Chemical Mechanical Polishing of Glass Substrate with α-Alumina-g-Polystyrene Sulfonic Acid Composite Abrasive

Abrasive is the one of key influencing factors during chemical mechanical polishing（CMP） process. Currently, α-Alumina （α-Al2O3） particle, as a kind of abrasive, has been widely used in CMP slurries, but their high hardness and poor dispersion stability often lead to more surface defects. After being polished with composite particles, the surface defects of work pieces decrease obviously. So the composite particles as abrasives in slurry have been paid more attention. In order to reduce defect caused by pure α-Al2O3 abrasive, α-alumina-g-polystyrene sulfonic acid （α-Al2O3-g-PSS） composite abrasive was prepared by surface graft polymerization. The composition, structure and morphology of the product were characterized by Fourier transform infrared spectroscopy（FTIR）, X-ray photoelectron spectroscopy（XPS）, time-of-flight secondary ion mass spectroscopy（TOF-SIMS）, and scanning electron microscopy（SEM）, respectively. The results show that polystyrene sulfonic acid grafts onto α-Al2O3, and has well dispersibility. Then, the chemical mechanical polishing performances of the composite abrasive on glass substrate were investigated with a SPEEDFAM-16B-4M CMP machine. Atomic force microscopy（AFM） images indicate that the average roughness of the polished glass substrate surface can be decreased from 0.835 nm for pure α-Al2O3 abrasive to 0.583 nm for prepared α-Al2O3-g-PSS core-shell abrasive. The research provides a new and effect way to improve the surface qualities during CMP.

Thin Film of Mesoporous MCM-41 Grown on Indium-Tin-Oxide Glass Substrate

From a basic solution containing celyltrimethylammonium cations as the template, thin film of mesoporous MCM-41 has been grown on the surface of a pre-treated indium-tin-oxide conducting glass substrate. The channel axis of the film is oriented parallel with the surface plane of the substrate, and the film is stable after careful removal of template in vacuum.

In-situ growth of silver nanostructure on quartz glass substrates

Silver nanostructure compact aggregates on the surface of quartz glass substrates were synthesized by small gold seeds with the assistance of poly vinypyrrolidone (PVP) and irradiation of fluorescent lamp. The formation mechanism of silver nanostructure was proposed. The results show that both the PVP and the light irradiation are the keys to in-situ growth of silver nanostructure on quartz glass substrates. The silver nanostructure of the substrates which finally grow up to 150 nm after 20 h irradiation exhibits irregular shape, and some of nanoparticles stack to form bilayer. A new broad band appears in the absorption spectra of the substrates due to the interparticle dipole?dipole coupling of surface plasmon resonance response of the triangular silver nanoplate particles, which red shifts 600?800 nm as the particles grow up. The substrates have an emission band centered at 400 nm on their fluorescence spectra, and the fluorescence intensity shrinks as the average size of the silver nanostructure increases. The strongest SERS signal of SERS-active substrate is fabricated after 16 h.

Influencing Factors of Reheating Shrinkage Rate of Glass Substrate on LTPS Process

Different heating treatments with the variation of heating rates,holding temperatures and holding time were used to simulate the LTPS procedure.The experimental results show that the reheating shrinkage rates of glass substrates are rarely changed with increasing the heating rate,but strongly enhanced by raising the holding temperature and time,which shows that the reheating shrinkage of glass is closely related to heat treatment and structural relaxation.The production process of glass is critical to the reheating shrinkage of glass.

Study on the Long Term Sensing Properties of pCO_2 Sensitive Electrode

In this paper,the pCO_2 sensitive electrode was studied for continuous measurement.The solid electrolyte membrane and gas-permeable membrane were coated on the surface of the pH sensitive electrode which was fabricated based on the SnO_2/ITO glass substrate.According to the experimental results,the pCO_2 sensitive electrode shows the sensitivity of about 35 mV/decade in detection range between 0.1 mmol/L and 50 mmol/L.Moreover,the investigated sensing structure exhibits the convenient and pragmatic properties of the pCO_2 measurement.In summary,the advantages of the pCO_2 sensitive electrode are low-cost and disposable based on the separative structure.

Ultraviolet-shielding and conductive double functional films coated on glass substrates by sol-gel process

Ultraviolet-shielding and conductive double functional films were composed of CeO2-TiO2 film and SnO2:Sb film deposited on glass substrates using sol-gel process.Ce(NO3)3·6H2O and Ti(C4H9O4),SnCl4 and SbCl3 were used as precursors of the two different functional films respectively.The CeO2-TiO2 films were deposited on glass substrates by sol-gel dip coating method,and then the SnO2:Sb films with different thickness were deposited on the pre-coated CeO2-TiO2 thin film glass substrates,finally,the substrates coated with double functional films were annealed at different temperatures.The optical and electrical properties of the CeO2-TiO2 films and the double films were measured by UV-Vis spectrometer and four probe resistance measuring instrument.The crystal structures and surface morphology of the films were characterized using XRD and optical microscope,respectively.The obtained results show that the ultraviolet-shielding rate of the glass substrates with CeO2-TiO2 films is not less than 90%,and transmittance in visible lights can reach 65%.With the thickness of the SnO2:Sb film increasing,its conductivity became better,and the surface resistance is about 260 Ω/ when the SnO2:Sb films were deposited 11 cycles of the dip on the pre-coated CeO2-TiO2 glass.The ultraviolet-shielding rate of the glass substrates with double functional films is higher than 97%,and the peak transmittance in the visible lights is 72%.Additionally,with increasing the heat treatment time,the Na+ of the glass substrates diffuses into the films,resulting in the particle size of SnO2 crystal smaller.

Effect of ammonium molybdate concentration on chemical mechanical polishing of glass substrate

The effect of the ammonium molybdate concentration on the material removal rate（MRR） and surface quality in the preliminary chemical mechanical polishing（CMP） of a rough glass substrate was investigated using a silica-based slurry.Experimental results reveal that the ammonium molybdate concentration has a strong influence on the CMP behaviors of glass substrates.When the ammonium molybdate was added to the baseline slurry,polishing rates increased,and then decreased with a transition at 2 wt.%,and the root mean square（RMS） roughness decreased with increasing ammonium molybdate concentration up to 2 wt.%,after which it increased linearly up to 4 wt.%.The improvement in MRR and RMS roughness may be attributed to the complexation of hydrolysis products of the glass substrate with the ammonium molybdate so as to prevent their redeposition onto the substrate surface.It was found that there exists an optimal ammonium molybdate concentration at 2 wt.%for obtaining the highest MRR and the lowest RMS roughness within a particular polishing time.