采用DC Arc Plasma JetCVD方法沉积微/纳米复合自支撑金刚石膜

在30kW级直流电弧等离子体喷射化学气相沉积(DC Arc P lasm a Jet CVD)设备上,采用Ar-H2-CH4混合气体,通过调节甲烷浓度以及控制其他沉积参数,在Mo衬底上沉积出微/纳米复合自支撑金刚石膜。实验表明,当微米金刚石膜层沉积结束后,在随后的沉积中,随着甲烷浓度的增加,金刚石膜表面的晶粒大小是逐渐减小的。当甲烷浓度达到20%以上时,金刚石膜生长面晶粒呈现菜花状的小晶团,膜体侧面已经没有了粗大的柱状晶,而是呈现出光滑的断口,对该层进行拉曼谱分析显示,位于1145 cm-1附近有一定强度的散射峰出现。这说明所沉积的晶粒全部变为纳米级尺寸。

Arc Voltage Fluctuation in DC Laminar and Turbulent Plasma Jets Generation

Arc voltage fluctuations in a direct current （DC） non-transferred arc plasma generator are experimentally studied, in generating a jet in the laminar, transitional and turbulent regimes. The study is with a view toward elucidating the mechanism of the fluctuations and their relationship with the generating parameters, arc root movement and flow regimes. Results indicate that the existence of a 300 Hz alternating current （AC） component in the power supply ripples does not cause the transition of the laminar plasma jet into a turbulent state. There exists a high frequency fluctuation at 4 kHz in the turbulent jet regime. It may be related to the rapid movement of the anode attachment point of the arc.

OES study of the gas phase during diamond films deposition in high power DC arc plasma jet CVD system

This paper used optical emission spectroscopy （OES） to study the gas phase in high power DC arc plasma jet chemical vapour deposition （CVD） during diamond films growth processes. The results show that all the deposition parameters （methane concentration, substrate temperature, gas flow rate and ratio of H2/Ar） could strongly influence the gas phase. C2 is found to be the most sensitive radical to deposition parameters among the radicals in gas phase. Spatially resolved OES implies that a relative high concentration of atomic H exists near the substrate surface, which is beneficial for diamond film growth. The relatively high concentrations of C2 and CH are correlated with high deposition rate of diamond. In our high deposition rate system, C2 is presumed to be the main growth radical, and CH is also believed to contribute the diamond deposition.

Diamond Film Synthesis with a DC Plasma Jet:Effect of the Contacting Interface between Substrate and Base on the Substrate Temperature

The contacting interface between the substrate and water-cooled base is vital to the substrate temperature during diamond films deposition by a DC （direct current） plasma jet. The effects of the solid contacting area,conductive materials and fixing between the substrate and the base were investigated without affecting the other parameters. Experimental results indicated that the preferable solid contacting area was more than 60% of total contacting areal; the particular Sn-Pb alloy was more suitable for conducting heat and the concentric fixing ring was a better setting for controlling the substrate temperature. The result was explained in terms of the variable thermal contact resistance at the interface between substrate and base. The diamond films were analyzed by scanning electron microscopy （SEM） for morphology, X-ray diffraction （XRD） for the intensity of characteristic spectroscopy and Raman spectroscopy for structure.

Effects of deposition parameters on microstructure and thermal conductivity of diamond films deposited by DC arc plasma jet chemical vapor deposition

The uniform diamond films with 60 mm in diameter were deposited by improved DC arc plasma jet chemical vapor deposition technique. The structure of the film was characterized by scanning electronic microcopy(SEM) and laser Raman spectrometry. The thermal conductivity was measured by a photo thermal deflection technique. The effects of main deposition parameters on microstructure and thermal conductivity of the films were investigated. The results show that high thermal conductivity, 10.0 W/(K·cm), can be obtained at a CH4 concentration of 1.5% (volume fraction) and the substrate temperatures of 880-920 ℃ due to the high density and high purity of the film. A low pressure difference between nozzle and vacuum chamber is also beneficial to the high thermal conductivity.

Effects of Gas Flow Rate on the Discharge Characteristics of a DC Excited Plasma Jet

A direct current（DC） source excited plasma jet consisting of a hollow needle anode and a plate cathode has been developed to form a diffuse discharge plume in ambient air with flowing argon as the working gas.Using optical and electrical methods,the discharge characteristics are investigated for the diffuse plasma plume.Results indicate that the discharge has a pulse characteristic,under the excitation of a DC voltage.The discharge pulse corresponds to the propagation process of a plasma bullet travelling from the anode to the cathode.It is found that,with an increment of the gas flow rate,both the discharge plume length and the current peak value of the pulsed discharge decrease in the laminar flow mode,reach their minima at about1.5 L/min,and then slightly increase in the turbulent mode.However,the frequency of the pulsed discharge increases in the laminar mode with increasing the argon flow rate until the argon flow rate equals to about 1.5 L/min,and then slightly decreases in the turbulent mode.

DIAMOND FILMS MADE BY DC PLASMA JET

This paper is about the diamond films fabricated by dc plasma jet method. Scanning electron microscopy(SEM), X-ray diffractometry and Roman scattering spectroscopy have been used to characterize the diamond films deposited under different experimental conditions and different substrates.

Diagnosis of gas phase near the substrate surface in diamond film deposition by high-power DC arc plasma jet CVD

Optical emission spectroscopy （OES） was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition （CVD）. C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments （DOE）. An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.

Study of generation characteristics of glow-type atmospheric-pressure plasma jet based on DC discharge in air

In order to form an atmospheric-pressure plasma jet without airflow, a needle–ring electrode structure is proposed in this paper. When heteropolar potentials are applied to a needle and a ring, a marked electric field strength enhancement around the needle’s pointed end has been found. When the same potential is applied to both the needle and the ring, the lateral electric field strength for the needle can be weakened. By using the above two methods, an increase of the difference between the pointed end electric field strength and the lateral one is achieved and stable plasma jets are formed. A symmetrical space electric field distribution is established at the pointed end of the needles when several sets of heteropolar needle–ring electrodes are uniformly arranged, which is conducive to forming a uniform array plasma jet. Under DC discharge conditions, a safe and stable plasma jet of high density and an array plasma jet are successfully achieved.

Study of the Parameters of a Magnetic DC Plasma Jet

A Magnetic DC plasma torch has been developed. Magnetic field distributions of solenoid coils have been calculated electrodynamically. For Ar +H2 plasma, the effects of an akial magnetic field and gas flow rate on the characttristics of the plasma jet were studied. Electron temperature, density and plasma velocity at 80 mm from the nozzle have been measured using a floating double probe and a Mach probe. The values of the heat fluxes to substrate were derived from experimental data.

Diagnosis of Electron,Vibrational and Rotational Temperatures in an Ar/N2 Shock Plasma Jet Produced by a Low Pressure DC Cascade Arc Discharge

In this paper, a low pressure Ar/N2 shock plasma jet with clearly multicycle al- ternating zones produced by a DC cascade arc discharge has been investigated by an emission spectral method combined with Abel inversion analysis. Plasma emission intensity, electron, vi- brational and rotational temperatures of the shock plasma have been measured in the expansion and compression zones. The results indicate that the ranges of the measured electron temperature, vibrational temperature and rotational temperature are 1.1 eV to 1.6 eV, 0.2 eV to 0.7 eV and 0.19 eV to 0.22 eV, respectively, and it is found for the first time that the vibrational and rota- tional temperatures increase while the electron temperature decreases in the compression zones. The electron temperature departs from the vibrational and the rotational temperatures due to non-equilibrium plasma effects. Electrons and heavy particles could not completely exchange energy via collisions in the shock plasma jet under the low pressure of 620 Pa or so.

±800 kV混合直流输电工程用DC 80 kV SF_(6)/N_(2)等离子体喷射触发间隙研制

白鹤滩—江苏±800 kV混合直流输电工程在交流侧故障穿越过程中,为了限制柔直母线上过电压吸收冗余能量需要加装可控自恢复消能装置。为了实现可控自恢复消能装置的1 ms快速投入,需要研制DC 80 kV SF_(6)/N_(2)等离子体喷射触发间隙。根据工程需求,分析了工程应用条件,明确触发间隙关键技术要求。针对高性能触发的要求,提出了高压脉冲型等离子体双级接续触发方法,设计了同轴层压式产品化触发腔,搭建触发特性试验平台,开展触发性能试验研究,并提出通过监测触发过程中储能电容电压变化在线监测触发性能的方法,研究结果表明,最低可触发电压为50 kV,触发时延在0.3 ms以内,空载触发寿命为1800次。针对大直流通流及快速绝缘恢复的要求,依据横磁电极旋弧原理,完成自旋弧主电极设计,开展电场及旋弧仿真,设计搭建了通流及绝缘恢复试验回路开展试验研究,拍摄电弧运动。结果表明,电弧能够沿主电极边缘高速旋转,实现30kA/50ms通流后0.1s恢复耐受1.5倍额定电压、通流寿命50次。基于上述关键问题的解决,完成了双冗余等离子体喷射触发间隙本体及高电位测控的成套装置结构设计,研制了样机并通过了第三方性能试验验证,绝缘、触发和通流关键技术指标全面满足白江工程要求并将工程应用。

Experimental Characterization of the Plasma Synthetic Jet Actuator

The plasma synthetic jet is a novel active flow control method because of advantages such as fast response, high frequency and non-moving parts, and it has received more attention recently, especially regarding its application to high-speed flow control. In this paper, the experimental characterization of the plasma synthetic jet actuator is investigated. The actuator consists of a copper anode, a tungsten cathode and a ceramic shell, and with these three parts a cavity can be formed inside the actuator. A pulsed-DC power supply was adopted to generate the arc plasma between the electrodes, through which the gas inside was heated and expanded from the orifice. Discharge parameters such as voltage and current were recorded, respectively, by voltage and current probes. The schlieren system was used for flow visualization, and jet velocities with different discharge parameters were measured. The schlieren images showed that the strength of plasma jets in a series of pulses varies from each other. Through velocity measurement, it is found that at a fixed frequency, the jet velocity hardly increases when the discharge voltage ranges from 16 kV to 20 kV. However, with the discharge voltage fixed, the jet velocity suddenly decreases when the pulse frequency rises above 500 Hz, whereas at other testing frequencies no such decrease was observed. The maximum jet velocity measured in the experiment was up to 110 m/s, which is believed to be effective for high-speed flow control.

Study on microstructure of Fe-Cr-C-Ni-B-Si coating formed by plasma jet surface metallurgy

The technical connotation of surface metallurgical technology by DC-Plasma-Jet is a kind of rapid, non- equilibrium metallurgical process which is similar to powder metallurgy. Accordingly the specialized equipment is developed all by ourselves, which is not subjected to limitation of solubility, melting point, density of constituents, therefore pre-alloy powders are not needed. The plasma surface metallurgical coating using Fe-Cr-C-Ni-B-Si mixed alloy powders has good wettability with substrate material. The metallurgical coating has apparent characteristics of rapid and layered crystallization from planar crystal-cell to dendritic transition zone at the interface, from dendritic crystal to equiaxed crystal in the midst, from equiaxed crystal to spike crystal on the surface. Its metastable microstructure is complex phase of supersaturated γ- （ Fe, Ni ） dendritic crystal solutioning great amount of alloy element and interdendritic eutectic structure （ Cr, Fe） γ （ C, B） 3 and T-（Fe,Ni）.

特征信号图像测速法在超声速多组分等离子体射流中的应用

高速稀薄等离子体流场在航空航天领域有重要的应用.等离子体射流不同于常规的气体或液体的流动,其内部的电离状态、丰富的反应活性、多样的特征尺度、热平衡与非平衡共存等特点导致传统测速方法难以应用.特征信号图像测速法(SSIV)通过将羽流光强波动作为示踪信号来测量流体速度,从而拥有更好的流体跟随性和测量精度.利用低气压(约为100 Pa)直流电弧等离子体实验平台,文章基于特征信号图像测速方法,通过跟踪发生器输入功率周期变化引起的光强波动来测量纯氩以及氩-氦多组分两种工况下的羽流轴向平均速度分布.将中心波长为696.5 nm的窄带滤光片安装到光学镜头上,进一步获取两种工况下氩原子(ArI)单一谱线所对应的射流速度.结果分析表明,相同工况(电功率、气体质量流量及背景气压)下,氩-氦多组分等离子体的射流平均速度显著高于纯氩等离子体射流的平均速度.并且在氩-氦多组分等离子体的射流中,基于整体光强波动得到的射流速度要明显高于基于Ar I特征谱线获得的速度,表明SSIV方法不仅能够测量可压缩等离子体射流的平均速度,还具有分辨不同组分速度场的能力.研究结果展示了特征信号图像测速方法在复杂流场测量中的适用性和优势.

金刚石涂层游动芯头制备及其在铜管生产中的应用

通过沉积方式和旋转装置设计,采用直流电弧等离子体喷射法在硬质合金游动芯头表面均匀沉积金刚石涂层,并利用白光干涉仪、扫描电子显微镜、Raman光谱仪和压痕法对涂层的表面粗糙度、形貌、质量均匀性和膜–基附着力等进行测试分析。结果表明:金刚石涂层抛光后的表面平均粗糙度S_(a)为76.4 nm,金刚石涂层脱落位置到压痕中心的平均距离为287.9μm,且各位置的金刚石涂层厚度均匀性和质量均较好。将制备的金刚石涂层游动芯头应用于高精度精密铜管生产线中,与硬质合金游动芯头对比,其在降低劳动强度、保证铜管一致性和延长芯头使用寿命方面都有显著效果。

大孔径不锈钢薄壁焊管金刚石涂层拉拔模具制备及应用

研究了利用直流电弧等离子体喷射法,在硬质合金拉拔模具表面沉积CVD金刚石涂层。采用孔径测量仪、接触式粗糙度仪和Raman光谱仪对金刚石涂层厚度、表面粗糙度和质量进行了测试分析。结果表明:金刚石涂层厚度d为24.5μm,沉积速率v为2.45μm/h,抛光后定径区表面平均粗糙度Ra为46 nm,拉拔模具入口区、压缩区和定径区在1 332 cm~(-1)附近都有明显的金刚石涂层特征峰。将制备的金刚石涂层拉拔模具应用于不锈钢焊管生产线中,经与硬质合金拉拔模具对比,使用寿命提高200倍,并在环保、降低劳动强度和管材一致性上都有了明显的优势。

大尺寸低损耗金刚石窗片制备及微波窗口封接

为满足长脉冲大功率回旋管研制需求,采用直流电弧等离子体喷射化学气相沉积法合成大尺寸低损耗金刚石厚膜窗片;通过表面金属化和钎焊工艺进行微波窗口的封接。采用法布里-玻罗(Fabry-Perot)开放激励腔、激光导热仪、三维轮廓仪、激光干涉仪等对金刚石窗片介电损耗、热导率、表面平坦度、粗糙度等性能参数进行了表征;采用氦质谱检漏仪、高功率长脉冲微波测试平台测试了窗口气密性和微波吸收特性。实验结果表明,抛光厚度1.36 mm的金刚石窗片具有高尺寸精度,热导率达到17.9~18.7 W·cm^(-1)·K^(-1);波导窗片介电损耗tanδ=1.76×10^(-4),回旋管窗片tanδ=2.6×10^(-4)。计算结果表明,在1 MW微波输入功率下波导窗损耗功率约2.34 kW,窗片中心热应力在安全数值内,相同损耗功率条件下回旋管窗口可承受至少680 kW的输出功率。

氮氩直流电弧等离子体射流特性实验研究

基于自主研发的等离子体射流性能监测系统,文中通过实验研究了氮氩直流电弧等离子体射流特性:利用基于LabVIEW虚拟仪器技术的监测系统研究了不同氮氩混合比例下直流电弧等离子体射流的弧压、热效率及热焓值特性;利用CCD图像采集与MATLAB图像处理融合技术研究了不同氮氩混合比例下直流电弧等离子体射流长度特性;提出通过钨棒熔断时间表征等离子体射流相对温度的方法,并研究了不同氮氩混合比例下直流电弧等离子体射流在离喷出口5mm处的相对温度变化规律。实验结果表明:氮氩混合比例会对直流电弧等离子体射流特性产生明显影响,具体为直流电弧等离子体的弧压、热效率、热焓值、射流长度、喷口射流温度均随着氮气所占氮氩混合比例的增加呈现出先急剧增加后以某一恒定速率缓慢增加的现象。

DEPOSITION OF DIAMOND FILMS BY DC ARC PLASMA JET METHOD

Diamond has aroused people’s great interest due to its excellent physical and chemical properties. The development of various low-pressure synthesis methods has offered a bright future to its wide application in many fields. However, the growth rates of the