本文报道用分子束外延(Molecular Beam Epitaxy:MBE)技术制备了优良的铬(Cr)掺杂硒化铋(Cr-Bi_(2)Se_(3))薄膜样品。通过反射高能电子衍射(Reflective High Energy Electron Diffraction:RHEED)、X射线衍射(X-ray diffraction:XRD)技术...本文报道用分子束外延(Molecular Beam Epitaxy:MBE)技术制备了优良的铬(Cr)掺杂硒化铋(Cr-Bi_(2)Se_(3))薄膜样品。通过反射高能电子衍射(Reflective High Energy Electron Diffraction:RHEED)、X射线衍射(X-ray diffraction:XRD)技术和电磁输运系统对Cr-Bi_(2)Se_(3)进行测试。实验结果显示:较低的生长温度下Cr进入Bi_(2)Se_(3)中替代Bi位形成Cr Bi;较高的生长温度下Cr进入Bi_(2)Se_(3)中的范德瓦尔斯间隙形成层间(Interlayer)CrI,这一区别导致Cr-Bi_(2)Se_(3)在生长速率及磁性等方面表现出不同的性质。所以可以通过控制生长温度来调制Cr的掺杂位置,得到更理想的效果。展开更多
At first, Cr-Si (28 wt% Cr, 72 wt% Si) and Ni-Cr (80 wt% Ni, 20 wt% Cr) thin-film materials were deposited by using sputtering method at the same parameters, and their physical and electrical properties were investiga...At first, Cr-Si (28 wt% Cr, 72 wt% Si) and Ni-Cr (80 wt% Ni, 20 wt% Cr) thin-film materials were deposited by using sputtering method at the same parameters, and their physical and electrical properties were investigated. The resistances of Cr-Si and Ni-Cr thin-film resistors decreased with the increase of deposition time (thickness) and their resistivity had no apparent variations as the deposition time increased. The temperature coefficient of resistance (TCR) of single-layer Cr-Si thin-film resistors was negative and the TCR value of single-layer Ni-Cr thin-film resistors was positive. For that, we used Cr-Si thin films as upper (or lower) layer and Ni-Cr thin films as lower (upper) layer to investigate a bi-layer thin-film structure. The deposition time of Ni-Cr thin films was fixed at 10 min and the deposition time of Cr-Si thin films was changed from 10 min to 60 min. We had found that as Cr-Si thin films were used as upper or lower layers they had similar deposition rates. We had also found that the thickness and stack method of Cr-Si thin films had large effects on the resistance and TCR values of the bi-layer thin-film resistors.展开更多
The bi-conjugate gradients(Bi-CG)and bi-conjugate residual(Bi-CR)methods are powerful tools for solving nonsymmetric linear systems Ax=b.By using Kronecker product and vectorization operator,this paper develops the Bi...The bi-conjugate gradients(Bi-CG)and bi-conjugate residual(Bi-CR)methods are powerful tools for solving nonsymmetric linear systems Ax=b.By using Kronecker product and vectorization operator,this paper develops the Bi-CG and Bi-CR methods for the solution of the generalized Sylvester-transpose matrix equationp i=1(Ai X Bi+Ci XTDi)=E(including Lyapunov,Sylvester and Sylvester-transpose matrix equations as special cases).Numerical results validate that the proposed algorithms are much more efcient than some existing algorithms.展开更多
Ⅰ. INTRODUCTION In polygrain oxide superconducting materials, owing to the weak link resulting from grain boundary and grain orientation, the increase of critical current density J_c is limited. Thus their practical ...Ⅰ. INTRODUCTION In polygrain oxide superconducting materials, owing to the weak link resulting from grain boundary and grain orientation, the increase of critical current density J_c is limited. Thus their practical application faces difficulties.展开更多
文摘本文报道用分子束外延(Molecular Beam Epitaxy:MBE)技术制备了优良的铬(Cr)掺杂硒化铋(Cr-Bi_(2)Se_(3))薄膜样品。通过反射高能电子衍射(Reflective High Energy Electron Diffraction:RHEED)、X射线衍射(X-ray diffraction:XRD)技术和电磁输运系统对Cr-Bi_(2)Se_(3)进行测试。实验结果显示:较低的生长温度下Cr进入Bi_(2)Se_(3)中替代Bi位形成Cr Bi;较高的生长温度下Cr进入Bi_(2)Se_(3)中的范德瓦尔斯间隙形成层间(Interlayer)CrI,这一区别导致Cr-Bi_(2)Se_(3)在生长速率及磁性等方面表现出不同的性质。所以可以通过控制生长温度来调制Cr的掺杂位置,得到更理想的效果。
文摘At first, Cr-Si (28 wt% Cr, 72 wt% Si) and Ni-Cr (80 wt% Ni, 20 wt% Cr) thin-film materials were deposited by using sputtering method at the same parameters, and their physical and electrical properties were investigated. The resistances of Cr-Si and Ni-Cr thin-film resistors decreased with the increase of deposition time (thickness) and their resistivity had no apparent variations as the deposition time increased. The temperature coefficient of resistance (TCR) of single-layer Cr-Si thin-film resistors was negative and the TCR value of single-layer Ni-Cr thin-film resistors was positive. For that, we used Cr-Si thin films as upper (or lower) layer and Ni-Cr thin films as lower (upper) layer to investigate a bi-layer thin-film structure. The deposition time of Ni-Cr thin films was fixed at 10 min and the deposition time of Cr-Si thin films was changed from 10 min to 60 min. We had found that as Cr-Si thin films were used as upper or lower layers they had similar deposition rates. We had also found that the thickness and stack method of Cr-Si thin films had large effects on the resistance and TCR values of the bi-layer thin-film resistors.
文摘The bi-conjugate gradients(Bi-CG)and bi-conjugate residual(Bi-CR)methods are powerful tools for solving nonsymmetric linear systems Ax=b.By using Kronecker product and vectorization operator,this paper develops the Bi-CG and Bi-CR methods for the solution of the generalized Sylvester-transpose matrix equationp i=1(Ai X Bi+Ci XTDi)=E(including Lyapunov,Sylvester and Sylvester-transpose matrix equations as special cases).Numerical results validate that the proposed algorithms are much more efcient than some existing algorithms.
基金Project supported by the National Natural Science Foundation of China and Laboratory of Rapidly Solidified Non-equilibrium Alloys
文摘Ⅰ. INTRODUCTION In polygrain oxide superconducting materials, owing to the weak link resulting from grain boundary and grain orientation, the increase of critical current density J_c is limited. Thus their practical application faces difficulties.
