A method of digitally high pass filtering in frequency domain is proposed to eliminate the background noise of the decoded image in Fresnel zone plate scanning holography. The high pass filter is designed as a circula...A method of digitally high pass filtering in frequency domain is proposed to eliminate the background noise of the decoded image in Fresnel zone plate scanning holography. The high pass filter is designed as a circular stop, which should be suitable to suppressing the background noise significantly and remain much low frequency information of the object. The principle of high pass filtering is that the Fourier transform of the decoded image is multiplied with the high pass filter. Thus the frequency spectrum of the decoded image without the background noise is achieved. By inverse Fourier transform of the spectrum of the decoded image after multiplying operation, the decoded image without the background noise is obtained. Both of the computer simulations and the experimental results show that the contrast and the signal-to-noise ratio of the decoded image are significantly improved with digital filtering.展开更多
In the paper, we report about the possibilities to apply the photon sieve principle to binary diffractive lens in millimeter wave band. The FDTD simulation showing the idea of the photon sieve application to millimete...In the paper, we report about the possibilities to apply the photon sieve principle to binary diffractive lens in millimeter wave band. The FDTD simulation showing the idea of the photon sieve application to millimeter wave optics does not allow increasing the resolution power. The reason is the small number of holes in the FZP aperture. But such simulation results may be used as computational experiments of simple scale in millimeter wave allowing obtaining insight into physical systems which are characterized by nanometric objects, because the D/f and D/λ are almost the same.展开更多
High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmos...High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm.展开更多
A novel diffractive optical element, named phase zone photon sieve （PZPS）, is presented. There are three kinds of phase plates in PZPSs： PZPS1, PZPS2, and PZPS3. Each of the PZPSs has its own structure and is made ...A novel diffractive optical element, named phase zone photon sieve （PZPS）, is presented. There are three kinds of phase plates in PZPSs： PZPS1, PZPS2, and PZPS3. Each of the PZPSs has its own structure and is made on quartz substrate by etching. The three PZPSs have stronger diffraction peak intensity than a photon sieve （PS） when the margin pinhole and zone line width are kept the same. The PZPS3 can produce a smaller central diffractive spot than the ordinary PS with the same number of zones on the Fresnel zone plate. We have given the design method for and the simulation of PZPS and PS. PZPS has potential applications in optical maskless lithography.展开更多
文摘A method of digitally high pass filtering in frequency domain is proposed to eliminate the background noise of the decoded image in Fresnel zone plate scanning holography. The high pass filter is designed as a circular stop, which should be suitable to suppressing the background noise significantly and remain much low frequency information of the object. The principle of high pass filtering is that the Fourier transform of the decoded image is multiplied with the high pass filter. Thus the frequency spectrum of the decoded image without the background noise is achieved. By inverse Fourier transform of the spectrum of the decoded image after multiplying operation, the decoded image without the background noise is obtained. Both of the computer simulations and the experimental results show that the contrast and the signal-to-noise ratio of the decoded image are significantly improved with digital filtering.
文摘In the paper, we report about the possibilities to apply the photon sieve principle to binary diffractive lens in millimeter wave band. The FDTD simulation showing the idea of the photon sieve application to millimeter wave optics does not allow increasing the resolution power. The reason is the small number of holes in the FZP aperture. But such simulation results may be used as computational experiments of simple scale in millimeter wave allowing obtaining insight into physical systems which are characterized by nanometric objects, because the D/f and D/λ are almost the same.
基金Project supported by the National Natural Science Foundation of China(Grant No.U1732104)China Postdoctoral Science Foundation(Grant No.2017M611443)Shanghai STCSM2019-11-20 Grant,China(Grant No.19142202700)。
文摘High resolution Fresnel zone plates for nanoscale three-dimensional imaging of materials by both soft and hard x-rays are increasingly needed by the broad applications in nanoscience and nanotechnology.When the outmost zone-width is shrinking down to 50 nm or even below,patterning the zone plates with high aspect ratio by electron beam lithography still remains a challenge because of the proximity effect.The uneven charge distribution in the exposed resist is still frequently observed even after standard proximity effect correction(PEC),because of the large variety in the line width.This work develops a new strategy,nicknamed as local proximity effect correction(LPEC),efficiently modifying the deposited energy over the whole zone plate on the top of proximity effect correction.By this way,50 nm zone plates with the aspect ratio from 4:1 up to 15:1 and the duty cycle close to 0.5 have been fabricated.Their imaging capability in soft(1.3 keV)and hard(9 keV)x-ray,respectively,has been demonstrated in Shanghai Synchrotron Radiation Facility(SSRF)with the resolution of 50 nm.The local proximity effect correction developed in this work should also be generally significant for the generation of zone plates with high resolutions beyond 50 nm.
基金Project supported by the National Key Basic Research Special Foundation of China (Grant No 2007CB935302)the National Natural Science Foundation of China (Grant No 60825403)
文摘A novel diffractive optical element, named phase zone photon sieve （PZPS）, is presented. There are three kinds of phase plates in PZPSs： PZPS1, PZPS2, and PZPS3. Each of the PZPSs has its own structure and is made on quartz substrate by etching. The three PZPSs have stronger diffraction peak intensity than a photon sieve （PS） when the margin pinhole and zone line width are kept the same. The PZPS3 can produce a smaller central diffractive spot than the ordinary PS with the same number of zones on the Fresnel zone plate. We have given the design method for and the simulation of PZPS and PS. PZPS has potential applications in optical maskless lithography.
