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Cyclobutane Pyrimidine Dimer Accumulation in Relation to UV-B Sensitivity in Rice Cultivars 被引量:1
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作者 李韶山 王艳 +2 位作者 王小菁 宾金华 刘颂豪 《Acta Botanica Sinica》 CSCD 2000年第6期576-581,共6页
Five rice ( Oryza sativa L.) cultivars, widely planted in South China, were grown in greenhouse with or without supplemental UV_B radiation at level of 13.6 kJ·m -2 ·d -1 . After 15 day_UV_B treat... Five rice ( Oryza sativa L.) cultivars, widely planted in South China, were grown in greenhouse with or without supplemental UV_B radiation at level of 13.6 kJ·m -2 ·d -1 . After 15 day_UV_B treatment, significant intraspecific differences were observed in plant height, photosynthetic rate and total biomass. Based on the total biomass accumulation, cultivar “Tesanai” was found to be the most sensitive, and cultivar “Luhuangzhan” was the most tolerant species to UV_B radiation. UV_B induced cyclobutane pyrimidine dimer (CPD) in rice DNA were quantified by ELISA with specific monoclonal antibody. CPD accumulations in DNA extracted from 5 rice cultivars were remarkably increased by UV_B radiation, and it was confirmed that there was a strong positive correlation between CPD accumulation and the inhibition of total biomass. Photorepair was proved to be the predominant mode of CPD repair in UV_B irradiated rice. Light_dependent removal of CPD was very fast as compared with dark repair. Different levels of CPD accumulation among rice cultivars were related with different capacity of CPD photorepair. Capacity of light_dependent CPD removal may play an important role in UV_B resistance of rice. 展开更多
关键词 cyclobutane pyrimidine dimer (CPD) DNA repair RICE UV_B sensitivity
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Molecular Dynamics Insights into Electron-Catalyzed Dissociation Repair of Cyclobutane Pyrimidine Dimer
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作者 Liang Gao Yuxiang Bu 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 2021年第6期850-860,I0004,共12页
Excess electrons are not only an important source of radiation damage,but also participate in the repair process of radiation damage such as cyclobutane pyrimidine dimer(CPD).Using ab initio molecular dynamics(AIMD)si... Excess electrons are not only an important source of radiation damage,but also participate in the repair process of radiation damage such as cyclobutane pyrimidine dimer(CPD).Using ab initio molecular dynamics(AIMD)simulations,we reproduce the single excess electron stepwise catalytic CPD dissociation process in detail with an emphasis on the energy levels and molecular structure details associated with excess electrons.On the basis of the AIMD simulations on the CPD aqueous solution with two vertically added excess electrons,we exclude the early-proposed[2+2]-like concerted synchronous dissociation mechanism,and analyze the difference between the symmetry of the actual reaction and the symmetry of the frontier molecular orbitals which deeply impact the mechanism.Importantly,we propose a new model of the stepwise electron-catalyzed dissociation mechanism that conforms to the reality.This work not only provides dynamics insights into the excess electron catalyzed dissociation mechanism,but also reveals different roles of two excess electrons in two bond-cleavage steps(promoting versus inhibiting). 展开更多
关键词 Excess electron cyclobutane pyrimidine dimer Electron catalysis Frontier orbital analysis Ab initio molecular dynamics simulation
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Effects of temperature on UV-B-induced DNA damage and photorepair in Arabidopsis thaliana 被引量:4
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作者 LIShao-shan WANGYan BJOERNLarsOlof 《Journal of Environmental Sciences》 SCIE EI CAS CSCD 2004年第1期173-176,共4页
DNA damage in the form of cyclobutane pyrimidine dimers(CPDs) and (6-4) photoproducts(6-4PPs) induced by UV-B radiation in Arabidopsis thaliana at different temperatures was investigated using ELISA with specific mono... DNA damage in the form of cyclobutane pyrimidine dimers(CPDs) and (6-4) photoproducts(6-4PPs) induced by UV-B radiation in Arabidopsis thaliana at different temperatures was investigated using ELISA with specific monoclonal antibodies. CPDs and 6-4PPs increased during 3 h UV-B exposure, but further exposure led to decreases. Contrary to the commonly accepted view that DNA damage induced by UV-B radiation is temperature-independent because of its photochemical nature, we found UV-B-induction of CPDs and 6-4PPs in Arabidopsis to be slower at a low than at a high temperature. Photorepair of CPDs at 24℃ was much faster than that at 0℃ and 12℃, with 50% CPDs removal during 1 h exposure to white light. Photorepair of 6-4PPs at 12℃ was very slow as compared with that at 24℃, and almost no removal of 6-4PPs was detected after 4 h exposure to white light at 0℃. There was evidence to suggest that temperature-dependent DNA damage and photorepair could have important ecological implications. 展开更多
关键词 Arabidopsis thaliana cyclobutane pyrimidine dimers(CPDs) DNA repair (6-4) photoproducts(6-4PPs) TEMPERATURE UV-B radiation
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Oxidative Splitting of a Pyrimidine Cyclobutane Dimer: A Pulse Radiolysis Study
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作者 晏利琴 宋钦华 +2 位作者 黑晓明 郭庆祥 林维真 《Chinese Journal of Chemistry》 SCIE CAS CSCD 2003年第1期16-19,共4页
The oxidative splitting process of cis-syn 1,3-dimethyluracil cyclobutane dimer (DMUD) in aqueous solution was investigated using pulse radiolysis technique. The results indicated that DMUD can be splitted into 1,3-... The oxidative splitting process of cis-syn 1,3-dimethyluracil cyclobutane dimer (DMUD) in aqueous solution was investigated using pulse radiolysis technique. The results indicated that DMUD can be splitted into 1,3-dimethyluracil (DMU) by OH radicals (OH ·) and Br_2 radical anions (Br ·-_2), but not by azide radicals (N ·_3). The oxidative mechanisms that an H-abstracted from DMUD for OH · oxidative splitting and an electron transfer from DMUD to Br ·-_2, were suggested. Related kinetic parameters were determined. 展开更多
关键词 pyrimidine cyclobutane dimer oxidative splitting pulse radiolysis
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