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不锈钢表面Al/Cu涂层制备与第一性原理计算
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作者 李德元 李光全 张楠楠 《沈阳工业大学学报》 CAS 北大核心 2024年第2期165-171,共7页
为了研究Al/Cu涂层中金属间化合物的生成顺序和形成机理,在304不锈钢基体表面制备了Al/Cu涂层。对试样进行热处理使得Al/Cu涂层原位反应生成金属间化合物,随后测试了涂层的高温抗氧化性能。采用第一性原理计算Al-Cu金属间化合物的焓、... 为了研究Al/Cu涂层中金属间化合物的生成顺序和形成机理,在304不锈钢基体表面制备了Al/Cu涂层。对试样进行热处理使得Al/Cu涂层原位反应生成金属间化合物,随后测试了涂层的高温抗氧化性能。采用第一性原理计算Al-Cu金属间化合物的焓、熵、吉布斯自由能和热容等数据。将热力学和扩散动力学相结合,提出有效生成自由能模型来预测化合物在Al/Cu界面的生成顺序。结果表明:Al/Cu涂层中首先形成Al_(2)Cu相,在Al/Cu界面处出现了AlCu相,加热时间增加至20 h后出现了富Cu的Al_(4)Cu_(9)相。由第一性原理计算得出,Al-Cu金属间化合物的形成顺序为Al_(2)Cu→AlCu→Al_(4)Cu_(9),与实验结果一致。此外,氧化实验结果表明,涂层具有良好高温抗氧化性能。 展开更多
关键词 Al/cu涂层 304不锈钢 电弧喷涂 等离子喷涂 第一性原理计算 金属间化合物 抗高温氧化 热处理
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放电等离子烧结Cu-15Ni-8Sn/石墨自润滑复合材料摩擦磨损性能研究
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作者 马文林 刘益超 +1 位作者 王小超 苏博 《摩擦学学报(中英文)》 EI CAS CSCD 北大核心 2024年第4期509-518,共10页
以Cu-15Ni-8Sn合金为基体,石墨为润滑剂,采用放电等离子烧结技术制备了Cu-15Ni-8Sn/石墨自润滑复合材料.使用扫描电子显微镜、X射线衍射仪和万能试验机研究了复合材料的微观组织、物相组成和室温力学性能,通过球-盘式摩擦试验机测试复... 以Cu-15Ni-8Sn合金为基体,石墨为润滑剂,采用放电等离子烧结技术制备了Cu-15Ni-8Sn/石墨自润滑复合材料.使用扫描电子显微镜、X射线衍射仪和万能试验机研究了复合材料的微观组织、物相组成和室温力学性能,通过球-盘式摩擦试验机测试复合材料的摩擦磨损性能,利用三维轮廓仪测量材料磨损体积,借助扫描电子显微镜对磨痕形貌进行表征.结果表明:向Cu-15Ni-8Sn基体材料中添加石墨后,材料的硬度明显降低;随着石墨含量的提高,复合材料的抗压强度逐渐降低.当添加质量分数为3%的石墨时,Cu-15Ni-8Sn/石墨自润滑复合材料的耐磨性最好,磨损率最小为3.0×10^(-6)mm^(3)/(N·m),其磨损机理主要以磨粒磨损为主. 展开更多
关键词 自润滑复合材料 cu-15NI-8SN 放电等离子烧结 抗压强度 磨粒磨损
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等离子体技术制备具有亚微米颗粒结构的球化W-Cu伪合金微粉
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作者 A.V.SAMOKHIN N.V.ALEKSEEV +4 位作者 A.A.DOROFEEV A.A.FADEEV M.A.SINAYSKIY I.D.ZAVERTIAEV Y.V.GRIGORIEV 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2024年第2期592-603,共12页
采用复杂多级方法研究并证实制备具有亚微米/纳米级内部结构的球形W-Cu复合微粉的可能性。首先,采用等离子体化学合成法制备具有核壳结构的W-Cu纳米粉末(W核及Cu壳)。然后,将W-Cu纳米粉末与蔗糖的水悬浮液进行喷雾干燥,形成25~63μm的微... 采用复杂多级方法研究并证实制备具有亚微米/纳米级内部结构的球形W-Cu复合微粉的可能性。首先,采用等离子体化学合成法制备具有核壳结构的W-Cu纳米粉末(W核及Cu壳)。然后,将W-Cu纳米粉末与蔗糖的水悬浮液进行喷雾干燥,形成25~63μm的微粒,收率为50%。最后,用热等离子体射流处理由纳米粉末组成的微粒,形成致密的球形W-Cu颗粒。成品粉末的球化度为90%~95%,体积密度为8.1 g/cm^(3),流动性约为12 s/50 g,杂质中O、C和H的含量(质量分数)分别为0.7%、0.02%~0.2%和0.03%~0.05%。 展开更多
关键词 W-cu复合材料 等离子体化学合成 造粒 等离子体球化 纳米颗粒 微粒 微粉
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Spark plasma sintering on mechanically activated W-Cu powders 被引量:7
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作者 JIAChengchang LIZhigang HEYuntao QUXuanhui 《Rare Metals》 SCIE EI CAS CSCD 2004年第3期269-273,共5页
Mechanically activated W-Cu powders were sintered by a spark plasma sinteringsystem (SPS) in order to develop a new process and improve the properties of the alloy. Propertiessuch as density and hardness were measured... Mechanically activated W-Cu powders were sintered by a spark plasma sinteringsystem (SPS) in order to develop a new process and improve the properties of the alloy. Propertiessuch as density and hardness were measured. The microstructures of the sintered W-Cu alloy sampleswere observed by SEM (scanning electron microscope). The results show that spark plasma sinteringcan obviously lower the sintering temperature and increase the density of the alloy. This processcan also improve the hardness of the alloy. SPS is an effective method to obtain W-Cu powders withhigh density and superior physical properties. 展开更多
关键词 powder metallurgy W-cu alloy spark plasma sintering mechanical activation
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Growth mechanism of Cu nanopowders prepared by anodic arc plasma 被引量:2
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作者 魏智强 夏天东 +4 位作者 马军 戴剑锋 冯旺军 王青 闫鹏勋 《中国有色金属学会会刊:英文版》 EI CSCD 2006年第1期168-172,共5页
Based on the thermodynamics and kinetics theory, a theoretical model was built to illuminate the formation of metal nanopowders by anodic arc discharging plasma method, and the mechanism of particle nucleation and gro... Based on the thermodynamics and kinetics theory, a theoretical model was built to illuminate the formation of metal nanopowders by anodic arc discharging plasma method, and the mechanism of particle nucleation and growth was investigated. In addition, the morphology, crystal structure, particle size and specific surface area of the nanopowders were characterized by X-ray diffraction(XRD), Brunauer-Emmett-Teller(BET) adsorption, transmission electron microscopy(TEM) and the corresponding selected area electron diffraction(SAED). The experimental results indicate that the nanopowders prepared by this process have uniform size, high purity, single phase and spherical shape. The crystal structure is FCC structure, the same as that of the bulk materials; the specific surface area is 12 m2/g, the particle size distribution ranges from 30 to 90 nm with an average particle size of 67 nm which is obtained from TEM and confirmed from XRD and BET results. 展开更多
关键词 成核 生长机制 纳米粉末 阳极电弧等离子体
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Preparation and particle size characterization of Cu nanoparticles prepared by anodic arc plasma 被引量:4
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作者 WEI Zhiqiang XIA Tiandong +4 位作者 FENG Wangjun DAI Jianfeng WANG Qing LI Weixue YAN Pengxun 《Rare Metals》 SCIE EI CAS CSCD 2006年第2期172-176,共5页
Copper nanoparticles were successfully prepared in large scale by means of anodic arc discharging plasma method in inert atmosphere. The particle size, specific surface area, crystal structure, and morphology of the s... Copper nanoparticles were successfully prepared in large scale by means of anodic arc discharging plasma method in inert atmosphere. The particle size, specific surface area, crystal structure, and morphology of the samples were characterized by X-ray diffraction (XRD), BET equation, transmission electron microscopy (TEM), and the corresponding selected area electron diffraction (SAED). The experimental results indicate that the crystal structure of the samples is fcc structure the same as that of the bulk materials. The specific surface area is 11 m^2/g, the particle size distribution is 30 to 90 nm, and the average particle size is about 67 nm obtained from TEM and confirmed from XRD and BET results. The nanoparticles with uniform size, high purity, narrow size distribution and spherical shape can be prepared by this convenient and effective method. 展开更多
关键词 metal materials cu nanoparticles anodic arc plasma particle size STRUCTURE
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Structural and Electrical Properties of Cu Films by dc Biased Plasma-Sputter-Deposited on MgO(001) 被引量:1
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作者 Hong Qiu, Yue Tian, Mituru Hashimoto Applied Science School, University of Science and Technology Beijing, Beijing 100083, China Beijing Keda-Tianyu Microelectronic Material Technology Development Corporation, 30 Xueyuanlu, Haidian District, Beijing 10008 《Journal of University of Science and Technology Beijing》 CSCD 2001年第3期207-209,共3页
Cu films of30nm and 15 nm thick were deposited on MgO(001) substrates at 185℃ by dc plasma-sputtering at 1.9kv and 8 mA in pure Ar gas. A dc bias voltage Vs, of 0 V or -80 V was applied to the substrate during depos... Cu films of30nm and 15 nm thick were deposited on MgO(001) substrates at 185℃ by dc plasma-sputtering at 1.9kv and 8 mA in pure Ar gas. A dc bias voltage Vs, of 0 V or -80 V was applied to the substrate during deposition. Structural and electrical proper-ties have been investigated by cross-sectional transmission electron microscopy (XTEM), high resolution XTEM (XHRTEM) and by measuring temperature coefficient of electrical resistance (TCR;η) in the temperature interval of-135℃ to 0 ℃. The Cu film is pol- ycrystalline at Vs= 0 V while it epitaxially grows with Cu(00 )|| MgO(00 1) and Cu[0 10] || MgO[010] at Vs,=-80 V. However, the latter has a very rough surface. The change of η with film thickness and Vs is interpreted in terms of the structure change. Misfit dislocations and lattice expansion are induced along the MgO surface to relax the strain energy due to the lattice mismatch between Cu and MgO. 展开更多
关键词 cu film biased plasma-sputter-deposition misfit dislocations TCR XHRTEM
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Fabrication of W/Cu and Mo/Cu FGM as Plasma-facing Materials 被引量:2
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作者 Changchun Ge Zhangjian Zhou +2 位作者 Jiangtao Li Xiang Liu Zhengyu Xu(Laboratory of Special Ceramics and Powder Metallurgy, University of Science and Technology Beijing, Beijing 100083, China)(Southwest Institute of Nuclear Physics, Chengdu 610041, China) 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2000年第2期122-125,共4页
W/Cu Functionally Graded Materials (FGM) was designed not only for reducing the thermal stress caused by the mismatch of thermal expansion coefficients, but also for combining the features of W, Mo - high plasma-erosi... W/Cu Functionally Graded Materials (FGM) was designed not only for reducing the thermal stress caused by the mismatch of thermal expansion coefficients, but also for combining the features of W, Mo - high plasma-erosion resistance and the advantages of Cu - high heat conductivity and ductility. Four different fabrication processes for W/Cu or Mo/Cu, including hot-pressing, Cu infiltration of sintered porosity-graded W skeleton, spark plasma sintering and plasma spraying, were investigated and compared. It was foundthat the hot-pressing process is difficult to keep the designed composition gradient, while the other three processes are successful in making W/Cu or Mo/Cu FGM. Meanwhile, microstructures and composition gradients are analyzed with SEM and EDAX. 展开更多
关键词 FGM plasma-facing material W/cu and Mo/cu alloy
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NH_3 Plasma Surface Treatments of Engineering Fluoropolymers: A Way to Enhance Adhesion of Ni or Cu Thin Films Deposited by Electroless Plating 被引量:5
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作者 Maurice Romand Marlene Charbonnier Yves Goepfert 《材料热处理学报》 EI CAS CSCD 北大核心 2004年第05B期1092-1097,共6页
This paper describes the electroless Ni or Cu plating of some fiuoropolymer substrates through a tin-free activation process. Materials subjected to surface metallization are commercial Teflon() FEP, Nafion(), ACLAR()... This paper describes the electroless Ni or Cu plating of some fiuoropolymer substrates through a tin-free activation process. Materials subjected to surface metallization are commercial Teflon() FEP, Nafion(), ACLAR() and LaRCTM-CP1 thin films which have recently gained a large scientific and technological interest due to their excellent thermal, chemical, mechanical and dielectric properties. The original approach implemented in the present work involves: (i)the grafting of nitrogen-containing functionalities on the polymer surfaces through plasma treatments in ammonia, (ii) the direct catalysis of the so-modified surfaces via their immersion in a simple acidic PdCl2 solution (i.e. without using a prior surface sensitization in an acidic SnCl2 solution), and finally (iii) the electroless metallization itself. However, prior to the immersion in the industrial plating baths, the chemical reduction of the Pd+2 species (species covalently tethered on the nitrogen-containing groups) to metallic palladium (PdO) is shown to be a key factor in catalyzing the electroless deposition initiation. This is made by immersion in an hypophosphite (H2PO2-) solution. Wettability measurements and X-ray photoelectron spectroscopy (XPS) experiments are used to characterize every surface modification step of the developed process. A cross-hatch tape test was used to asses the adhesion strength of the electroless films that is shown qualitatively good. In addition, a fragmentation test was developed in combination with electrical measurements. Its use allows to distinguish different adhesion levels at the metal/polymer interface and to evidence the influence of some processing parameters. 展开更多
关键词 镍化学镀层 铜化学镀层 等离子表面处理 表面催化 XPS 剥离试验
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等离子喷涂NiCrAlY-Cu涂层中Cu在宽温域环境下的扩散及摩擦耗散机制
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作者 方子文 何乃如 +2 位作者 贾均红 杨杰 刘宁 《中国表面工程》 EI CAS CSCD 北大核心 2023年第2期65-78,共14页
含软金属自适应涂层在摩擦过程因软金属独特的性能而具备良好的摩擦学性能,然而在不断摩擦过程中软金属会发生一定的耗散导致涂层失效。为了研究软金属润滑剂在宽温域摩擦过程中的耗散机制,利用等离子喷涂技术制备NiCrAlY-Cu涂层;通过... 含软金属自适应涂层在摩擦过程因软金属独特的性能而具备良好的摩擦学性能,然而在不断摩擦过程中软金属会发生一定的耗散导致涂层失效。为了研究软金属润滑剂在宽温域摩擦过程中的耗散机制,利用等离子喷涂技术制备NiCrAlY-Cu涂层;通过分析热处理及宽温域摩擦前后涂层的组分与形貌演变,揭示NiCrAlY-Cu涂层中Cu的高温扩散及宽温域摩擦耗散机制。结果表明:Cu以片层状分布在NiCrAlY基础相中,软金属Cu在温度单因素影响下垂直向涂层表面扩散,随着温度的升高扩散加剧。在1000℃环境下Cu在涂层内部发生平行扩散,并最终呈现弥散态分布。在中低温环境下随着温度的升高Cu的剪切强度降低进而使得涂层摩擦因数逐渐下降,但是由于Cu呈片层状分布,随着温度的升高涂层发生疲劳剥落导致磨损率升高。随着温度的进一步升高,Cu扩散加剧,片层状Cu减少,同时发生氧化,使得摩擦因数升高,磨损率降低。在宽温域摩擦过程中由于温度和载荷的共同影响,Cu在涂层中的摩擦耗散机制为Cu垂直向涂层表面扩散,由磨痕区域内向磨痕外平行扩散。同时,磨痕内聚集的Cu以磨屑形式逐渐损耗。提出在不同温域摩擦过程中受力-热耦合影响的软金属耗散机制,可为解决含软金属自适应涂层的失效问题提供理论依据。 展开更多
关键词 等离子喷涂 NiCrAlY-cu涂层 宽温域摩擦学性能 扩散机制 摩擦耗散机制
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Microstructure and Mechanical Performance of Cu-SnO_2-rGO based Composites Prepared by Plasma Activated Sintering 被引量:2
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作者 罗国强 HUANG Jing +4 位作者 JIN Zhipeng LI Meijuan JIANG Xiaojuan SHEN Qiang ZHANG Lianmeng 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2015年第6期1152-1158,共7页
A novel chemical technique combined with unique plasma activated sintering(PAS) was utilized to prepare consolidated copper matrix composites(CMCs) by adding Cu-SnO2-rGO layered micro powders as reinforced fillers... A novel chemical technique combined with unique plasma activated sintering(PAS) was utilized to prepare consolidated copper matrix composites(CMCs) by adding Cu-SnO2-rGO layered micro powders as reinforced fillers into Cu matrix. The repeating Cu-SnO2-rGO structure was composed of inner dispersed reduced graphene oxide(r GO), SnO2 as intermedia and outer Cu coating. SnO2 was introduced to the surface of rGO sheets in order to prevent the graphene aggregation with SnO2 serving as spacer and to provide enough active sites for subsequent Cu deposition. This process can guarantee rGO sheets to suffi ciently disperse and Cu nanoparticles to tightly and uniformly anchor on each layer of rGO by means of the SnO2 active sites as well as strictly control the reduction speed of Cu^2+. The complete cover of Cu nanoparticles on rGO sheets thoroughly avoids direct contact among rGO layers. Hence, the repeating structure can simultaneously solve the wettability problem between rGO and Cu matrix as well as improve the bonding strength between rGO and Cu matrix at the well-bonded Cu-SnO2-rGO interface. The isolated rGO can effectively hinder the glide of dislocation at Cu-rGO interface and support the applied loads. Finally, the compressive strength of CMCs was enhanced when the strengthening effi ciency reached up to 41. 展开更多
关键词 graphene cu-SnO2-rGO structure copper matrix composites sensitization plasma activated sintering mechanical property
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Processing parameters for Cu nanopowders prepared by anodic arc plasma
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作者 魏智强 夏天东 +4 位作者 马军 冯旺军 戴剑锋 王青 闫鹏勋 《中国有色金属学会会刊:英文版》 EI CSCD 2007年第1期128-132,共5页
Copper nanopowders were successfully prepared by anodic arc discharging plasma method with home-made experimental apparatus.The effects of various processing parameters on the particle size of Cu nanopowders were inve... Copper nanopowders were successfully prepared by anodic arc discharging plasma method with home-made experimental apparatus.The effects of various processing parameters on the particle size of Cu nanopowders were investigated in the process,and the optimum processing parameters were obtained.In addition,the morphology,crystal structure,particle size distribution of the nanopowders were characterized via X-ray diffraction(XRD),transmission electron microscopy(TEM)and the corresponding selected area electron diffraction(SAED).The experimental results show that the crystal structure of the samples is the same fcc structure as that of the bulk materials.The processing parameters play a major role in controlling the particle size.The particle size increases with the increase of the arc current or gas pressure. 展开更多
关键词 粉末合金 颗粒 晶体结构
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Al含量对Cu-Ni系粉末冶金合金耐蚀性能的影响
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作者 常延丽 洪实 张思瑶 《材料保护》 CAS CSCD 2023年第11期23-29,138,共8页
为了提高Cu-10Ni合金的耐腐蚀性能,利用粉末冶金法在传统Cu-10Ni合金的基础上添加不同比例Al元素,制备得到系列Cu-Ni-Al合金。通过扫描电子显微镜、静态全浸腐蚀试验和电化学测试,研究了Al添加量和Cl^(-)浓度对Cu-Ni-Al合金耐蚀性能的... 为了提高Cu-10Ni合金的耐腐蚀性能,利用粉末冶金法在传统Cu-10Ni合金的基础上添加不同比例Al元素,制备得到系列Cu-Ni-Al合金。通过扫描电子显微镜、静态全浸腐蚀试验和电化学测试,研究了Al添加量和Cl^(-)浓度对Cu-Ni-Al合金耐蚀性能的影响。结果表明,放电等离子烧结(SPS)可以制备出致密性、硬度、电导率等综合性能优良的Cu-Ni-Al合金。Cu-Ni-Al合金在NaCl腐蚀介质中长时间浸泡,合金表面逐渐形成含有Cu_(2)O的腐蚀保护膜,同时Cu_(2)O保护膜外层会与腐蚀介质中的Cl^(-)发生进一步反应,形成一层Cu_(2)(OH)_(3)Cl产物膜,进而于合金表面形成Cu_(2)O和Cu_(2)(OH)_(3)Cl双层膜结构。Al含量相同时,随着腐蚀液中Cl^(-)浓度的提高,合金腐蚀逐渐加剧,表明在一定范围内Cl^(-)浓度的提升会促进腐蚀。 展开更多
关键词 cu-NI合金 放电等离子烧结 Al元素含量 氧化膜 耐腐蚀性能
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Nanostructured Al-Zn-Mg-Cu alloy synthesized by cryomilling and spark plasma sintering
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作者 陈汉宾 陶凯 +1 位作者 杨滨 张济山 《中国有色金属学会会刊:英文版》 CSCD 2009年第5期1110-1115,共6页
Nanocrystallized Al-10.0%Zn-3.0%Mg-1.8%Cu(mass fraction)alloy powder was prepared by cryomilling,and then the nanostructured powder was consolidated into bulk material by spark plasma sintering(SPS).The microstructura... Nanocrystallized Al-10.0%Zn-3.0%Mg-1.8%Cu(mass fraction)alloy powder was prepared by cryomilling,and then the nanostructured powder was consolidated into bulk material by spark plasma sintering(SPS).The microstructural evolution and phase transformation were studied.A supersaturated face-centered cubic solid solution is formed after cryomilling for 10 h,and the average grain size is 28 nm.Two typical nanostructures of the bulk nanostructured alloy are observed:primarily equiaxed grains with size of 150 nm,and occasionally occurring sub-micron grains up to 500 nm.Two types of MgZn2 particles precipitate during consolidation. One is the sub-micron particles distributed along the boundaries of the powders,and the other is fine particles with size of several nanometers in the matrix,especially at the boundaries of sub-micron grains.These second phase particles can be completely dissolved into matrix by proper solid solution treatment. 展开更多
关键词 放电等离子烧结 铜合金 亚微米颗粒 亚微米粒子 合成 纳米粉体材料
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Synthesis of Cu-Doped Mixed-Phase TiO_2 with the Assistance of Ionic Liquid by Atmospheric-Pressure Cold Plasma
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作者 詹志彬 底兰波 +1 位作者 张秀玲 李燕春 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第5期494-499,共6页
An atmospheric-pressure dielectric barrier discharge (DBD) gas-liquid cold plasma was employed to synthesize Cu-doped TiO~ nanoparticles in an aqueous solution with the assistance of [C2MIM]BF4 ionic liquid (IL) a... An atmospheric-pressure dielectric barrier discharge (DBD) gas-liquid cold plasma was employed to synthesize Cu-doped TiO~ nanoparticles in an aqueous solution with the assistance of [C2MIM]BF4 ionic liquid (IL) and using air as the working gas. The influences of the discharge voltage, IL and the amount of copper nitrite were investigated. X-ray diffraction, N2 adsorption-desorption measurements and UV-Vis spectroscopy were adopted to characterize the samples. The results showed that the specific surface area of TiO2 was promoted with Cu-doping (from 57.6 m^2.g^-1 to 106.2 m^2.g^-1 with 3% Cu-doping), and the content of anatase was increased. Besides, the band gap energy of TiO~ with Cu-doping decreased according to the UV-Vis spec- troscopy test. The 3%Cu-IL-TiO2 samples showed the highest eificiency in degrading methylene blue (MB) dye solutions under simulated sunlight with an apparent rate constant of 0.0223 min-1, which was 1.2 times higher than that of non-doped samples. According to the characterization results, the reasons for the high photocatalytic activity were discussed. 展开更多
关键词 dielectric barrier discharge (DBD) gas-liquid cold plasma atmospheric pres-sure mixed-phase Ti02 cu-doped
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ZrW_(2)O_(8)/Cu复合材料的制备与热膨胀性能分析
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作者 魏徽 梅健 +6 位作者 李静 张扬 徐艳 章旭 王小东 李明玲 徐小勇 《中国陶瓷》 CAS CSCD 北大核心 2023年第8期15-22,共8页
研究采用放电等离子烧结法在600℃的低温下制备了高致密的ZrW_(2)O_(8)/Cu复合材料及其功能梯度材料。XRD分析表明ZrW_(2)O_(8)/Cu复合材料结晶性良好没有不纯物质产生。SEM显示ZrW_(2)O_(8)/Cu功能梯度材料在不同体积分数界面处实现了... 研究采用放电等离子烧结法在600℃的低温下制备了高致密的ZrW_(2)O_(8)/Cu复合材料及其功能梯度材料。XRD分析表明ZrW_(2)O_(8)/Cu复合材料结晶性良好没有不纯物质产生。SEM显示ZrW_(2)O_(8)/Cu功能梯度材料在不同体积分数界面处实现了成分和微观组织的梯度过渡。热机械分析表明不同体积分数的ZrW_(2)O_(8)/Cu复合材料的热膨胀曲线与使用混合定律和Turner模型的预测基本一致,而且测量的ZrW_(2)O_(8)/Cu复合材料的热膨胀系数通过增加铜的含量可以从-7.96×10^(-6)/℃(ZrW_(2)O_(8))变化到2.98×10^(-6)/℃(30 vol%ZrW_(2)O_(8)/70vol%Cu)再变为极大值的11.6×10^(-6)/℃(70vol%ZrW_(2)O_(8)/30 vol%Cu)。 展开更多
关键词 放电等离子体烧结 ZrW_(2)O_(8)/cu复合材料 功能梯度材料 可调控热膨胀系数
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激光能量对激光诱导Cu等离子体特征辐射强度、电子温度的影响 被引量:16
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作者 李澜 陈冠英 +2 位作者 张树东 董晨钟 苏茂根 《原子与分子物理学报》 CAS CSCD 北大核心 2003年第3期343-346,350,共5页
利用Nd :YAG激光 (波长 10 6 4nm ,脉宽 10ns)烧蚀金属Cu靶获得等离子体。改变激光脉冲能量 ,观测到Cu的原子谱线和离子谱线随激光脉冲能量有不同的变化关系 ,但都在 330mJ/ pulse时 ,谱线强度达到最大 ,随后在 330mJ~ 370mJ/pulse间... 利用Nd :YAG激光 (波长 10 6 4nm ,脉宽 10ns)烧蚀金属Cu靶获得等离子体。改变激光脉冲能量 ,观测到Cu的原子谱线和离子谱线随激光脉冲能量有不同的变化关系 ,但都在 330mJ/ pulse时 ,谱线强度达到最大 ,随后在 330mJ~ 370mJ/pulse间出现一小平台 ,能量继续增加 ,各谱线强度减小。同时 ,使用烧蚀Cu靶产生的五条原子谱线 (4 6 5 .11nm ,5 10 .5 5nm ,5 15 .32nm ,5 2 1.82nm ,5 2 9.2 5nm)的相对强度 ,在局部热力学平衡近似下 ,利用Boltzmann图的最小二乘法拟合 ,测定了不同激光能量下Cu等离子体的电子温度。随激光能量的增加 ,电子温度近似单调地从 1.0 2× 10 4K上升到 1.4 6× 10 4K后 ,反而有所下降。 展开更多
关键词 激光诱导等离子体 cu等离子体 局部热力学平衡 电子温度
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激光烧蚀Cu靶产生等离子体紫外段发射光谱的研究 被引量:6
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作者 吴立志 沈瑞琪 +2 位作者 徐姣 叶迎华 胡艳 《原子与分子物理学报》 CAS CSCD 北大核心 2010年第1期117-122,共6页
利用波长532nm,脉宽15ns的Nd:YAG激光作用于Cu靶上,研究了产生等离子体的紫外段(180nm~300nm)发射光谱.在局部热力学平衡条件下,采用Boltzmann图表法估算了等离子体的电子温度,得到了电子温度随时间和空间的变化,以及电子温度随激光能... 利用波长532nm,脉宽15ns的Nd:YAG激光作用于Cu靶上,研究了产生等离子体的紫外段(180nm~300nm)发射光谱.在局部热力学平衡条件下,采用Boltzmann图表法估算了等离子体的电子温度,得到了电子温度随时间和空间的变化,以及电子温度随激光能量密度的变化.结果显示,随着激光能量的变化,电子温度有一个极大值.随着时间的发展,电子温度先减小,而后增大,接着缓慢减小.随着距靶面距离的增加,电子温度呈下降趋势. 展开更多
关键词 激光烧蚀 cu等离子体 局部热力学平衡 电子温度
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脉冲激光激发Cu等离子体温度的玻耳兹曼方法测量研究 被引量:4
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作者 靳丽红 杨经国 +3 位作者 哈元清 薛康 钟先琼 蒙建平 《强激光与粒子束》 EI CAS CSCD 北大核心 1999年第6期710-714,共5页
以YAG调Q脉冲激光为光源,使用CCD技术采集样品CU等离子体瞬态光谱,用玻耳兹曼分布法对激光等离子体的温度进行了测量。当激光脉冲能量为0.1J时,测量的Cu谱为原子激发谱,等离子体温度为14063K。作为对比,用同... 以YAG调Q脉冲激光为光源,使用CCD技术采集样品CU等离子体瞬态光谱,用玻耳兹曼分布法对激光等离子体的温度进行了测量。当激光脉冲能量为0.1J时,测量的Cu谱为原子激发谱,等离子体温度为14063K。作为对比,用同样方法测量了交流电弧激发的Cu等离子体温度。所建立的测温方法对于研究激光与物质的相互作用有重要应用前景。 展开更多
关键词 脉冲激光 温度 玻耳兹曼分布 铜等离子体
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激光诱导Cu等离子体特性研究 被引量:8
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作者 傅院霞 王莉 +2 位作者 马龙颍 徐丽 屈苏平 《原子与分子物理学报》 CAS 北大核心 2019年第2期263-267,共5页
实验在大气环境下测定激光诱导Cu等离子体的时间分辨发射光谱,通过对ICCD门宽、ICCD与激光脉冲延迟、增益、激光能量等参数的调节来达到最佳的时间分辨光谱.利用最佳光谱图,通过测定的光谱强度和Stark展宽计算激光诱导Cu等离子体的电子... 实验在大气环境下测定激光诱导Cu等离子体的时间分辨发射光谱,通过对ICCD门宽、ICCD与激光脉冲延迟、增益、激光能量等参数的调节来达到最佳的时间分辨光谱.利用最佳光谱图,通过测定的光谱强度和Stark展宽计算激光诱导Cu等离子体的电子温度和电子密度,得出激光诱导Cu等离子体的电子温度和电子密度时间演化特性.结果表明在本实验条件下延时100-1000 ns范围内变化时,相应的电子温度范围为15000 K-5000 K,在200 ns-500 ns时下降的很快,在500 ns后电子温度下降的越来越平稳;延时在200-900 ns之间变化,等离子体的电子密度一直在下降,延时200-600 ns下降着延时的增加的平缓,600-900 ns下降的很快,随着时间的演化,电子密度也越来越小. 展开更多
关键词 激光诱导cu等离子体 发射光谱 电子温度 电子密度
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