Resonably good agreement among the photoluminescence,absorption,in-plane photocurrent and theoretical calculation demonstrates the effect of GaAs barrier width on the strain in In_(0.20)Ga_(0.80)As/GaAs single quantum...Resonably good agreement among the photoluminescence,absorption,in-plane photocurrent and theoretical calculation demonstrates the effect of GaAs barrier width on the strain in In_(0.20)Ga_(0.80)As/GaAs single quantum wells.The strain of each sample has been deduced.展开更多
The In segregation and its suppression in InGaAs/AlGaAs quantum well are investigated by using high-resolution x-ray diffraction(XRD)and photoluminescence(PL),combined with the state-of-the-art aberration corrected sc...The In segregation and its suppression in InGaAs/AlGaAs quantum well are investigated by using high-resolution x-ray diffraction(XRD)and photoluminescence(PL),combined with the state-of-the-art aberration corrected scanning transmission electron microscopy(Cs-STEM)techniques.To facility our study,we grow two multiple quantum wells(MQWs)samples,which are almost identical except that in sample B a thin GaAs layer is inserted in each of the InGaAs well and AlGaAs barrier layer comparing to pristine InGaAs/AlGaAs MQWs(sample A).Our study indeed shows the direct evidences that In segregation occurs in the InGaAs/AlGaAs interface,and the effect of the Ga As insertion layer on suppressing the segregation of In atoms is also demonstrated on the atomic-scale.Therefore,the atomic-scale insights are provided to understand the segregation behavior of In atoms and to unravel the underlying mechanism of the effect of GaAs insertion layer on the improvement of crystallinity,interface roughness,and further an enhanced optical performance of InGaAs/AlGaAs QWs.展开更多
Self-assembled In 0.35Ga 0.65As/GaAs quantum dots with low indium content are grown under different growth temperature and investigated using contact atomic force microscopy(AFM).In order to obtain high density ...Self-assembled In 0.35Ga 0.65As/GaAs quantum dots with low indium content are grown under different growth temperature and investigated using contact atomic force microscopy(AFM).In order to obtain high density and high uniformity of quantum dots,optimized conditions are concluded for MBE growth.Optimized growth conditions also compared with these of InAs/GaAs quantum dots.This will be very useful for InGaAs/GaAs QDs optoelectronic applications,such as quantum dots lasers and quantum dots infrared photodetectors.展开更多
The resonant excitation is used to generate photo-excited carriers in quantum wells to observe the process of the carriers transportation by comparing the photoluminescence results between quantum wells with and witho...The resonant excitation is used to generate photo-excited carriers in quantum wells to observe the process of the carriers transportation by comparing the photoluminescence results between quantum wells with and without a p-n junction. It is observed directly in experiment that most of the photo-excited carriers in quantum wells with a p-n junction escape from quantum wells and form photoeurrent rather than relax to the ground state of the quantum wells. The photo absorption coei^cient of multiple quantum wells is also enhanced by a p-n junction. The results pave a novel way for solar cells and photodetectors making use of low-dimensional structure.展开更多
Strained InGaAs/GaAs quantum well (QW) was grown by low-pressuremetallorganic chemical vapor deposition (MOCVD). Growth interruption and strain buffer layer wereintroduced to improve the photoluminescence (PL) perform...Strained InGaAs/GaAs quantum well (QW) was grown by low-pressuremetallorganic chemical vapor deposition (MOCVD). Growth interruption and strain buffer layer wereintroduced to improve the photoluminescence (PL) performance of the InGaAs/GaAs quantum well. GoodPL results were obtained under condition of growth an interruption of 10 s combined with a moderatestrain buffer layer. Wavelength lasers of 1064 nm using the QW were grown and processed intodevices. Broad area lasers (100 μm x 500 μm) show very low threshold current densities (43 A/cm^2)and high slop efficiency (0.34 W/A, per facet).展开更多
We study the controlling of the Goos-Hanchen （GH） shifts in reflected and transmitted light beams in the triple coupled InGaAs/GaAs quantum dot （QD） nanostructures with electron tunneling and incoherent pumping fi...We study the controlling of the Goos-Hanchen （GH） shifts in reflected and transmitted light beams in the triple coupled InGaAs/GaAs quantum dot （QD） nanostructures with electron tunneling and incoherent pumping field. It is shown that the lateral shift can become either large negative or large positive, which can be controlled by the electron tunneling and the rate of incoherent pump field in different incident angles. It is also demonstrated that the properties of the OH shifts are strongly dependent on the probe absorption beam of the intracavity medium due to the switching from superluminal light propagation to subluminal behavior or vice versa. Our suggested system can be considered as a new theoretical method for developing a new nano-optoelectronic sensor.展开更多
用 PL谱测试研究了 Ga As和不同 In组份 Inx Ga1 - x As(x=0 .1,0 .2 ,0 .3)覆盖层对分子束外延生长的 In As/Ga As自组织量子点发光特性的影响 .用 Inx Ga1 - x As外延层覆盖 In As/ Ga As量子点 ,比用 Ga As做覆盖层其发光峰能量向低...用 PL谱测试研究了 Ga As和不同 In组份 Inx Ga1 - x As(x=0 .1,0 .2 ,0 .3)覆盖层对分子束外延生长的 In As/Ga As自组织量子点发光特性的影响 .用 Inx Ga1 - x As外延层覆盖 In As/ Ga As量子点 ,比用 Ga As做覆盖层其发光峰能量向低能端移动 ,发光峰半高宽变窄 ,量子点发光峰能量随温度的红移幅度变小 .理论计算证实这是由于覆盖层 Inx Ga1 - x As减小了 In As表面应力导致发光峰红移 ,而 In元素有效抑制了 In As/ Ga As界面组份的混杂 ,量子点的均匀性得到改善 ,PL 谱半高宽变窄 .用 In Ga As覆盖的 In0 .5 Ga0 .5 As/ Ga As自组织量子点实现了 1.3μm发光 ,室温下 PL谱半高宽为 19.2 me V。展开更多
文摘Resonably good agreement among the photoluminescence,absorption,in-plane photocurrent and theoretical calculation demonstrates the effect of GaAs barrier width on the strain in In_(0.20)Ga_(0.80)As/GaAs single quantum wells.The strain of each sample has been deduced.
基金X.H.gratefully acknowledges the financial support from the National Natural Science Foundation of China(Grant No.21902096)the Scientific Research Foundation of Shaanxi University of Science and Technology(Grant No.126061803)+1 种基金S.M.and B.X.thank the National Natural Science Foundation of China(Grant No.21972103)the Shanxi Provincial Key Innovative Research Team in Science and Technology(Grant No.201703D111026).
文摘The In segregation and its suppression in InGaAs/AlGaAs quantum well are investigated by using high-resolution x-ray diffraction(XRD)and photoluminescence(PL),combined with the state-of-the-art aberration corrected scanning transmission electron microscopy(Cs-STEM)techniques.To facility our study,we grow two multiple quantum wells(MQWs)samples,which are almost identical except that in sample B a thin GaAs layer is inserted in each of the InGaAs well and AlGaAs barrier layer comparing to pristine InGaAs/AlGaAs MQWs(sample A).Our study indeed shows the direct evidences that In segregation occurs in the InGaAs/AlGaAs interface,and the effect of the Ga As insertion layer on suppressing the segregation of In atoms is also demonstrated on the atomic-scale.Therefore,the atomic-scale insights are provided to understand the segregation behavior of In atoms and to unravel the underlying mechanism of the effect of GaAs insertion layer on the improvement of crystallinity,interface roughness,and further an enhanced optical performance of InGaAs/AlGaAs QWs.
文摘Self-assembled In 0.35Ga 0.65As/GaAs quantum dots with low indium content are grown under different growth temperature and investigated using contact atomic force microscopy(AFM).In order to obtain high density and high uniformity of quantum dots,optimized conditions are concluded for MBE growth.Optimized growth conditions also compared with these of InAs/GaAs quantum dots.This will be very useful for InGaAs/GaAs QDs optoelectronic applications,such as quantum dots lasers and quantum dots infrared photodetectors.
基金Supported by the National Natural Science Foundation of China under Grant Nos 11574362,61210014,and 11374340the Innovative Clean-Energy Research and Application Program of Beijing Municipal Science and Technology Commission under Grant No Z151100003515001
文摘The resonant excitation is used to generate photo-excited carriers in quantum wells to observe the process of the carriers transportation by comparing the photoluminescence results between quantum wells with and without a p-n junction. It is observed directly in experiment that most of the photo-excited carriers in quantum wells with a p-n junction escape from quantum wells and form photoeurrent rather than relax to the ground state of the quantum wells. The photo absorption coei^cient of multiple quantum wells is also enhanced by a p-n junction. The results pave a novel way for solar cells and photodetectors making use of low-dimensional structure.
文摘Strained InGaAs/GaAs quantum well (QW) was grown by low-pressuremetallorganic chemical vapor deposition (MOCVD). Growth interruption and strain buffer layer wereintroduced to improve the photoluminescence (PL) performance of the InGaAs/GaAs quantum well. GoodPL results were obtained under condition of growth an interruption of 10 s combined with a moderatestrain buffer layer. Wavelength lasers of 1064 nm using the QW were grown and processed intodevices. Broad area lasers (100 μm x 500 μm) show very low threshold current densities (43 A/cm^2)and high slop efficiency (0.34 W/A, per facet).
文摘We study the controlling of the Goos-Hanchen （GH） shifts in reflected and transmitted light beams in the triple coupled InGaAs/GaAs quantum dot （QD） nanostructures with electron tunneling and incoherent pumping field. It is shown that the lateral shift can become either large negative or large positive, which can be controlled by the electron tunneling and the rate of incoherent pump field in different incident angles. It is also demonstrated that the properties of the OH shifts are strongly dependent on the probe absorption beam of the intracavity medium due to the switching from superluminal light propagation to subluminal behavior or vice versa. Our suggested system can be considered as a new theoretical method for developing a new nano-optoelectronic sensor.
文摘用 PL谱测试研究了 Ga As和不同 In组份 Inx Ga1 - x As(x=0 .1,0 .2 ,0 .3)覆盖层对分子束外延生长的 In As/Ga As自组织量子点发光特性的影响 .用 Inx Ga1 - x As外延层覆盖 In As/ Ga As量子点 ,比用 Ga As做覆盖层其发光峰能量向低能端移动 ,发光峰半高宽变窄 ,量子点发光峰能量随温度的红移幅度变小 .理论计算证实这是由于覆盖层 Inx Ga1 - x As减小了 In As表面应力导致发光峰红移 ,而 In元素有效抑制了 In As/ Ga As界面组份的混杂 ,量子点的均匀性得到改善 ,PL 谱半高宽变窄 .用 In Ga As覆盖的 In0 .5 Ga0 .5 As/ Ga As自组织量子点实现了 1.3μm发光 ,室温下 PL谱半高宽为 19.2 me V。
