Stress-Induced Deformation of Thin Copper Substrate in Double-Sided Lapping

Double-sided lapping is an precision machining method capable of obtaining high-precision surface.However,during the lapping process of thin pure copper substrate,the workpiece will be warped due to the influence of residual stress,including the machining stress and initial residual stress,which will deteriorate the flatness of the workpiece and ultimately affect the performance of components.In this study,finite element method(FEM)was adopted to study the effect of residual stress-related on the deformation of pure copper substrate during double-sided lapping.Considering the initial residual stress of the workpiece,the stress caused by the lapping and their distribution characteristics,a prediction model was proposed for simulating workpiece machining deformation in lapping process by measuring the material removal rate of the upper and lower surfaces of the workpiece under the corresponding parameters.The results showed that the primary cause of the warping deformation of the workpiece in the doublesided lapping is the redistribution of initial residual stress caused by uneven material removal on the both surfaces.The finite element simulation results were in good agreement with the experimental results.

Fast source mask co-optimization method for high-NA EUV lithography

Extreme ultraviolet(EUV)lithography with high numerical aperture(NA)is a future technology to manufacture the integrated circuit in sub-nanometer dimension.Meanwhile,source mask co-optimization(SMO)is an extensively used approach for advanced lithography process beyond 28 nm technology node.This work proposes a novel SMO method to improve the image fidelity of high-NA EUV lithography system.A fast high-NA EUV lithography imaging model is established first,which includes the effects of mask three-dimensional structure and anamorphic magnification.Then,this paper develops an efficient SMO method that combines the gradient-based mask optimization algorithm and the compressivesensing-based source optimization algorithm.A mask rule check(MRC)process is further proposed to simplify the optimized mask pattern.Results illustrate that the proposed SMO method can significantly reduce the lithography patterning error,and maintain high computational efficiency.

The study of lithographic variation in resistive random access memory

Reducing the process variation is a significant concern for resistive random access memory(RRAM).Due to its ultrahigh integration density,RRAM arrays are prone to lithographic variation during the lithography process,introducing electrical variation among different RRAM devices.In this work,an optical physical verification methodology for the RRAM array is developed,and the effects of different layout parameters on important electrical characteristics are systematically investigated.The results indicate that the RRAM devices can be categorized into three clusters according to their locations and lithography environments.The read resistance is more sensitive to the locations in the array(~30%)than SET/RESET voltage(<10%).The increase in the RRAM device length and the application of the optical proximity correction technique can help to reduce the variation to less than 10%,whereas it reduces RRAM read resistance by 4×,resulting in a higher power and area consumption.As such,we provide design guidelines to minimize the electrical variation of RRAM arrays due to the lithography process.

Two-photon polymerization lithography for imaging optics

Optical imaging systems have greatly extended human visual capabilities,enabling the observation and understanding of diverse phenomena.Imaging technologies span a broad spectrum of wavelengths from x-ray to radio frequencies and impact research activities and our daily lives.Traditional glass lenses are fabricated through a series of complex processes,while polymers offer versatility and ease of production.However,modern applications often require complex lens assemblies,driving the need for miniaturization and advanced designs with micro-and nanoscale features to surpass the capabilities of traditional fabrication methods.Three-dimensional(3D)printing,or additive manufacturing,presents a solution to these challenges with benefits of rapid prototyping,customized geometries,and efficient production,particularly suited for miniaturized optical imaging devices.Various 3D printing methods have demonstrated advantages over traditional counterparts,yet challenges remain in achieving nanoscale resolutions.Two-photon polymerization lithography(TPL),a nanoscale 3D printing technique,enables the fabrication of intricate structures beyond the optical diffraction limit via the nonlinear process of two-photon absorption within liquid resin.It offers unprecedented abilities,e.g.alignment-free fabrication,micro-and nanoscale capabilities,and rapid prototyping of almost arbitrary complex 3D nanostructures.In this review,we emphasize the importance of the criteria for optical performance evaluation of imaging devices,discuss material properties relevant to TPL,fabrication techniques,and highlight the application of TPL in optical imaging.As the first panoramic review on this topic,it will equip researchers with foundational knowledge and recent advancements of TPL for imaging optics,promoting a deeper understanding of the field.By leveraging on its high-resolution capability,extensive material range,and true 3D processing,alongside advances in materials,fabrication,and design,we envisage disruptive solutions to current challenges and a promising incorporation of TPL in future optical imaging applications.

Real-time generation of circular patterns in electron beam lithography

Electron beam lithography(EBL)involves the transfer of a pattern onto the surface of a substrate byfirst scanning a thin layer of organicfilm(called resist)on the surface by a tightly focused and precisely controlled electron beam(exposure)and then selectively removing the exposed or nonexposed regions of the resist in a solvent(developing).It is widely used for fabrication of integrated cir-cuits,mask manufacturing,photoelectric device processing,and otherfields.The key to drawing circular patterns by EBL is the graphics production and control.In an EBL system,an embedded processor calculates and generates the trajectory coordinates for movement of the electron beam,and outputs the corresponding voltage signal through a digital-to-analog converter(DAC)to control a deflector that changes the position of the electron beam.Through this procedure,it is possible to guarantee the accuracy and real-time con-trol of electron beam scanning deflection.Existing EBL systems mostly use the method of polygonal approximation to expose circles.A circle is divided into several polygons,and the smaller the segmentation,the higher is the precision of the splicing circle.However,owing to the need to generate and scan each polygon separately,an increase in the number of segments will lead to a decrease in the overall lithography speed.In this paper,based on Bresenham’s circle algorithm and exploiting the capabilities of afield-programmable gate array and DAC,an improved real-time circle-producing algorithm is designed for EBL.The algorithm can directly generate cir-cular graphics coordinates such as those for a single circle,solid circle,solid ring,or concentric ring,and is able to effectively realizes deflection and scanning of the electron beam for circular graphics lithography.Compared with the polygonal approximation method,the improved algorithm exhibits improved precision and speed.At the same time,the point generation strategy is optimized to solve the blank pixel and pseudo-pixel problems that arise with Bresenham’s circle algorithm.A complete electron beam deflection system is established to carry out lithography experiments,the results of which show that the error between the exposure results and the preset pat-terns is at the nanometer level,indicating that the improved algorithm meets the requirements for real-time control and high precision of EBL.

Preparation of Double-sided Nanostructure Based on Soft-nanoimprinting Lithography

Double-sided nanostructure has more excellent properties in high efficiency,high yield,and high capability devices,which becomes the attention spots in nanofabrication technology.We proposed a very simple method to fabricate the double-sided nanostructure on polymer elastic substrate.By using twice soft-nanoimprinting process,the same or different nanostructures array was fabricated onto the elastomeric slab substrate.In this paper,we fabricated double-sided nanopillars array with different diameters of 200nm and 350nm.In order to expand the applications field in optical and electronic devices,metal layer could be deposited onto the substrate before imprinting nanostructure.

Formation, microstructure and mechanical properties of double-sided laser beam welded Ti-6Al-4V T-joint

The T-joints of Ti?6Al?4V alloy were manufactured by double-sided synchronized laser beam welding with the homologous filler wire. The formation, microstructure and mechanical properties of welded joints as well as the correlations of each other were investigated. The results indicate that the quality of weld seams is good without defects such as discontinuity, beading, visible cracks or porosity, which is linked to the steady molten pool behavior and droplet transition. The morphologies of the heat affected zone (HAZ) located on the skin and stringer are disparate. The microstructure of the HAZ and fusion zone (FZ) is mainly comprised of acicular martensiticα′ phases. The microhardness of the HAZ and FZ is higher than that of the base metal (BM) and reaches a maximum value at the HAZ near FZ on the stringer. The tensile specimens along the skin and stringer fractured at the BM with ductile fracture surfaces.

Microstructure evolution along thickness in double-side friction stir welded 7085 Al alloy

The microstructure evolution in the weld zone of double-side friction stir welded（DS-FSWed） 7085-T7452 Al alloy was investigated by the electron backscatter diffraction method.The results indicate that DS-FSW process results in substantial grain refinement.The misorientation angle distribution shows a very high volume fraction of high angle grain boundary（HAGB）（above 75%） under DS-FSW condition at rotational rate of 300 r/min.The fraction of HAGB rapidly decreases with increasing the rotational rate from 300 to 950 r/min,and the obvious growth of grain in the weld nugget zone（WNZ） is presented.The average grain sizes in the elongated grains of thermal-mechanical affected zone（TMAZ） and partially equiaxed and coarser grains of thermal affected zone（HAZ） are 7.3 and 15.7 μm with the fractions of HAGBs less than 43% and 30%,respectively.The intensities of（100）,（110） and（111） pole figures in the WNZ obviously decrease when compared with those in the BM and present significantly difference along the thickness direction of plate.

Characterization of CIAE developed double-sided silicon strip detector for charged particles

A double-sided silicon strip detector(DSSD)with active area of 48 mm x 48 mm and thickness of300μm has been developed. Each side of DSSD consists of48 strips, each with width of 0.9 mm and inter-strip separation of 0.1 mm. Electrical properties and detection performances including full depletion bias voltage, reverse leakage current, rise time, energy resolution and cross talk have been studied. At a bias of 80 V, leakage current in each strip is less than 15 nA, and rise time for alpha particle at 5157 keV is approximately 15 ns on both sides.Good energy resolutions have been achieved with0.65-0.80% for the junction strips and 0.85-1.00% for the ohmic strips. The cross talk is found to be negligible on both sides. The overall good performance of DSSD indicates its readiness for various nuclear physics experiments.

Keyhole Double-Sided Arc Welding Process

In the proposed method, the current/arc is guided through the keyhole so that the energy of the plasma jet is compensated while it is consumed in heating the workpiece along the keyhole. As a result, deep narrow penetration has been achieved on 12.7 mm (1/2') thick stainless steel plates using 70 A welding current.

Numerical Simulation of Current Density Distribution in Keyhole Double-Sided Arc Welding

In the double-sided arc welding system (DSAW) composing of PAW+TIG arcs, the PAW arc is guided by the TIG arc so that the current mostly flows through the direction of the workpiece thickness and the penetration is greatly improved. To analyze the current density distribution in DSAW is beneficial to understanding of this process. Considering all kinds of dynamic factors acting on the weldpool, this paper discusses firstly the surface deformation of the weldpool and the keyhole formation in PAW+TIG DSAW process on the basis of the magnetohydrodynamic theory and variation principles. Hence, a model of the current density distribution is developed. Through numerical simulation, the current density distribution in PAW+TIG DSAW process is quantitatively analyzed. It shows that the minimal radius of keyhole formed in PAW+TIG DSAW process is 0.5 mm and 89.5 percent of current flows through the keyhole.

Nonlinear optical properties in double-sided nonlinear media with Z-scan technique based on the Huygens-Fresnel principle

We present a theoretical model to analyse the propagation of a Gaussian laser beam through double-sided nonlinear media. This model is based on the Huygens-Fresnel diffraction integral method. This theoretical model is not only consistent with the cascade structure model for a small nonlinear phase-shift but also can be used for a large nonlinear phase-shift. It has been verified that it is suitable to characterize the double-sided nonlinear media compared with the cascade structure model. A good agreement between the experimental data and the results from the theoretical model is obtained. It will be useful for the design of multi-sided nonlinear materials.

Effect of pin penetration depth on double-sided friction stir welded joints of AA6061-T913 alloy

Friction stir welding (FSW) of aluminum alloys is currently utilized in several modern industries. The joints must have sufficient elastic?plastic response and formability levels similar to that of the base metal. In this work, double-sided FSW of AA6061 sheet was compared with its conventional single-sided one. An adjustable tool with different pin lengths (50%?95% of the sheet thickness) was used to perform the double-sided welds. Macro- and micro-structures, strength, and hardness of the joints were investigated to determine the optimum pin penetration depth. The best results were obtained for a double-sided joint made by a pin length equal to 65% of the sheet thickness, which showed an increase of 41% in the ultimate tensile strength compared with the single-sided joint.

Study on heat efficiency of laser-TIG double-side welding

A series of laser-TIG double-side welding experiments for aluminum alloys were carried out to investigate the heat efficiency of the process. The melting efficiency was introduced to evaluate quantitatively the degree of the mutual effect of the laser and the arc. The results showed that the melting efficiency of laser-TIG double-side welding exceeded the sum of the laser and the arc taken separately. With the increase of heat input, the weld depth and melting efficiency of the laser and the arc were increased signifwantly. This, in fact, implies the strong mutual effect of the laser and the arc as heat sources joined simultaneously in the process. Comparatively, the higher efficiency of the laser constituent of heat sources plays the main role in the increase of the process efficiency. The phenomena of arc column convergence, increased laser absorptivity and the formation of heat accumulation region are the causes of the improvement of heat efficiency.

Numerical Simulation of Electromagnetic Force in Double-Sided Arc Welding Process

Up till now, most of the researchers believe that there are four kinds of forces in the weld pool convection, they aresurface tension, electromagnetic force, buoyancy and gas shear stress. So electromagnetic force is very important,especially when large current is applied. In most of previous models, the electromagnetic force is calculated analytically,in which only the axial component of current is considered. Actually the radial component of current has thesame effect, and may be advanced in some locations. In double-sided arc welding process, instead of the earthclamp, another torch is placed on the opposite side; the current will go from one torch, through the weld zone,to another torch. In this case, the current is more concentrated in the weld zone; the electromagnetic force willhave significant effect compared with conventional welding process. In this paper, a new method of numericalcalculation for electromagnetic force is developed, in which both axial and radial components are considered. And asan example, the distribution of electromagnetic force in double-sided arc welding is calculated. It demonstrates thatthis new method could give more accurate simulation of electromagnetic force, and is close to the actual process.

Characteristic studies on positive and negative streamers of double-sided pulsed surface dielectric barrier discharge

The mechanisms of streamer generation and propagation in double-sided pulsed surface dielectric barrier discharge(SDBD)on both sides have been analyzed and investigated by experiment and numerical simulation.The fully exposed asymmetric SDBD has two discharge processes located on the high voltage electrode(HVE)side and the ground electrode(GE)side.Discharge images of the HVE side and GE side are taken by a digital camera under continuous pulse and ICCD(Intensified Charge Coupled Device)is utilized to diagnose the generation and propagation of streamers in single pulse discharge.In order to understand the physical mechanisms of streamer evolution more deeply,we establish a 2D simulation model and analyze it from the aspects of electron density,ion density,reduced electric field and electron impact ionization source term.The results show that the primary and secondary discharges on the HVE side and the GE side of the double-sided SDBD are composed of positive streamer and negative streamer,respectively.On the HVE side,the accumulation of positive charges on the dielectric surface causes the direction of the electric field to reverse,which is the principal factor for the polarity reversal of the streamer.On the GE side,both the negative charges accumulated on the dielectric surface and the falling voltage are the key factors for the streamer polarity switch.

Penetration mechanism of aluminum alloy in double-sided GTAW process

The penetration mechanism of aluminum alloy in double-sided gas tungsten arc welding (GTAW) process was probed by means of theoretical analysis, experimentation and numerical simulation. The results show that, firstly, the welding current goes straight through the weld zone, forms a stronger electromagnetic force field, and causes a stronger fluid flow in the weld pool. Secondly, during double-sided GTAW process, when the weld is partial penetrated, a heat-congregated zone forms between the bottoms of the two weld pools, where the temperature can increase quickly even though only a small amount of heat is input. Thirdly, the buoyancy force causes an inward flow in the bottom weld pool, which can drive the hot liquid on the surface to the bottom of the pool.

Double-sided subduction with contrasting polarities beneath the Pamir-Hindu Kush:Evidence from focal mechanism solutions and stress field inversion

The Pamir-Hindu Kush region at the western end of the Himalayan-Tibet orogen is one of the most active regions on the globe with strong seismicity and deformation and provides a window to evaluate continental collision linked to two intra-continental subduction zones with different polarities.The seismicity and seismic tomography data show a steep northward subducting slab beneath the Hindu Kush and southward subducting slab under the Pamir.Here,we collect seismic catalogue with 3988 earthquake events to compute seismicity images and waveform data from 926 earthquake events to invert focal mechanism solutions and stress field with a view to characterize the subducting slabs under the Pamir-Hindu Kush region.Our results define two distinct seismic zones:a steep one beneath the Hindu Kush and a broad one beneath the Pamir.Deep and intermediate-depth earthquakes are mainly distributed in the Hindu Kush region which is controlled by thrust faulting,whereas the Pamir is dominated by strike-slip stress regime with shallow and intermediate-depth earthquakes.The area where the maximum principal stress axis is vertical in the southern Pamir corresponds to the location of a highconductivity low-velocity region that contributes to the seismogenic processes in this region.We interpret the two distinct seismic zones to represent a double-sided subduction system where the Hindu Kush zone represents the northward subduction of the Indian plate,and the Pamir zone shows southward subduction of the Eurasian plate.A transition fault is inferred in the region between the Hindu Kush and the Pamir which regulates the opposing directions of motion of the Indian and Eurasian plates.

Evaporated potassium chloride for double-sided interfacial passivation in inverted planar perovskite solar cells

Defect-induced charge carrier recombination at the interfaces between perovskite and adjacent charge transport layers restricts further improvements in the device performance of perovskite solar cells(PSCs).Defect passivation at these interfaces can reduce trap states and inhibit the induced nonradiative recombination.Herein,we report a double-sided interfacial passivation via simply evaporating potassium chloride(DIP-KCl)at both the hole transport layer(HTL)/perovskite and perovskite/electron transport layer(ETL)interfaces in inverted planar PSCs.We demonstrate that the bottom KCl layer at the HTL/perovskite interface not only reduces the interfacial defects and improves the interfacial contact,but also leads to increased perovskite crystallinity,while the top KCl layer at the perovskite/ETL interface efficiently passivates the perovskite top surface defects and facilitates electron extraction at this interface.Thus,suppressed nonradiative recombination and faster charge extraction at both interfaces close to the perovskite layer can be achieved by using our DIP-KCl strategy.As a result,inverted PSCs based on DIP-KCl present an increased efficiency from 17.1% to 19.2% and enhanced stability,retaining over 90% of their initial efficiency after aging at maximum power point tracking for 1000 h.This work provides a simple and efficient way for defect passivation to further increase the efficiency and stability of PSCs.

Effect of laser parameters on arc behavior of laser-TIG double-side welding for aluminum alloy

The influence of laser parameters on are beharior of laser-TIC, dauble-side welding was investigated by utilizing CCD sensor and intage processing methods. It was found that are images had an obvious transformation from laser preheating to laser plasma ejected from the keyhole bottom, resulting in the phenomena of arc column convergence and arc root constrictian. The attraction phenomenon of the laser and the arc is also found in laser-TIG double-side welding. More noteworthy is that the behavior of arc attraction or constriction became much obvious at a lower current or laser plasma ejected from the keyhole bottom. The decrease in arc voltage had a certain relation u＇ith the improvement of arc stabilio.