate DC sputtering from HIPIMS.
