Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering

A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1.

N掺杂对Si-DLC薄膜的结构性能影响及摩擦机理研究

采用平板阴极等离子体增强化学气相沉积技术,通过调控N_(2)流量在GCr15基底上制备了系列硅氮共掺杂类金刚石碳基(Si/N-DLC)薄膜,分析探索N掺杂对于Si-DLC薄膜结构、力学性能和摩擦学行为的作用规律以及Si/NDLC薄膜的低摩擦磨损机理.结果表明:N元素的引入促进Si-DLC薄膜中sp^(2)-C结构的形成,降低了薄膜的硬度和弹性模量,但能大幅改善Si-DLC薄膜的韧性并增强结合(>20 N).更重要的是,N掺杂可有效降低Si-DLC薄膜的摩擦系数并改善其耐磨性能,摩擦系数和磨损率相较于Si-DLC薄膜分别降低了约26%和45%.其摩擦机理是类石墨碳(GLC)转移膜的形成使得摩擦界面发生转移,有效降低了Si/N-DLC薄膜的摩擦系数,并且依赖于摩擦界面的石墨化程度和氢含量.而磨损行为取决于其薄膜自身韧性和抵抗弹塑性变形的能力,磨痕内部脆性断裂缺口会造成转移膜的大面积破坏,加剧了黏着磨损.此外,确定了Si/N-DLC薄膜低摩擦(摩擦系数≤0.05)的最佳服役区间,相关结果为Si/N-DLC薄膜的结构性能调控和工程应用提供参考.

Characterization and analysis of DLC films with different thickness deposited by RF magnetron PECVD

Diamond-like carbon (DLC) films have excellent mechanical and chemical properties similar to those of crystalline diamond giving them wide applications as protective coatings. So far, a variety of methods are employed to deposit DLC films. In this study, DLC films with different thicknesses were deposited on Si and glass substrates using RF magnetron PECVD method with C 4 H 10 as carbon source. The bonding microstructure, surface morphology and tribological properties at different growing stages of the DLC films were tested. Raman spectra were deconvoluted into D peak at about 1370 cm 1 and G peak around 1590 cm 1 , indicating typical features of the DLC films. A linear relationship between the film thickness and the deposition time was found, revealing that the required film thickness may be obtained by the appropriate tune of the deposition time. The concentration of sp 3 and sp 2 carbon atoms in the DLC films was measured by XPS spectra. As the films grew, the sp 3 carbon atoms decreased while sp 2 atoms increased. Surface morphology of the DLC films clearly showed that the films were composed of spherical carbon clusters, which tended to congregate as the deposition time increased. The friction coefficient of the films was very low and an increase was also found with the increase of film thickness corresponding to the results of XPS spectra. The scratch test proved that there was good bonding between the DLC films and the substrates.

Preparation and Characterization of DLC Films by Twinned ECR Microwave Plasma Enhanced CVD for Microelectromechanical Systems (MEMS) Applications

Diamond-like carbon (DLC) films have recently been pursued as the protection of MEMS against their friction and wear.Plasma enhanced chemical vapor deposition (PECVD) technique is very attractive to prepare DLC coating for MEMS.This paper describes the preparation of DLC films using twinned electron cyclotron resonance (ECR) microwave PECVD process.Raman spectra confirmed the DLC characteristics of the films.Fourier-transform infrared (FT-IR)characterization indicates the carbon is bonded in the form sp~3 and sp~2 with hydrogen participating in bonding.The surface roughness of the films is as low as approximately (0.093)nm measured with an atomic force microscope.A CERT microtribometer system is employed to obtain information about the scratch resistance,friction properties,and sliding wear resistance of the films.The results show the deposited DLC films have low friction and good scratch/wear resistance properties.

Tribological Properties of DLC Film Prepared by C^+ Ion Beam-assisted Deposition (IBAD)

C ^＋ ion beam-assisted deposition was utilized to prepare deposit diamond-like carbon （ DLC ） film. With the help of a series of experiments such as Raman spectroscopy, FT-IR spectroscopy, AFM and nanoindentation , the DLC film has been recognized as hydrogenated DLC film and its tribologicul properties have been evaluated. The bull-on-disc testing results show that the hardness and the tribologicul properties of the DLC film produced by C^ ＋ ion beam- assisted deposition are improved significantly. DLC film produced by C ^＋ ion beam- assisted deposition is positive to have a prosperous tribologicul application in the near future.

Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film

A diamond-like carbon（DLC） film was deposited on YT14 substrate using magnetron sputtering（MS）. The surface morphologies, roughness and bonding spectra of obtained film were characterized using scanning electron microscopy（SEM）, atomic force microscopy（AFM）, and X-ray photoelectron spectroscopy（XPS）, respectively, and its mechanical property and bonding strength were measured using a nanoindentation and scratch tester, respectively. The results show that the C-enriched DLC film exhibits a denser microstructure and smoother surface with lower surface roughness of 21.8 nm. The ratio of C sp2 at 284.4 e V that corresponds to the diamond（111） and the C sp3 at 285.3 e V that corresponds to the diamond（220） plane for the as-received film is 0.36： 0.64, showing that the C sp3 has the high content. The hardness and Young＇s modulus of DLC film by nanoindentation are 8.534 41 and 142.158 1 GPa, respectively, and the corresponding bonding strength is 74.55 N by scratch test.

STUDY ON COMPOSITION, MICROSTRUCTURE AND HARDNESS OF DLC FILMS BY VCAD

DLC super-hard films have been deposited on the substrates of single crystalline Si, pure Ti and stainless steel 18-8 by a method of vacuum cathode arc deposition (VCAD). The composition, microstructure and micro-hardness of the films have been studied in this paper. The results indicate that hardness of the DLC films is different on the different substrates. Hardness of the films increases with decreasing in surface roughness of the films. The maximum value of micro-hardness belongs to the DLC films deposited under the hydrogen pressure of 0.35Pa and the negative bias of 100V.

Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films

Application of the Langmuir probe in plasma circumstance for deposition of diamond-like carbon （DLC） thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this paper, we circumvent the problem by using the floating harmonic probe technique. In the real circumstance of DLC film deposition, the floating harmonic probe worked reliably over 3 hours, correctly indicating the ion density and electron temperature. The technique was practically used to measure the ion density and electron temperature in DLC film deposition processes using the microwave ECR plasma enhanced sputtering. Combined with the Raman spectroscopic characterization of the films, the conditions for deposition of DLC films were investigated.

Influence of nitrogen gas on structure and properties of DLC films prepared by XeCl pulsed laser deposition

Diamond-like carbon (DLC) films were prepared by PLD process using 308 nm(XeCl) laser beam with high power (500 W) and high frequency(300 Hz). The effects of nitrogen pressure on the structure and properties of the DLC films under such extremely high power and repetition rate were studied. The results indicate that the microstructures of the films are varied from amorphous carbon to graphitized carbon in long-order with the increase of N2 pressure, and the optical properties of the films are deteriorated as compared to that of DLC films without nitrogen.

Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride

Composite SiNx/DLC films were deposited on Si substrate by RF magnetron sputtering of silicon nitride (Si3N4) target simultaneously with filtered cathode arc (FCA) of graphite. The RF power was fixed at 100 W whereas the arc currents of FCA were 20, 40, 60 and 80 A. The effects of arc current on the structure, surface roughness, density and mechanical properties of SiNx/DLC films were investigated. The results show that the arc current in the studied range has effect on the structure, surface roughness, density and mechanical properties of composite SiNx/DLC films. The composite SiNx/DLC films show the sp3 content between 53.5% and 66.7%, density between 2.54 and2.98 g/cm3, stress between 1.7 and 2.2 GPa, and hardness between 35 and 51 GPa. Furthermore, it was found that the density, stress and hardness correlate linearly with the sp3 content for composite SiNx/DLC films.

Composition and structure of Ti-C/DLC graded composite films

The Ti C→DLC gradient composite films were characterized systematically. The elemental depth profile and elemental chemical state evolution were determined by X ray photoelectron spectroscopy (XPS). The transmission electron microscope (TEM) and high resolution transmission electron microscopy (HRTEM) were used to study the structure of interfacial zone between DLC film and Ti C layers. Results show that there are composition transition zone between DLC film and either Ti C layer or steel substrate on condition that pre deposited Ti layers on the steel substrate then plasma based bias deposited DLC films. In Ti C graded layer, the chemical state of titanium and carbon are changed gradually. The structures of zone in Ti C layer near the DLC film is consisted of random oriented nanocrystallines TiC dispersed in amorphous DLC matrix. The structure of the zone between DLC film and Ti C graded layer is gradually changed too.

Effects of fragments on W-DLC films properties under boundary lubrication condition in the friction system

Abstract Effects of film fragments in the friction system on friction and wear properties of tungsten doped diamond-like carbon films （W-DLC） were studied in the condition of boundary lubrication. It could be observed that the average friction coefficient was increased after introducing film fragments into the friction system, where these film fragments can accelerate the breaking of the extreme thin oil film which could separate two friction surfaces when the system is under boundary lubrication conditions. The increasing friction load can accelerate the friction ehenfieal reaction on the friction interface and lead to the crushing effect on film fragments, which decreased the friction coefficient of friction system. It was also found that the wear width, depth, and volume of the film increased by introducing film fragments and applying great load.

Numerical Analysis on the Effect of n-Si on Cu(In, Ga)Se2 Based Thin-Films for High-Performance Solar Cells by 1D-SCAPS

We report the performances of a chalcopyrite Cu(In, Ga)Se2 CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the 1D-Solar Cell Capacitance Simulator (1D-SCAPS) software program. The new device structure is based on the CIGS layer as the absorber layer, n-Si as the high conductive layer, i-In2S3, and i-ZnO as the buffer and window layers, respectively. The optimum CIGS bandgap was determined first and used to simulate and analyze the cell performance throughout the experiment. This analysis revealed that the absorber layer’s optimum bandgap value has to be 1.4 eV to achieve maximum efficiency of 22.57%. Subsequently, output solar cell parameters were analyzed as a function of CIGS layer thickness, defect density, and the operating temperature with an optimized n-Si layer. The newly modeled device has a p-CIGS/n-Si/In2S3/Al-ZnO structure. The main objective was to improve the overall cell performance while optimizing the thickness of absorber layers, defect density, bandgap, and operating temperature with the newly employed optimized n-Si layer. The increase of absorber layer thickness from 0.2 - 2 µm showed an upward trend in the cell’s performance, while the increase of defect density and operating temperature showed a downward trend in solar cell performance. This study illustrates that the proposed cell structure shows higher cell performances and can be fabricated on the lab-scale and industrial levels.

Field Emission Properties of Nano-DLC Films Prepared on Cu Substrates by Pulsed Laser Deposition

Nano-diamond like carbon（DLC） thin films were prepared on fused silica and Cu substrates by the pulsed-laser deposition technique with different laser intensities. Step-measurement, atomic force microscope（AFM）, UV-VIS-NIR transmittance spectroscopy and Raman spectroscopy were used to characterize the films. It was shown that the deposition rate increases with the laser intensity, and the films prepared under different laser intensities show different transparency. Raman measurement showed that the content of sp^3 of the Nano-DLC thin films decreases with the laser intensity. The field emission properties of the Nano-DLC thin films on Cu substrates were studied by the conventional diode method, which showed that the turn-on field increases and the current density decreases with sp^3 content in the films. A lower turn-on field of 6 V/um and a higher current density of 1 uA/cm^2 were obtained for Nano-DLC thin films on Cu substrate.

Deposition and Thermal Stability of DLC/Si-N Composite Films Synthesized Using a Sputtering-PBII Hybrid System

Diamond-like carbon (DLC) is a metastable amorphous material that exhibits unique properties. However, there are many limitations regarding the use of this material due to factors such as its tribological characteristics at high temperature and limited thermal stability. In this study, the thermal stability and tribological properties of DLC/silicon-nitrogen (DLC/Si-N) composite films were investigated and compared to those of pure DLC films. All the films were synthesized using a combination of radio frequency (RF) magnetron sputtering and plasma-based ion implantation (PBII) (a so-called sputtering-PBII hybrid system) which is newly developed by us. A high purity silicon nitride (99.9%) disk was used as the target, applying an RF power in the range of 500 - 700 W and a negative pulsed bias voltage of 5 kV to the substrate. An Ar-CH4 mixture was used as the reactive gas. The CH4 partial pressure was varied between 0 and 0.15 Pa, while the total gas pressure and total gas flow were fixed at 0.30 Pa and 30 sccm, respectively. The structures of the resulting films were characterized using Raman spectroscopy, while the thermal stabilities were assessed using thermogravimetric-differential thermal analysis (TG-DTA) and friction coefficients were obtained via ball-on-disk friction tests. The results indicate that the DLC/Si-N composite films produced in this work exhibit improved thermal stability relative to that of pure DLC owing to the presence of thermally stable atomic-scale Si-N compound in the carbon main flame networks. A DLC/Si-N film containing approximately 11 at.%Si and 18.5 at.%N shows good thermal stability in air over 800°C up to 1100°C, together with excellent tribological performance at 500°C in air. Overall, the data demonstrate that DLC/Si-N composite films offer improved thermal stability and superior tribological performance at high temperatures.

FABRICATION OF DLC COATED COBALT-CEMENTED TUNGSTEN CARBIDE MICRO-DRILLS AND THEIR CUTTING PERFORMANCE

In machining the particle reinforced aluminum based composite material with high Si content using the cobalt-cemented tungsten carbide micro cutting tools, diamond like carbon （DLC） films are deposited on cobalt-cemented tungsten carbide micro-drills with two-step pretreatment method. Characteristics of DLC coated tools are investigated in bias-enhanced HFCVD system with the optimized hot filament arrangement. The optimization deposition technology is obtained and the wear mechanism of cutting tools is analyzed. The drilling performance of DLC coated tools is verified by the experiments of cutting particle reinforced aluminum based composite material （Si 15% in volume） compared with uncoated ones. Experimental results show that the two-step pretreatment method is appropriate for complex shaped cemented carbide substrates and ensures the good adhesive strength between the diamond film and the substrate. The cutting performance of DLC coated tool is enhanced 10 times when machining the Si particle reinforced aluminum based metal matrix composite compared with that of uncoated ones under the same cutting conditions.

PBII制备TiN_x/DLC多层膜的结构及摩擦学性能

采用等离子体基离子注入技术在30CrMnSi钢上制备了TiNx/DLC多层膜,通过X射线光电子谱和激光喇曼光谱测试分析了膜的结构特征,TiNx/DLC膜大气下的摩擦性能在球盘式摩擦磨损试验机上进行.结果表明:DLC膜的结构强烈依赖于基板脉冲偏压,-5kV制得的DLC膜具有较多的C-H键结构,因而硬度最低,仅有8 3GPa;而-15kV的DLC膜由于含有较多的sp3键,获得了最高的显微努氏硬度(23 6GPa).DLC膜与GCr15钢球大气下的摩擦因数为0 17左右,其磨损性能由于TiNx过渡层引入而显著提高.

GNiCr40Al3Ti合金表面Cr-DLC、CrAlN和CrN薄膜在去离子水环境中的摩擦磨损性能

目的在去离子水环境中,研究GNiCr40Al3Ti合金表面制备的铬掺杂类金刚石(Cr-DLC)、氮化铬铝(CrAlN)和氮化铬(CrN)等薄膜的摩擦磨损性能。方法在GNiCr40Al3Ti合金表面采用离子源辅助非平衡磁控溅射制备Cr-DLC薄膜,采用多弧离子镀技术制备CrAlN薄膜和CrN薄膜。利用冷场发射扫描电镜、拉曼光谱仪和X射线衍射仪,对薄膜的微观结构和形貌进行分析。利用显微硬度计、摩擦磨损试验机、白光干涉扫描轮廓仪等,对薄膜的硬度、摩擦磨损性能、磨痕二维轮廓等进行研究。结果在10 h连续的去离子水环境摩擦过程中,CrN薄膜的平均摩擦系数最低,仅为0.17,比GNiCr40Al3Ti合金的摩擦系数降低了54%。与GNiCr40Al3Ti合金相比,其表面制备的Cr-DLC、CrAlN和CrN薄膜在去离子水环境摩擦条件下都减小了磨损体积,其中,CrN薄膜表现出最好的耐磨性,磨损体积为0.017 mm3,仅为GNiCr40Al3Ti合金磨损体积的0.18%。Cr-DLC薄膜与CrAlN薄膜的耐磨性不及CrN薄膜,主要是由薄膜的微观结构造成的,Cr-DLC薄膜的柱状疏松结构造成薄膜过早的被磨穿,CrAlN薄膜中存在的Cr相引起薄膜硬度降低,从而降低了抗剪切的能力。结论在去离子水环境中,CrN薄膜具有最低的摩擦系数和最佳的耐磨性。

DLC和CrN薄膜在油润滑下的摩擦性能

文摘采用闭合场非平衡直流磁控溅射技术和阴极电弧离子镀技术在轴承钢表面分别制备了DLC和Cr N薄膜,在全配方发动机油(CF-4,15W/40)润滑条件下,选择DLC/钢、Cr N/钢摩擦配副,用SRV-IV摩擦实验机考察了25℃和100℃时DLC与Cr N薄膜在不同载荷下的摩擦因数和磨损率,并对摩擦界面进行分析。结果表明:DLC和Cr N薄膜在油润滑条件下的摩擦因数都随着载荷的增加而降低;DLC和CF-4构成的固液复合润滑体系具有更加优异的摩擦学性能;活性较高的Cr N薄膜与发动机油中的添加剂相互作用,在摩擦界面上发生摩擦化学反应形成摩擦化学反应膜,并且薄膜表面形成的氧化层有利于提高薄膜在高温时的耐磨性。

中频磁控溅射沉积DLC/TiAlN复合薄膜的结构与性能研究

采用中频非平衡磁控溅射沉积工艺,并施加霍尔离子源辅助沉积,在高速钢W18Cr4V及单晶硅基体上制备了梯度过渡的DLC/TiAlN复合薄膜。利用扫描电镜(SEM)、X射线光电子能谱仪(XPS)、显微硬度计、摩擦磨损仪等分析检测仪器对DLC/TiAlN复合薄膜的表面形貌、晶体结构、显微硬度、耐磨性等性能进行了检测分析。实验及分析结果表明:DLC/TiAlN薄膜平均膜厚为1.1μm,由于薄膜中的Al含量较多,使得复合薄膜的表面比DLC薄膜的表面要粗糙一些;通过对复合薄膜表层的XPS分析可知,ID/IG为2.63。由XPS深层剖析可知,DLC/TiAlN薄膜表层结构与DLC薄膜基本相同,里层则与TiAlN薄膜相似。在梯度过渡膜中,复合膜层之间的界面呈现为渐变过程,结合的非常好。DLC/TiAlN薄膜的显微硬度为2030 HV左右。与DLC薄膜显微硬度接近,低于TiAlN薄膜的显微硬度。但是DLC/TiAlN薄膜的耐磨性要好于TiAlN薄膜和DLC薄膜;DLC/TiAlN薄膜的耐腐蚀性能略好于DLC薄膜。