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Numerical Analysis on the Effect of n-Si on Cu(In, Ga)Se2 Based Thin-Films for High-Performance Solar Cells by 1D-SCAPS
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作者 Rasika N. Mohottige Micheal Farndale +1 位作者 Gary S. Coombs Shahnoza Saburhhojayeva 《Open Journal of Applied Sciences》 2024年第5期1315-1329,共15页
We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the ... We report the performances of a chalcopyrite Cu(In, Ga)Se<sub>2 </sub>CIGS-based thin-film solar cell with a newly employed high conductive n-Si layer. The data analysis was performed with the help of the 1D-Solar Cell Capacitance Simulator (1D-SCAPS) software program. The new device structure is based on the CIGS layer as the absorber layer, n-Si as the high conductive layer, i-In<sub>2</sub>S<sub>3</sub>, and i-ZnO as the buffer and window layers, respectively. The optimum CIGS bandgap was determined first and used to simulate and analyze the cell performance throughout the experiment. This analysis revealed that the absorber layer’s optimum bandgap value has to be 1.4 eV to achieve maximum efficiency of 22.57%. Subsequently, output solar cell parameters were analyzed as a function of CIGS layer thickness, defect density, and the operating temperature with an optimized n-Si layer. The newly modeled device has a p-CIGS/n-Si/In<sub>2</sub>S<sub>3</sub>/Al-ZnO structure. The main objective was to improve the overall cell performance while optimizing the thickness of absorber layers, defect density, bandgap, and operating temperature with the newly employed optimized n-Si layer. The increase of absorber layer thickness from 0.2 - 2 µm showed an upward trend in the cell’s performance, while the increase of defect density and operating temperature showed a downward trend in solar cell performance. This study illustrates that the proposed cell structure shows higher cell performances and can be fabricated on the lab-scale and industrial levels. 展开更多
关键词 n-Si p-CIGS 1D-SCAPS Thin-films In2S3
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Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering 被引量:2
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作者 代明江 韦春贝 +4 位作者 周克崧 朱敏 侯惠君 林松盛 佟鑫 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第9期3002-3011,共10页
A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of... A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1. 展开更多
关键词 W/dlc/W-S-C composite film magnetron sputtering adhesion strength friction coefficient
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氮含量对Ti-B-C-N薄膜微观结构和性能的影响
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作者 陈向阳 张瑾 +1 位作者 马胜利 胡海霞 《机械工程材料》 CAS CSCD 北大核心 2024年第5期62-66,共5页
采用反应磁控溅射法在高速钢基体上制备氮原子分数分别为10.8%,15.6%,28.1%,36.4%的Ti-B-C-N薄膜,研究了氮含量对薄膜微观结构、硬度和摩擦磨损性能的影响。结果表明:Ti-B-C-N薄膜均由α-Fe和Ti(C,N)纳米晶组成,具有Ti(C,N)纳米晶镶嵌... 采用反应磁控溅射法在高速钢基体上制备氮原子分数分别为10.8%,15.6%,28.1%,36.4%的Ti-B-C-N薄膜,研究了氮含量对薄膜微观结构、硬度和摩擦磨损性能的影响。结果表明:Ti-B-C-N薄膜均由α-Fe和Ti(C,N)纳米晶组成,具有Ti(C,N)纳米晶镶嵌在非晶基体相中的纳米复合结构;随着氮含量增加,非晶相含量增加,Ti(C,N)纳米晶的含量和晶粒尺寸减小;随着氮含量增加,Ti-B-C-N薄膜的显微硬度增大,摩擦因数和磨损率均减小,表面磨痕变浅,磨损机制由剥落和微观犁削转变为微观抛光。 展开更多
关键词 反应磁控溅射 Ti-B-C-n薄膜 纳米复合结构 硬度 摩擦磨损性能
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n-nc-Si:H低温制备工艺及其在柔性钙钛矿太阳电池中的应用
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作者 靳果 王记昌 闫奇 《河南科技》 2024年第9期83-87,共5页
【目的】为在低温工艺下制备出适用于柔性钙钛矿太阳电池的高性能电子传输层,需要对电子传输层材料及制备条件进行研究。【方法】将n型氢化纳米晶硅薄膜作为柔性钙钛矿太阳电池电子传输层,研究衬底温度对薄膜性能的影响,并优化电子传输... 【目的】为在低温工艺下制备出适用于柔性钙钛矿太阳电池的高性能电子传输层,需要对电子传输层材料及制备条件进行研究。【方法】将n型氢化纳米晶硅薄膜作为柔性钙钛矿太阳电池电子传输层,研究衬底温度对薄膜性能的影响,并优化电子传输层与钙钛矿层界面处理工艺和结构。【结果】得到暗电导率、光透过率、表面形貌适用于柔性钙钛矿太阳电池电子传输层的n型氢化纳米晶硅薄膜低温制备条件,经过界面优化处理的柔性钙钛矿太阳电池转换效率达到14.66%。【结论】在低温工艺下制备出了高性能的电子传输层及柔性钙钛矿太阳电池,对进一步开展叠层钙钛矿太阳电池的研究具有指导意义。 展开更多
关键词 柔性钙钛矿太阳电池 n-nc-Si:H 衬底温度 薄膜性能 界面优化
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DLC基纳米多层膜摩擦学性能的研究进展与展望
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作者 汤鑫 王静静 +3 位作者 李伟 胡月 鲁志斌 张广安 《表面技术》 EI CAS CSCD 北大核心 2024年第8期52-62,共11页
类金刚石(DLC)薄膜是一种良好的固体润滑剂,能够有效延长机械零件、工具的使用寿命。DLC基纳米多层薄膜的设计是耐磨薄膜领域的一项研究热点,薄膜中不同组分层具备不同的物理化学性能组合,能从多个角度(如高温、硬度、润滑)进行设计来... 类金刚石(DLC)薄膜是一种良好的固体润滑剂,能够有效延长机械零件、工具的使用寿命。DLC基纳米多层薄膜的设计是耐磨薄膜领域的一项研究热点,薄膜中不同组分层具备不同的物理化学性能组合,能从多个角度(如高温、硬度、润滑)进行设计来提升薄膜力学性能、摩擦学性能以及耐腐蚀性能等。综述了DLC多层薄膜的设计目的与研究进展,以金属/DLC基纳米多层膜、金属氮化物/DLC基纳米多层膜、金属硫化物/DLC基纳米多层膜以及其他DLC基纳米多层膜为主,对早期研究成果及现在的研究方向进行了概述。介绍了以上几种DLC基纳米多层膜的现有设计思路(形成纳米晶/非晶复合结构、软/硬交替沉积,诱导转移膜形成,实现非公度接触)。随后对摩擦机理进行了分析总结:1)层与层间形成特殊过渡层,提高了结合力;2)软/硬的多层交替设计,可以抵抗应力松弛和裂纹偏转;3)高接触应力和催化作用下诱导DLC中的sp3向sp2转化,形成高度有序的转移膜,从而实现非公度接触。最后对DLC基纳米多层膜的未来发展进行了展望。 展开更多
关键词 dlc基纳米多层膜 力学性能 摩擦学性能 摩擦机理 结构
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Characterization and analysis of DLC films with different thickness deposited by RF magnetron PECVD 被引量:3
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作者 Huang, Yujie Wang, Qi +2 位作者 Wang, Mei Fei, Zhenyi Li, Musen 《Rare Metals》 SCIE EI CAS CSCD 2012年第2期198-203,共6页
Diamond-like carbon (DLC) films have excellent mechanical and chemical properties similar to those of crystalline diamond giving them wide applications as protective coatings. So far, a variety of methods are employed... Diamond-like carbon (DLC) films have excellent mechanical and chemical properties similar to those of crystalline diamond giving them wide applications as protective coatings. So far, a variety of methods are employed to deposit DLC films. In this study, DLC films with different thicknesses were deposited on Si and glass substrates using RF magnetron PECVD method with C 4 H 10 as carbon source. The bonding microstructure, surface morphology and tribological properties at different growing stages of the DLC films were tested. Raman spectra were deconvoluted into D peak at about 1370 cm 1 and G peak around 1590 cm 1 , indicating typical features of the DLC films. A linear relationship between the film thickness and the deposition time was found, revealing that the required film thickness may be obtained by the appropriate tune of the deposition time. The concentration of sp 3 and sp 2 carbon atoms in the DLC films was measured by XPS spectra. As the films grew, the sp 3 carbon atoms decreased while sp 2 atoms increased. Surface morphology of the DLC films clearly showed that the films were composed of spherical carbon clusters, which tended to congregate as the deposition time increased. The friction coefficient of the films was very low and an increase was also found with the increase of film thickness corresponding to the results of XPS spectra. The scratch test proved that there was good bonding between the DLC films and the substrates. 展开更多
关键词 dlc films radio frequency magnetron PECVD CHARACTERIZATIOn thickness
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Preparation and Characterization of DLC Films by Twinned ECR Microwave Plasma Enhanced CVD for Microelectromechanical Systems (MEMS) Applications 被引量:3
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作者 李新 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2004年第2期44-47,共4页
Diamond-like carbon (DLC) films have recently been pursued as the protection of MEMS against their friction and wear.Plasma enhanced chemical vapor deposition (PECVD) technique is very attractive to prepare DLC coatin... Diamond-like carbon (DLC) films have recently been pursued as the protection of MEMS against their friction and wear.Plasma enhanced chemical vapor deposition (PECVD) technique is very attractive to prepare DLC coating for MEMS.This paper describes the preparation of DLC films using twinned electron cyclotron resonance (ECR) microwave PECVD process.Raman spectra confirmed the DLC characteristics of the films.Fourier-transform infrared (FT-IR)characterization indicates the carbon is bonded in the form sp~3 and sp~2 with hydrogen participating in bonding.The surface roughness of the films is as low as approximately (0.093)nm measured with an atomic force microscope.A CERT microtribometer system is employed to obtain information about the scratch resistance,friction properties,and sliding wear resistance of the films.The results show the deposited DLC films have low friction and good scratch/wear resistance properties. 展开更多
关键词 dlc films ECR-MPECVD MEMS
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Tribological Properties of DLC Film Prepared by C^+ Ion Beam-assisted Deposition (IBAD) 被引量:1
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作者 白秀琴 Peter Bhm 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2006年第1期49-52,共4页
C ^+ ion beam-assisted deposition was utilized to prepare deposit diamond-like carbon ( DLC ) film. With the help of a series of experiments such as Raman spectroscopy, FT-IR spectroscopy, AFM and nanoindentation ,... C ^+ ion beam-assisted deposition was utilized to prepare deposit diamond-like carbon ( DLC ) film. With the help of a series of experiments such as Raman spectroscopy, FT-IR spectroscopy, AFM and nanoindentation , the DLC film has been recognized as hydrogenated DLC film and its tribologicul properties have been evaluated. The bull-on-disc testing results show that the hardness and the tribologicul properties of the DLC film produced by C^ + ion beam- assisted deposition are improved significantly. DLC film produced by C ^+ ion beam- assisted deposition is positive to have a prosperous tribologicul application in the near future. 展开更多
关键词 dlc film C ^+ ion beam- assisted deposition (IBAD) tribological properties
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Ti-DLC薄膜压阻性能及载流子输运行为研究
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作者 赵志翰 郭鹏 +5 位作者 魏菁 崔丽 刘山泽 张文龙 陈仁德 汪爱英 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2024年第8期879-886,I0001,I0002,共10页
围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控... 围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控溅射技术,高通量制备出4种Ti含量(原子分数为0.43%~4.11%)的Ti掺杂类金刚石(Ti-DLC)薄膜,研究了Ti含量对薄膜组分结构、电学性能、变湿度环境下压阻性能的影响规律。结果表明:Ti含量(原子分数)在0.43%~4.11%范围内,掺杂Ti原子均以固溶形式均匀镶嵌于非晶碳网络中,Ti-DLC薄膜电学行为表现为典型半导体特性,在200~350 K温度范围内,薄膜电阻率均随温度升高而降低。载流子传导机制在200~270 K内为Mott型三维变程跳跃传导,在270~350 K范围内则为热激活传导。Ti-DLC薄膜压阻系数(Gauge Factor,GF)最大值为95.1,在20%~80%相对湿度范围内,所有样品GF均随湿度增加而增大,这可能是引入的固溶Ti原子缩短了导电相之间的平均距离,同时吸附表面水分子导致电阻变化。 展开更多
关键词 Ti掺杂 类金刚石薄膜 电学性能 可变湿度 压阻行为
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Microstructure and Mechanical Property of Magnetron Sputtering Deposited DLC Film 被引量:2
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作者 孙泽 ZHAO Wen 孔德军 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第3期579-584,共6页
A diamond-like carbon(DLC) film was deposited on YT14 substrate using magnetron sputtering(MS). The surface morphologies, roughness and bonding spectra of obtained film were characterized using scanning electron m... A diamond-like carbon(DLC) film was deposited on YT14 substrate using magnetron sputtering(MS). The surface morphologies, roughness and bonding spectra of obtained film were characterized using scanning electron microscopy(SEM), atomic force microscopy(AFM), and X-ray photoelectron spectroscopy(XPS), respectively, and its mechanical property and bonding strength were measured using a nanoindentation and scratch tester, respectively. The results show that the C-enriched DLC film exhibits a denser microstructure and smoother surface with lower surface roughness of 21.8 nm. The ratio of C sp2 at 284.4 e V that corresponds to the diamond(111) and the C sp3 at 285.3 e V that corresponds to the diamond(220) plane for the as-received film is 0.36: 0.64, showing that the C sp3 has the high content. The hardness and Young's modulus of DLC film by nanoindentation are 8.534 41 and 142.158 1 GPa, respectively, and the corresponding bonding strength is 74.55 N by scratch test. 展开更多
关键词 diamond-like carbondlc film magnetron sputtering(MS) atomic force microscope (AFM) X-ray photoelectron spectroscopy(XPS) nanoindentation
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STUDY ON COMPOSITION, MICROSTRUCTURE AND HARDNESS OF DLC FILMS BY VCAD
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作者 L.Chen Z.Y.Liu +4 位作者 D.C.Zeng W.Q.Qiu Z.H.Yuan S.S.Lin H.J.Hou 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2003年第4期271-275,共5页
DLC super-hard films have been deposited on the substrates of single crystalline Si, pure Ti and stainless steel 18-8 by a method of vacuum cathode arc deposition (VCAD). The composition, microstructure and micro-hard... DLC super-hard films have been deposited on the substrates of single crystalline Si, pure Ti and stainless steel 18-8 by a method of vacuum cathode arc deposition (VCAD). The composition, microstructure and micro-hardness of the films have been studied in this paper. The results indicate that hardness of the DLC films is different on the different substrates. Hardness of the films increases with decreasing in surface roughness of the films. The maximum value of micro-hardness belongs to the DLC films deposited under the hydrogen pressure of 0.35Pa and the negative bias of 100V. 展开更多
关键词 dlc films vacuum cathode arc deposition micro-hardness
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Plasma Diagnosis for Microwave ECR Plasma Enhanced Sputtering Deposition of DLC Films
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作者 庞见华 陆文琪 +3 位作者 辛煜 王行行 贺佳 徐军 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第2期172-176,共5页
Application of the Langmuir probe in plasma circumstance for deposition of diamond-like carbon (DLC) thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this pape... Application of the Langmuir probe in plasma circumstance for deposition of diamond-like carbon (DLC) thin films usually faces the problem of rapid failure of the probe due to surface insulative coating. In this paper, we circumvent the problem by using the floating harmonic probe technique. In the real circumstance of DLC film deposition, the floating harmonic probe worked reliably over 3 hours, correctly indicating the ion density and electron temperature. The technique was practically used to measure the ion density and electron temperature in DLC film deposition processes using the microwave ECR plasma enhanced sputtering. Combined with the Raman spectroscopic characterization of the films, the conditions for deposition of DLC films were investigated. 展开更多
关键词 floating harmonic probe dlc films microwave ECR plasma Raman spec-troscopy
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钽掺杂对多层Ta-DLC薄膜摩擦及腐蚀行为的影响
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作者 李超 孙刚 +3 位作者 马国佳 吴俊升 张博威 张昊泽 《表面技术》 EI CAS CSCD 北大核心 2024年第8期63-73,共11页
目的解决316L不锈钢在苛刻海洋环境中易磨损、易腐蚀的问题。方法采用中频磁控溅射技术在316L不锈钢上沉积了Ta/TaN/TaCN/Ta-DLC薄膜。通过扫描电子显微镜、拉曼光谱、X射线光电子能谱、X射线衍射、纳米压痕、往复摩擦磨损试验和电化学... 目的解决316L不锈钢在苛刻海洋环境中易磨损、易腐蚀的问题。方法采用中频磁控溅射技术在316L不锈钢上沉积了Ta/TaN/TaCN/Ta-DLC薄膜。通过扫描电子显微镜、拉曼光谱、X射线光电子能谱、X射线衍射、纳米压痕、往复摩擦磨损试验和电化学测试等手段,重点研究了DLC膜层中Ta元素掺杂含量对薄膜结构、组成成分、力学性能、摩擦学性能和耐腐蚀性能的影响规律。结果随着Ta元素含量(原子数分数)从2.04%增到4.16%,薄膜中的sp^(3)键含量呈现先升高后降低的趋势,当Ta原子数分数为3.60%时,薄膜中sp3键含量最高,且薄膜的硬度及弹性模量达到最大,分别为7.01 GPa和157.87 GPa。随着Ta元素含量的增加,薄膜的平均摩擦因数逐渐减小,在4.16%(原子数分数)时达到最小0.21。Ta元素含量对薄膜的结合力影响较小,且所有薄膜结合力总体在10 N左右。当Ta原子数分数为3.60%时,薄膜的腐蚀电流密度及钝化电流密度最小,分别为0.006μA/cm^(2)和0.63μA/cm^(2),比其他薄膜的低1~2个数量级,并且薄膜电阻及电荷转移电阻最大,展现出最为优异的耐腐蚀性能。结论Ta元素的掺杂提高了薄膜的耐摩擦性能,且适当的Ta元素掺杂能够提高Ta/TaN/TaCN/Ta-DLC薄膜的耐磨耐蚀性能。 展开更多
关键词 dlc薄膜 磁控溅射 腐蚀 摩擦磨损 元素掺杂
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Influence of nitrogen gas on structure and properties of DLC films prepared by XeCl pulsed laser deposition
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作者 陈玉强 彭鸿雁 +5 位作者 赵立新 李敏君 夏义本 王林军 徐闰 刘建敏 《中国有色金属学会会刊:英文版》 CSCD 2006年第B01期306-309,共4页
Diamond-like carbon (DLC) films were prepared by PLD process using 308 nm(XeCl) laser beam with high power (500 W) and high frequency(300 Hz). The effects of nitrogen pressure on the structure and properties of the DL... Diamond-like carbon (DLC) films were prepared by PLD process using 308 nm(XeCl) laser beam with high power (500 W) and high frequency(300 Hz). The effects of nitrogen pressure on the structure and properties of the DLC films under such extremely high power and repetition rate were studied. The results indicate that the microstructures of the films are varied from amorphous carbon to graphitized carbon in long-order with the increase of N2 pressure, and the optical properties of the films are deteriorated as compared to that of DLC films without nitrogen. 展开更多
关键词 金刚石样碳膜 制备 PLD法 结构 性质 脉冲激光沉积 氮气压力
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Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride
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作者 Phuwanai Bunnak Yongping Gong +2 位作者 Supanee Limsuwan Artorn Pokaipisit Pichet Limsuwan 《Materials Sciences and Applications》 2013年第9期564-571,共8页
Composite SiNx/DLC films were deposited on Si substrate by RF magnetron sputtering of silicon nitride (Si3N4) target simultaneously with filtered cathode arc (FCA) of graphite. The RF power was fixed at 100 W whereas ... Composite SiNx/DLC films were deposited on Si substrate by RF magnetron sputtering of silicon nitride (Si3N4) target simultaneously with filtered cathode arc (FCA) of graphite. The RF power was fixed at 100 W whereas the arc currents of FCA were 20, 40, 60 and 80 A. The effects of arc current on the structure, surface roughness, density and mechanical properties of SiNx/DLC films were investigated. The results show that the arc current in the studied range has effect on the structure, surface roughness, density and mechanical properties of composite SiNx/DLC films. The composite SiNx/DLC films show the sp3 content between 53.5% and 66.7%, density between 2.54 and2.98 g/cm3, stress between 1.7 and 2.2 GPa, and hardness between 35 and 51 GPa. Furthermore, it was found that the density, stress and hardness correlate linearly with the sp3 content for composite SiNx/DLC films. 展开更多
关键词 Silicon nITRIDE DIAMOnD-LIKE Carbon COMPOSITE Sinx/dlc film Filtered Cathodic arc
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Composition and structure of Ti-C/DLC graded composite films
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作者 孙明仁 夏立芳 《中国有色金属学会会刊:英文版》 CSCD 2002年第2期246-250,共5页
The Ti C→DLC gradient composite films were characterized systematically. The elemental depth profile and elemental chemical state evolution were determined by X ray photoelectron spectroscopy (XPS). The transmission ... The Ti C→DLC gradient composite films were characterized systematically. The elemental depth profile and elemental chemical state evolution were determined by X ray photoelectron spectroscopy (XPS). The transmission electron microscope (TEM) and high resolution transmission electron microscopy (HRTEM) were used to study the structure of interfacial zone between DLC film and Ti C layers. Results show that there are composition transition zone between DLC film and either Ti C layer or steel substrate on condition that pre deposited Ti layers on the steel substrate then plasma based bias deposited DLC films. In Ti C graded layer, the chemical state of titanium and carbon are changed gradually. The structures of zone in Ti C layer near the DLC film is consisted of random oriented nanocrystallines TiC dispersed in amorphous DLC matrix. The structure of the zone between DLC film and Ti C graded layer is gradually changed too. 展开更多
关键词 梯度复合薄膜 dlc薄膜 结构 Ti-C 钛-碳
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p-Si/n-Ga_(2)O_(3)异质结制备与特性研究
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作者 陈沛然 焦腾 +6 位作者 陈威 党新明 刁肇悌 李政达 韩宇 于含 董鑫 《人工晶体学报》 北大核心 2024年第1期73-81,共9页
本实验采用金属有机化学气相沉积(MOCVD)工艺,在p(111)型Si衬底上制备了p-Si/n-Ga_(2)O_(3)结构的PN结。通过X射线衍射仪、原子力显微镜等对样品进行了晶体结构、表面形貌、表面粗糙度等的表征分析;通过磁控溅射与蒸镀方法在样品上生长T... 本实验采用金属有机化学气相沉积(MOCVD)工艺,在p(111)型Si衬底上制备了p-Si/n-Ga_(2)O_(3)结构的PN结。通过X射线衍射仪、原子力显微镜等对样品进行了晶体结构、表面形貌、表面粗糙度等的表征分析;通过磁控溅射与蒸镀方法在样品上生长Ti/Au电极并进行I-V特性曲线、开启电压、开关电流比、反向饱和电流、理想因子、零偏压下的势垒高度等结特性测试,研究了掺杂浓度与薄膜厚度对PN结特性的影响,并对其原因进行了分析;通过二步生长法和缓冲层温度优化实验,减少了Si衬底与β-Ga_(2)O_(3)之间的晶格失配与热失配带来的影响,对薄膜与器件特性进行了优化。最终获得了表面粗糙度最低可达到4.21 nm的高质量n型β-Ga_(2)O_(3)薄膜,以及具有较低理想因子(42.1)的PN结。 展开更多
关键词 β-Ga_(2)O_(3)薄膜 金属有机化学气相沉积 p-Si/n-Ga_(2)O_(3) Pn 晶体质量 电学特性
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Effects of fragments on W-DLC films properties under boundary lubrication condition in the friction system
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作者 Zhan Hua Wang Ruijun +2 位作者 Li Zhendong Xu Tianyang Wang Weiping 《China Welding》 EI CAS 2018年第2期31-38,共8页
Abstract Effects of film fragments in the friction system on friction and wear properties of tungsten doped diamond-like carbon films (W-DLC) were studied in the condition of boundary lubrication. It could be observ... Abstract Effects of film fragments in the friction system on friction and wear properties of tungsten doped diamond-like carbon films (W-DLC) were studied in the condition of boundary lubrication. It could be observed that the average friction coefficient was increased after introducing film fragments into the friction system, where these film fragments can accelerate the breaking of the extreme thin oil film which could separate two friction surfaces when the system is under boundary lubrication conditions. The increasing friction load can accelerate the friction ehenfieal reaction on the friction interface and lead to the crushing effect on film fragments, which decreased the friction coefficient of friction system. It was also found that the wear width, depth, and volume of the film increased by introducing film fragments and applying great load. 展开更多
关键词 FRAGMEnTS W-dlc films friction coefficient friction load
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不锈钢喷丝头表面镀DLC膜可行性探讨
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作者 郭庆平 《纺织器材》 2024年第3期28-30,33,共4页
为了提升化纤纺丝用喷丝头质量,介绍金铂合金、钽、不锈钢3种材质化纤喷丝头的优缺点;以SUS316L型不锈钢制作的PY35-2050-0.075型喷丝头为例,通过盐雾试验以及酸性溶液浸泡试验,对比分析其镀DLC膜前后的性能、质量及表面微观形貌变化。... 为了提升化纤纺丝用喷丝头质量,介绍金铂合金、钽、不锈钢3种材质化纤喷丝头的优缺点;以SUS316L型不锈钢制作的PY35-2050-0.075型喷丝头为例,通过盐雾试验以及酸性溶液浸泡试验,对比分析其镀DLC膜前后的性能、质量及表面微观形貌变化。指出:以Cr+WC作为中间过渡层,能提高气相沉积DLC膜与不锈钢喷丝头基体的结合强度;镀DLC膜不锈钢喷丝头的硬度可达2000 HV,强度和耐酸碱腐蚀性均优于普通不锈钢喷丝头,使用寿命长,更适用于高温、高压以及酸碱腐蚀的纺丝环境。 展开更多
关键词 纺丝 喷丝头 不锈钢 dlc 气相沉积 硬度 耐腐蚀性
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Field Emission Properties of Nano-DLC Films Prepared on Cu Substrates by Pulsed Laser Deposition
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作者 彭丽萍 LI Xiangkun +2 位作者 FAN Long WANG Xuemin 吴卫东 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2018年第2期326-330,共5页
Nano-diamond like carbon(DLC) thin films were prepared on fused silica and Cu substrates by the pulsed-laser deposition technique with different laser intensities. Step-measurement, atomic force microscope(AFM), U... Nano-diamond like carbon(DLC) thin films were prepared on fused silica and Cu substrates by the pulsed-laser deposition technique with different laser intensities. Step-measurement, atomic force microscope(AFM), UV-VIS-NIR transmittance spectroscopy and Raman spectroscopy were used to characterize the films. It was shown that the deposition rate increases with the laser intensity, and the films prepared under different laser intensities show different transparency. Raman measurement showed that the content of sp^3 of the Nano-DLC thin films decreases with the laser intensity. The field emission properties of the Nano-DLC thin films on Cu substrates were studied by the conventional diode method, which showed that the turn-on field increases and the current density decreases with sp^3 content in the films. A lower turn-on field of 6 V/um and a higher current density of 1 uA/cm^2 were obtained for Nano-DLC thin films on Cu substrate. 展开更多
关键词 nano-dlc thin films pulsed-laser deposition field emission properties
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