Influence of Microwave Power on the Properties of Hydrogenated Diamond-Like Carbon Films Prepared by ECR Plasma Enhanced DC Magnetron Sputtering

Electron cyclotron resonance （ECR） plasma was applied to enhance the direct current magnetron sputtering to prepare hydrogenated diamond-like carbon （H-DLC） films. For different microwave powers, both argon and hydrogen gas are introduced separately as the ECR working gas to investigate the influence of microwave power on the microstructure and electrical property of the H-DLC films deposited on P-type silicon substrates. A series of characterization methods including the Raman spectrum and atomic force microscopy are used. Results show that, within a certain range, the increase in microwave power affects the properties of the thin films, namely the sp3 ratio, the hardness, the nanoparticle size and the resistivity all increase while the roughness decreases with the increase in microwave power. The maximum of resistivity amounts to 1.1×10^9 Ω.cm. At the same time it is found that the influence of microwave power on the properties of H-DLC films is more pronounced when argon gas is applied as the ECR working gas, compared to hydrogen gas.

Structure and Mechanical Performance of Nitrogen Doped Diamond-like Carbon Films

Nitrogen doped diamond-like carbon （DLC：N） films were prepared by electron cyclotron resonance chemical vapor deposition （ECR-CVD） on polycrystalline Si chips. Film thickness is about 50 nm. Auger electron spectroscopy （AES） was used to evaluate nitrogen content, and increasing N2 flow improved N content from 0 to 7.6%. Raman and X-ray photoelectron spectroscopy （XPS） analysis results reveal CN-sp^3C and N-sp^2C structure. With increasing the N2 flow, sp^3C decreases from 73.74% down to 42.66%, and so does N-sp^3C from 68.04% down to 20.23%. The hardness decreases from 29.18 GPa down to 19.74 GPa, and the Young＇s modulus from 193.03 GPa down to 144.52 GPa.

Fabrication of Diamond-like Carbon Films by Ion Assisted Middle Frequency Unbalanced Magnetron Sputtering

Diamond-like carbon （DLC） films are deposited by the Hall ion source assisted by the mid-frequency unbalanced magnetron sputtering technique. The effects of the substrate voltage bias, the substrate temperature, the Hall discharging current and the argon/nitrogen ratio on the DLC film＇s performance were studied. The experimental results show that the film＇s surface roughness, the hardness and the Young＇s modulus increase firstly and then decrease with the bias voltage incrementally increases. Also when the substrate temperature rises, the surface roughness of the film varies slightly, but its hardness and Young＇s modulus firstly increase followed by a sharp decrease when the temperature surpassing 120 ℃. With the Hall discharging current incrementally rising, the hardness and Young＇s modulus of the film decrease and the surface roughness of the film on 316L stainless steel firstly decreased and then remains constant.

Preparation of Diamond-like Carbon Films on the Surface of Ti Alloy by Electro-deposition

In this paper, diamond-like carbon (DLC) films were deposited on Ti alloy by electro-deposition. DLC films were brown andcomposed of the compact grains whose diameter was about 400 nm. Examined by XPS, the main composition of the filmswas carbon. In the Raman spectrum, there were a broad peak at 1350 cm^(-1) and a broad peak at 1600 cm^(-1), which indicatedthat the films were DLC films.

Tribological properties of diamond-like carbon films deposited bv pulsed laser arc deposition

A novel method, pulsed laser arc deposition combining the advantages of pulsed laser deposition and cathode vacuum arc techniques, was used to deposit the diamond-like carbon （DLC） nanofilms with different thicknesses. Spectroscopic ellipsometer, Auger electron spectroscopy, x-ray photoelectron spectroscopy, Raman spectroscopy, atomic force microscopy, scanning electron microscopy and multi-functional friction and wear tester were employed to investigate the physical and tribological properties of the deposited films. The results show that the deposited films are amorphous and the sp2, sp3 and C-O bonds at the top surface of the films are identified. The Raman peak intensity and surface roughness increase with increasing film thickness. Friction coefficients are about 0.1, 0.15, 0.18, when the film thicknesses are in the range of 17-21 nm, 30-57 nm, 67-123 nm, respectively. This is attributed to the united effects of substrate and surface roughness. The wear mechanism of DLC films is mainly abrasive wear when film thickness is in the range of 17-41 nm, while it transforms to abrasive and adhesive wear, when the film thickness lies between 72 and 123 nm.

Structures of Diamond-Like Carbon Films

The structures of diamond-like carbon （DLC） films, including a-C：H, a-C, ta-C：H and ta-C films have been investigated as a random covalent network with a dense film structure. The results show that sp2 C in a-C：H and a-C films tends to form olefinic and aromatic groups while sp^3 C in ta-C：H and ta-C films tends to form single or multiple sixfold groups. The hydrogen atoms in hydrogenated DLC films contribute to stabilizing the carbon skeletal networks. The film structures are well related to their properties such as optical gaps, density and hardness. The results also indicate that the high density and the extreme hardness of ta-C films are attributed to the forming of large sp^3 C bonded sixfold groups.

STUDY OF RAY IRRADIATION ON DIAMOND-LIKE CARBON FILMS

Diamond-like carbon (DLC) films have been deposited on glass substrates usingradio-frequency (rf) plasma deposition method. Gamma -ray, ultraviolet (UV) ray were used toirradiate the DLC films. Raman spectroscopy and infrared (IR) spectroscopy were use to characterizethe changing characteristics of SP^3 C-H bond and hydrogen content in the films due to theirradiations. The results show that, the damage degrees induced by the UV ray on the SP^3 C-H bondsare much stronger than that by the gamma -ray. When the irradiation dose of gamma -ray reaches 1 OX10^4 Gy, the SP^3 C-H bond reduces about 50 percent in number. The square electrical resistance ofthe films is reduced due to the irradiation of UV ray and this is caused by severe oxidation of thefilms. By using the results on optical gap of the films and the fully constrained network theory,the hydrogen content in the as-deposited films is estimated to be l0-25at. percent.

Surface properties of diamond-like carbon films prepared by CVD and PVD methods

Diamond-like carbon （DLC） films have been deposited using three different techniques： （a） electron cyclotron resonance——plasma source ion implantation, （b） low-pressure dielectric barrier discharge, （c） filtered——pulsed cathodic arc discharge, The surface and mechanical properties of these films are compared using atomic force microscopebased tests. The experimental results show that hydrogenated DLC films are covered with soft surface layers enriched with hydrogen and sp^3 hybridized carbon while the soft surface layers of tetrahedral amorphous carbon （ta-C） films have graphite-like structure, The formation of soft surface layers can be associated with the surface diffusion and growth induced by the low-energy deposition process. For typical CVD methods, the atomic hydrogen in the plasmas can contribute to the formation of hydrogen and sp^3 hybridized carbon enriched surface layers, The high-energy ion implantation causes the rearrangement of atoms beneath the surface layer and leads to an increase in film density. The ta-C films can be deposited using the medium energy carbon ions in the highly-ionized plasma.

Structural characteristics of surface-functionalized nitrogen-doped diamond-like carbon films and effective adjustment to cell attachment

Nitrogen-doped diamond-like carbon （DLC：N） films prepared by the filtered cathodic vacuum arc technology are functionalized with various chemical molecules including dopamine （DA）, 3-Aminobenzeneboronic acid （APBA）, and adenosine triphosphate （ATP）, and the impacts of surface functionalities on the surface morphologies, compositions, microstructures, and cell compatibility of the DLC：N films are systematically investigated. We demonstrate that the surface groups of DLC：N have a significant effect on the surface and structural properties of the film. The activity of PC12 cells depends on the particular type of surface functional groups of DLC：N films regardless of surface roughness and wettability. Our research offers a novel way for designing functionalized carbon films as tailorable substrates for biosensors and biomedical engineering applications.

ION IMPLANTATION OF DIAMOND-LIKE CARBON FILMS

Diamond-like carbon (DLC) films (a-C:H) were implanted by 140 keV and 110 keV Ar ion beams. The resistivities of the implanted films decreased dramatically under a dose of 2×1016 Ar/cm2 . IR spectra and optical gap Eopt were measured. It was found that the sp2 and sp3 components decreased due to the loss of hydrogen during implantation, and the ratio of components sp bonds to sp bonds increased with the ion dose. And the optical gap Eopt decreased from 1.46 eV to 0.83 eV. The hydrogen (bonded and unbonded) contents in the films were measured with the nuclear resonant reaction 1H(19 F, x 7) 16O. It is shown that hydrogen plays an important role in affecting some properties of DLC fims.

Mechanism of high growth rate for diamond-like carbon films synthesized by helicon wave plasma chemical vapor deposition

A high growth rate fabrication of diamond-like carbon（DLC）films at room temperature was achieved by helicon wave plasma chemical vapor deposition（HWP-CVD）using Ar/CH4gas mixtures.The microstructure and morphology of the films were characterized by Raman spectroscopy and scanning electron microscopy.The diagnosis of plasma excited by a helicon wave was measured by optical emission spectroscopy and a Langmuir probe.The mechanism of high growth rate fabrication for DLC films by HWP-CVD has been discussed.The growth rate of the DLC films reaches a maximum value of 54μm h^-1at the CH4flow rate of 85 sccm,which is attributed to the higher plasma density during the helicon wave plasma discharge.The CH and Hαradicals play an important role in the growth of DLC films.The results show that the Hαradicals are beneficial to the formation and stabilization of C=C bond from sp^2to sp^3.

Fabrication of ZnO nanoparticles-embedded hydrogenated diamond-like carbon films by electrochemical deposition technique

ZnO nanoparticles-embedded hydrogenated diamond-like carbon （ZnO-DLC） films have been prepared by electro- chemical deposition in ambient conditions. The morphology, composition, and microstructure of the films have been investigated. The results show that the resultant films are hydrogenated diamond-like carbon films embedded with ZnO nanoparticles in wurtzite structure, and the content and size of the ZnO nanoparticles increase with increasing deposition voltage, which are confirmed by X-ray photoelectron spectroscopy （XPS）, Raman, and transmission electron microscope （TEM）. Furthermore, a possible mechanism used to describe the growth process of ZnO-DLC films by electrochemical deposition is also discussed.

STRUCTURE, MECHANICAL PROPERTIES AND THERMAL STABILITY OF DIAMOND-LIKE CARBON FILMS PREPARED BY ARC ION PLATING

Diamond-like Carbon (DLC) films have been prepared on Si(100) substrates by arc ion plating in conjunction with pulse bias voltage under H2 atmosphere. The depo sited films have been characterized by scanning electron microscopy and atomic f orce microscopy. The results show that the surface of the film is smooth and den se without any cracks, and the surface roughness is low. The bonding characteris tic of the films has been studied by X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. It shows the sp3 bond content of the film deposited at -200V is 26.7%. The hardness and elastic modulus of the film determined by nanoindent ation technique are 30.8 and 250.1GPa, respectively. The tribological characteri stic of the films reveals that they have low friction coefficient and good wear- resistance. After deposition, the films have been annealed in the range of 350-7 00℃ for 1h in vacuum to investigate the thermal stability. Raman spectra indica te that the ID/IG ratio and G peak position have few detectable changes below 50 0℃. Further increasing the annealing temperature, the hydrogen can be released, the structure rearranges, and the phase transition of sp3 configured carbon to sp2 configured carbon appears.

Adhesion Studies of Diamond-Like Carbon Films Deposited on Ti6Al4V Alloy after Carbonitriding

Diamond-like Carbon (DLC) coatings have attracted significant attention due to their low friction coefficient, high degree of hardness, chemical inertness, and high wear resistance as well as and their many possible uses in metallurgical, aeronautical, and biomedical applications. However, DLC has low adhesion strength to metallic substrates. Carbonitriding was performed before DLC deposition to improve this adherence. Different concentration of nitrogen in the gas mixture was used during the carbonitriding of Ti6Al4V alloy. DLC films were subsequently grown from methane using plasma enhanced chemical vapor deposition. The samples were characterized with Raman scattering spectroscopy, nanoindentation, and tribological tests. Films from 80.0% N2 had the best friction coefficient (0.07) and a critical load of ~22 N. In the scratching test, these films had adhesive failure and they completely detached from the substrate only in the end of the tests. SEM images show carbonitring promoted a significant increase in the surface defects (homogeneously distributed) but without the presence of microcracks. EDX analysis indicated that nitrogen element was diffused throughout the thickness of the samples. Hydrogen and carbon atoms from carbonitriding formed a diffusion-barrier layer that can be used as the first step for DLC deposition. This carbonitriding can also provide a carbide layer, which serves as the precursor for the nucleation and growth of DLC films.

Surface Roughness of Various Diamond-Like Carbon Films

Atomic force microscopy is used to estimate and compare the surface morphology of hydrogenated and hydrogen-free diamond-like carbon （DLC） films. The films were prepared by using DC magnetron sputtering of a graphite target, pulsed cathodic carbon arcs, electron cyclotron resonance （ECR）, plasma source ion implantation and dielectric barrier discharge （DBD）. The difference in the surface structure is presented for each method of deposition. The influences of various discharge parameters on the film surface properties are discussed based upon the experimental results. The coalescence process via the diffusion of adsorbed carbon species is responsible for the formation of hydrogen-free DLC films with rough surfaces. The films with surface roughness at an atomic level can be deposited by energetic ion impacts in a highly ionized carbon plasma. The hydrocarbon species dangling bonds created by atomic hydrogen lead to the uniform growth of at the a-C：H film surfaces of the ECR or DBD plasmas

Role of atomic transverse migration in growth of diamond-like carbon films

The growth of diamond-like carbon （DLC） films is studied using molecular dynamics simulations. The effect of impact angle on film structure is carefully studied, which shows that the transverse migration of the incident atoms is the main channel of film relaxation. A transverse-migration-induced film relaxation model is presented to elucidate the process of film relaxation which advances the original model of subplantation. The process of DLC film growth on a rough surface is also investigated, as well as the evolution of microstructure and surface morphology of the film. A preferential-to-homogeneous growth mode and a smoothing of the film are observed, which are due to the transverse migration of the incident atoms.

Irradiation Effect of γ Rays on Diamond-Like Carbon Films

Diamond like carbon films, prepared by RF glow discharge on glass substrates, were irradiated by γ rays. The as deposited and irradiated films were characterized by Raman spectroscopy, electrical resistivity, and infrared transmittance. It is shown that the irradiation of the γ rays can lead to the breaking of SP 3 C H and SP 2 C H bonds, slight increasing of SP 3 C C bonds, and induced hydrogen recombination with H 2 molecules, subsequently diffusing to the surface of the films. When the γ rays irradiation dose reached 10×10 4 Gy, the numbers of SP 3 C H bonds was decreased by about 50%, the resistivity of irradiated DLC films was increased, and the diamond like character of the films became more obvious. The structure of DLC films was modified when irradiated by γ rays. The irradiation mechanisms are briefly discussed.

Diamond-like carbon films synthesized on bearing steel surface by plasma immersion ion implantation and deposition

Diamond-like carbon (DLC) films were synthesized by plasma immersion ion implantation and deposition (PIIID) on 9Cr18 bearing steel surface. Influences of working gas pressure and pulse width of the bias voltage on properties of the thin film were investigated. The chemical compositions of the as-deposited films were characterized by Raman spectroscopy. The micro-hardness, friction and wear behavior, corrosion resistance of the samples were evaluated, respectively. Compared with uncoated substrates, micro-hardness results reveal that the maximum is increased by 88.7%. In addition, the friction coefficient decreases to about 0.1, and the corrosion resistance of treated coupons surface are improved significantly.

Heat Resistant Properties of Some Elements-Incorporated Diamond-Like Carbon Films and Their Trial Applications for Micro End Mill Coatings

In this article, the results obtained from a study carried out on the some elements-incorporated diamond-like carbon (DLC) films are reported. All the films were deposited using plasma-based ion implantation (PBII) technique. The deposited films were annealed at 400℃, 650℃ and 900℃ in an air atmosphere for 1 hour. The effects of adding hydrogen, silicon/oxygen and silicon/nitrogen into the DLC film on chemical composition, friction coefficient and corrosion resistance were investigated. The films coated micro end mills performance was also assessed. The results indicate that all the films showed almost constant atomic contents of C, Si, O and N until annealing at 400℃. However, the films were completely destroyed at 650℃ with the increased Si and O contents, while the C content decreased. The incorporation of silicon/oxygen and silicon/nitrogen into the DLC exhibited lower values of friction coefficients than the hydrogenated DLC (DLC and H-DLC) before and after annealing at 400℃, whereas all the films presented the same values of friction coefficients after annealing at 650℃ due to the completely destroy of the films. Furthermore, the incorporation of silicon/nitrogen into the DLC also exhibited better corrosion resistance and unbroken micro end mills performance on their surfaces. Thus, the incorporation of silicon/nitrogen into the DLC film can be considered beneficial in improving the micro end mills performance.

Effects of nitrogen content on structure and electrical properties of nitrogen-doped fluorinated diamond-like carbon films

Nitrogen-doped fluorinated diamond-like carbon(FN-DLC)films were prepared on single crystal silicon substrate by radio frequency plasma enhanced chemical vapor deposition(RF-PECVD)under different deposited conditions with CF4,CH4 and nitrogen as source gases.The influence of nitrogen content on the structure and electrical properties of the films was studied.The films were investigated in terms of surface morphology,microstructure,chemical composition and electrical properties.Atomic force microscopy(AFM)results revealed that the surface morphology of the films became smooth due to doping nitrogen.Fourier transform infrared absorption spectrometry(FTIR)results showed that amouts of C=N and C≡N bonds increased gradually with increasing nitrogen partial pressure r(r=p(N2)/p(N2+CF4+CH4)).Gaussian fit results of C 1s and N 1s in X-ray photoelectron spectra (XPS)showed that the incorporation of nitrogen presented mainly in the forms ofβ-C3N4 and a-CNx(x=1,2,3)in the films.The current-voltage(I-V)measurement results showed that the electrical conductivity of the films increased with increasing nitrogen content.