The purpose of this work relates to study on the characteristics of ultra thin gate oxide (2 5nm thickness) and the effect of metal Al,Zr,and Ta contamination on GOI.The controlled metallic contamination experiments...The purpose of this work relates to study on the characteristics of ultra thin gate oxide (2 5nm thickness) and the effect of metal Al,Zr,and Ta contamination on GOI.The controlled metallic contamination experiments are carried out by depositing a few ppm contaminated metal and low pH solutions on the wafers.The maximum metal surface concentration is controlled at about 10 12 cm -2 level in order to simulate metal contamination during ultra clean processing.A ramped current stress for intrinsic charge to breakdown measurements with gate injection mode is used to examine the characteristics of these ultra thin gate oxides and the effect of metal contamination on GOI.It is the first time to investigate the influence of metal Zr and Ta contamination on 2 5nm ultra thin gate oxide.It is demonstrated that there is little effect of Al contamination on GOI,while Zr contamination is the most detrimental to GOI,and early breakdown has happened to wafers contaminated by Ta.展开更多
A p-type low-temperature poly-Si thin film transistors（LTPS TFTs） integrated gate driver using 2 nonoverlapped clocks is proposed.This gate driver features charge-sharing structure to turn off buffer TFT and suppres...A p-type low-temperature poly-Si thin film transistors（LTPS TFTs） integrated gate driver using 2 nonoverlapped clocks is proposed.This gate driver features charge-sharing structure to turn off buffer TFT and suppresses voltage feed-through effects.It is analyzed that the conventional gate driver suffers from waveform distortions due to voltage uncertainty of internal nodes for the initial period.The proposed charge-sharing structure also helps to suppress the unexpected pulses during the initialization phases.The proposed gate driver shows a simple circuit,as only 6 TFTs and 1 capacitor are used for single-stage,and the buffer TFT is used for both pulling-down and pulling-up of output electrode.Feasibility of the proposed gate driver is proven through detailed analyses.Investigations show that voltage bootrapping can be maintained once the bootrapping capacitance is larger than0.8 pF,and pulse of gate driver outputs can be reduced to 5μs.The proposed gate driver can still function properly with positive V（TH）shift within 0.4 V and negative V（TH） shift within-1.2 V and it is robust and promising for high-resolution display.展开更多
文摘The purpose of this work relates to study on the characteristics of ultra thin gate oxide (2 5nm thickness) and the effect of metal Al,Zr,and Ta contamination on GOI.The controlled metallic contamination experiments are carried out by depositing a few ppm contaminated metal and low pH solutions on the wafers.The maximum metal surface concentration is controlled at about 10 12 cm -2 level in order to simulate metal contamination during ultra clean processing.A ramped current stress for intrinsic charge to breakdown measurements with gate injection mode is used to examine the characteristics of these ultra thin gate oxides and the effect of metal contamination on GOI.It is the first time to investigate the influence of metal Zr and Ta contamination on 2 5nm ultra thin gate oxide.It is demonstrated that there is little effect of Al contamination on GOI,while Zr contamination is the most detrimental to GOI,and early breakdown has happened to wafers contaminated by Ta.
基金Project supported by the Science and Technology Project of Hunan Province,China(No.2015JC3401)
文摘A p-type low-temperature poly-Si thin film transistors（LTPS TFTs） integrated gate driver using 2 nonoverlapped clocks is proposed.This gate driver features charge-sharing structure to turn off buffer TFT and suppresses voltage feed-through effects.It is analyzed that the conventional gate driver suffers from waveform distortions due to voltage uncertainty of internal nodes for the initial period.The proposed charge-sharing structure also helps to suppress the unexpected pulses during the initialization phases.The proposed gate driver shows a simple circuit,as only 6 TFTs and 1 capacitor are used for single-stage,and the buffer TFT is used for both pulling-down and pulling-up of output electrode.Feasibility of the proposed gate driver is proven through detailed analyses.Investigations show that voltage bootrapping can be maintained once the bootrapping capacitance is larger than0.8 pF,and pulse of gate driver outputs can be reduced to 5μs.The proposed gate driver can still function properly with positive V（TH）shift within 0.4 V and negative V（TH） shift within-1.2 V and it is robust and promising for high-resolution display.
