Photoresist grating was fabricated by holography, and it was used in the mask of ion etching. The groovy depth of the etched glass grating was 1.6μm. The glass waveguide was formed by K^+/Na^+ ion exchanging. The las...Photoresist grating was fabricated by holography, and it was used in the mask of ion etching. The groovy depth of the etched glass grating was 1.6μm. The glass waveguide was formed by K^+/Na^+ ion exchanging. The laser beam of 633nm was coupled in the waveguide by a prism at one end, then, it passed through the grating and came out of the waveguide at other end. In the experiment, the Bragg diffraction with several orders was observed. The first order Bragg diffraction had the highest efficiency of 90 percent.展开更多
The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-c...The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.展开更多
基金Academia Sinica and the Ministry of Posts and Telecommunications
文摘Photoresist grating was fabricated by holography, and it was used in the mask of ion etching. The groovy depth of the etched glass grating was 1.6μm. The glass waveguide was formed by K^+/Na^+ ion exchanging. The laser beam of 633nm was coupled in the waveguide by a prism at one end, then, it passed through the grating and came out of the waveguide at other end. In the experiment, the Bragg diffraction with several orders was observed. The first order Bragg diffraction had the highest efficiency of 90 percent.
文摘The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.
