InGaN/GaN量子阱悬空微盘发光二极管

设计并制备了三种不同结构的电泵浦InGaN/GaN量子阱微盘发光器件,对其光增益和光损耗进行了分析和优化。以p型层的结构为分类标准,器件Ⅰ为圆柱形;器件Ⅱ为器件Ⅰ的悬空结构;器件Ⅲ是悬空的圆环形结构。实验和仿真结果表明,三种器件结构中,器件Ⅱ的结果最好。电极布局为内p外n型的圆柱形器件表面电流分布能够保证发光区和微腔高增益区重合,悬空结构能够降低微盘在垂直方向上的光损耗,有利于更好的光学增益。考虑到共振模式,器件Ⅱ在注入电流大于0.7 mA时,器件Ⅱ实现了峰值波长为408.2 nm、半峰宽为2.62 nm的振荡模式输出。这种电泵浦InGaN/GaN量子阱悬浮微盘二极管器件的设计思路对电泵浦微盘或微环激光器的研制具有重要参考意义。

硅基InGaN/GaN多量子阱微盘器件的发光、探测和数据传输

光源和探测器的集成可有效促进轻量化和小型化光电系统的发展,InGaN/GaN多量子阱器件中发光与探测共存现象为收发一体芯片的设计提供了可能。本文采用标准半导体工艺制备了硅片上集成的圆盘形InGaN/GaN多量子阱阵列器件,并对其发光、探测以及基本通信特性进行了研究。微盘型器件中的共振模式有助于提升其探测特性,同时各向同性的辐射特性有助于器件作为光源时与探测器在空间上的耦合。作为光源,该器件的开启电压为2.5 V,中心波长455 nm,-3 dB带宽为5.4 MHz。作为探测器,该器件对紫外到蓝光波段的光有响应,探测性能随波长增加而减弱,截止波长450 nm。在365 nm光源激发下,该器件具有最高开关比7.2×10^(4),下降沿时间为0.41 ms。同时,基于单个微盘器件,本文构建并演示了半双工通信系统,在不同频段实现数据传输。这项研究对于电驱动光源制备以及收发一体的光通信具有重要意义。

AlGaN双势垒结构对高In组分InGaN/GaN MQWs太阳能电池材料晶体质量和发光性能的影响

本文利用金属有机化合物化学气相沉积(MOCVD)技术在(001)面图形化蓝宝石衬底(PSS)上生长了一种含有AlGaN-InGaN/GaN MQWs(multiple quantum wells)-AlGaN双势垒结构的高In组分太阳能电池外延材料。高分辨率X射线衍射(HRXRD)和光致发光(PL)谱分析表明,与含有AlGaN电子阻挡层的低In组分的量子阱结构太阳能电池外延材料相比,该结构材料具有较小的半峰全宽(FWHM),计算表明:此结构材料的位错密度降低了一个数量级,达到10^(7)cm^(-2);同时,有源区中的应变弛豫降低了51%;此外,此结构材料的发光强度增强了35%。研究结果表明含有AlGaN双势垒结构的外延材料可以减小有源区的位错密度,降低非辐射复合中心的数目,增大有源区有效光生载流子的数目,为制备高质量太阳能电池提供实验依据。

Electrical properties and structural optimization of GaN/InGaN/GaN tunnel junctions grown by molecular beam epitaxy

The InGaN films and GaN/InGaN/GaN tunnel junctions(TJs)were grown on GaN templates with plasma-assisted molecular beam epitaxy.As the In content increases,the quality of InGaN films grown on GaN templates decreases and the surface roughness of the samples increases.V-pits and trench defects were not found in the AFM images.p++-GaN/InGaN/n++-GaN TJs were investigated for various In content,InGaN thicknesses and doping concentration in the InGaN insert layer.The InGaN insert layer can promote good interband tunneling in GaN/InGaN/GaN TJ and significantly reduce operating voltage when doping is sufficiently high.The current density increases with increasing In content for the 3 nm InGaN insert layer,which is achieved by reducing the depletion zone width and the height of the potential barrier.At a forward current density of 500 A/cm^(2),the measured voltage was 4.31 V and the differential resistance was measured to be 3.75×10^(−3)Ω·cm^(2)for the device with a 3 nm p++-In_(0.35)Ga_(0.65)N insert layer.When the thickness of the In_(0.35)Ga_(0.65)N layer is closer to the“balanced”thickness,the TJ current density is higher.If the thickness is too high or too low,the width of the depletion zone will increase and the current density will decrease.The undoped InGaN layer has a better performance than n-type doping in the TJ.Polarization-engineered tunnel junctions can enhance the functionality and performance of electronic and optoelectronic devices.

MOCVD生长InGaN/GaN MQW紫光LED

利用LP MOCVD系统生长了InGaN/GaNMQW紫光LED外延片 ,双晶X射线衍射测试获得了 2级卫星峰 ,室温光致发光谱的峰值波长为 399 5nm ,FWHM为 15 5nm ,波长均匀性良好。制成的LED管芯 ,正向电流2 0mA时 ,工作电压在 4V以下。

采用AlGaN/GaN阻挡层的大功率InGaN/GaN MQWs蓝光LED

大功率InGaN/GaN多量子阱蓝光发光二极管在大注入电流下,载流子泄漏而引起的效率下降问题是目前限制大功率发光二极管光电特性及其应用的突出问题。本文通过在p型GaN和InGaN/GaN多量子阱(MQW)有源区之间插入p型AlGaN/GaN多量子势垒(MQB)电子阻挡层,利用多量子势垒对电子的量子反射作用,有效地解决了大注入下载流子泄漏问题。与未使用多量子势垒电子阻挡层的样品相比,MQB样品的光功率和外量子效率分别提高了约80%和100%。

Application of nano-patterned InGaN fabricated by selfassembled Ni nano-masks in green InGaN/GaN multiple quantum wells

The nano-patterned InGaN film was used in green InGaN/GaN multiple quantum wells(MQWs)structure,to relieve the unpleasantly existing mismatch between high indium content InGaN and GaN,as well as to enhance the light output.The different self-assembled nano-masks were formed on InGaN by annealing thin Ni layers of different thicknesses.Whereafter,the InGaN films were etched into nano-patterned films.Compared with the green MQWs structure grown on untreated InGaN film,which on nano-patterned InGaN had better luminous performance.Among them the MQWs performed best when 3 nm thick Ni film was used as mask,because that optimally balanced the effects of nano-patterned InGaN on the crystal quality and the light output.

Green Vertical‑Cavity Surface‑Emitting Lasers Based on InGaN Quantum Dots and Short Cavity

Room temperature low threshold lasing of green GaNbased vertical cavity surface emitting laser(VCSEL)was demonstrated under continuous wave(CW)operation.By using self-formed InGaN quantum dots(QDs)as the active region,the VCSEL emitting at 524.0 nm has a threshold current density of 51.97 A cm^(-2),the lowest ever reported.The QD epitaxial wafer featured with a high IQE of 69.94%and theδ-function-like density of states plays an important role in achieving low threshold current.Besides,a short cavity of the device(~4.0λ)is vital to enhance the spontaneous emission coupling factor to 0.094,increase the gain coefficient factor,and decrease the optical loss.To improve heat dissipation,AlN layer was used as the current confinement layer and electroplated copper plate was used to replace metal bonding.The results provide important guidance to achieving high performance GaN-based VCSELs.

Bottom-up approaches to microLEDs emitting red, green and blue light based on GaN nanowires and relaxed InGaN platelets

Miniaturization of light-emitting diodes(LEDs) with sizes down to a few micrometers has become a hot topic in both academia and industry due to their attractive applications on self-emissive displays for high-definition televisions,augmented/mixed realities and head-up displays, and also on optogenetics, high-speed light communication, etc. The conventional top-down technology uses dry etching to define the LED size, leading to damage to the LED side walls.Since sizes of microLEDs approach the carrier diffusion length, the damaged side walls play an important role, reducing microLED performance significantly from that of large area LEDs. In this paper, we review our efforts on realization of microLEDs by direct bottom-up growth, based on selective area metal–organic vapor phase epitaxy. The individual LEDs based on either GaN nanowires or InGaN platelets are smaller than 1 μm in our approach. Such nano-LEDs can be used as building blocks in arrays to assemble microLEDs with different sizes, avoiding the side wall damage by dry etching encountered for the top-down approach. The technology of InGaN platelets is especially interesting since InGaN quantum wells emitting red, green and blue light can be grown on such platelets with a low-level of strain by changing the indium content in the InGaN platelets. This technology is therefore very attractive for highly efficient microLEDs of three primary colors for displays.

Effects of growth interruption on the properties of InGaN/GaN MQWs grown by MOCVD

InGaN/GaN MQWs structures were grown by MOCVD. The effects of the growth interruption time on the optical and structural properties of InGaN/GaN MQWs were investigated. The experimental results show that the growth interruption can improve the interface quality, increase the intensity of photoluminescence (PL) and electroluminescence (EL); but if the interruption time was too long, the well thickness and the average In composition of MQWs decreased, and the EL intensity also decreased due to poor interface quality and impurities derived from growth interruption.

Efficiency Droop Effect Mechanism in an InGaN/GaN Blue MQW LED

In order to clarify the origin of the efficiency droop effect in InGaN based blue multiple-quantum-well(MQW)light emitting diodes(LEDs),a reasonable model is set up,taking all the possible factor(carrier delocalization,carrier leakage and Auger recombination)into account.By fitting the external quantum efficiency-injection current(η–Ⅰ)measurements of two LED samples,the validity of the model is demonstrated.The fit results show that the main origin of efficiency droop at a high injection current is carrier leakage.Furthermore it is also indicated that carrier delocalization plays an important role in the efficiency droop effect in those LEDs of large localization degree.

通过诱导载流子的V坑传输提升GaN基绿光LED的空穴注入效率

为了提升GaN基多量子阱LED的空穴注入效率,设计了具有不同最后势垒层结构的GaN基多量子阱外延结构,并将其制备为绿光mini-LED发光芯片,利用低温电致发光光谱、电流电压特性测试对其载流子传输机制进行了研究。结果表明,在采用AlGaN或GaN/AlN最后势垒层的样品中,有更多载流子可以传输到深层量子阱,空穴注入效率获得提升。本文对这一现象中的载流子运输机制以及V坑缺陷在其中所起的作用进行了研究,发现这种提升主要来自空穴V坑注入比例的增大。实验还发现,过大的V坑注入比例也会造成非辐射复合率上升,从而抑制了AlGaN最后势垒层样品的电光转换效率。

Carrier transport via V-shaped pits in InGaN/GaN MQW solar cells

Carrier transport via the V-shaped pits （V-pits） in InGaN/GaN multiple-quantum-well （MQW） solar cells is numer- ically investigated. By simulations, it is found that the V-pits can act as effective escape paths for the photo-generated carriers. Due to the thin barrier thickness and low indium composition of the MQW on V-pit sidewall, the carriers entered the sidewall QWs can easily escape and contribute to the photocurrent. This forms a parallel escape route for the carries generated in the fiat quantum wells. As the barrier thickness of the fiat MQW increases, more carriers would transport via the V-pits. Furthermore, it is found that the V-pits may reduce the recombination losses of carriers due to their screening effect to the dislocations. These discoveries are not only helpful for understanding the carrier transport mechanism in the InGaN/GaN MQW, but also important in design of the structure of solar cells.

Photoluminescence of green InGaN/GaN MQWs grown on pre-wells

Photoluminescence(PL)characteristics of the structure consisting of green InGaN/GaN multiple quantum wells(MQWs)and low indium content InGaN/GaN pre-wells are investigated.Several PL peaks from pre-wells and green InGaN/GaN MQWs are observed.The peak energy values for both pre-wells and green InGaN/GaN MQWs display an S-shaped variation with temperature.In addition,the differences in the carrier localization effect,defect density,and phonon-exciton interaction between the pre-wells and green InGaN/GaN MQWs,and the internal quantum efficiency of the sample are studied.The obtained results elucidate the mechanism of the luminescence characteristics of the sample and demonstrate the significant stress blocking effect of pre-wells.

抛物线型衬底InGaN/GaN发光二极管的模拟研究

针对发射到衬底中的光子,提出了一种具有抛物线型衬底结构的InGaN/GaN发光二极管,并对平面衬底和抛物线型衬底InGaN/GaN发光二极管的光子运动轨迹、发射功率角度分布和外量子效率进行了模拟计算.结果表明相对于平面衬底发光二极管,抛物线型衬底发光二极管可以充分利用发射到衬底中的光子,使其正向光子发射功率增加12.6倍,外量子效率提高1.22倍,同时具有发射准平行光的功能.

MOVPE生长的InGaN/GaN单量子阱的光致发光和光吸收特性(英文)

研究了用金属有机物气相外延(MOVPE)法在蓝宝石衬底上生长的In组分浓度保持不变的InGaN/GaN单量子阱结构在室温下的发光特性和光吸收特性。实验结果表明,在InGaN厚度<3 nm时,随着样品InGaN势阱层宽度的增加(1 nm),光致发光(PL)谱的发光峰值波长出现明显的红移33 nm现象,而且发光强度下降8%,谱线半峰全宽(FWHM)展宽,通过对样品的透射、反射光谱研究发现,量子阱层窄(1.5 nm)的样品在波长接近红外区时出现无吸收的现象,即R+T达到了100%,而在阱层较宽的样品中没有发现这一现象,对引起这些现象的原因进行了讨论。这些结果有助于开发和优化三族氮化物半导体光电器件的进一步研究工作。

生长温度对InGaN/GaN多量子阱LED光学特性的影响

利用低压MOCVD系统,在蓝宝石衬底上外延生长了InGaN/GaN多量子阱蓝紫光LED结构材料。研究了生长温度对有源层InGaN/GaN多量子阱的合金组分、结晶品质及其发光特性的影响。结果表明当生长温度从730℃升到800℃时,LED的光致发光波长从490 nm移到380 nm,室温下PL谱发光峰的半高全宽从133 meV降到73 meV,表明了量子阱结晶性的提高。高温生长时,PL谱中还观察到了GaN的蓝带发光峰,说明量子阱对载流子的限制作用有所减弱。研究表明,通过改变生长温度可以对LED发光波长及有源层InGaN的晶体质量实现良好的控制。

具有超晶格应力调制结构的绿光InGaN/GaN多量子阱的发光特性

研究了具有InGaN/GaN超晶格(SL)插入结构的绿光InGaN/GaN多量子阱(MQW)的发光特性。结构测试表明,SL插入结构并没有引起MQW中平均In组份的增加,而是改变了In组份的分布,形成了高In组份的量子点和低In组份量子阱。其电致发光(EL)谱和光致发光(PL)谱均出现了双发光峰。我们认为这两个峰分别来自于量子点和量子阱,且存在着载流子从阱向点转移的输运机制。最后变温PL积分强度的Arrhenius拟合表明,SL插入结构并没有在MQW中引入新的缺陷,使其发光效率下降。

GaN基外延膜的激光剥离和InGaNLD外延膜的解理

利用波长为 2 4 8nm的KrF准分子激光器进行了蓝宝石衬底GaN外延层剥离。对极薄的MOCVD生长的单层GaN外延膜 (3μm)和InGaNLD外延膜 (5 μm)实现了大面积剥离。对剥离蓝宝石衬底背面抛光和未抛光外延片的不同特点作了比较 ,激光剥离所需的能量密度阈值分别约为 2 0 0mJ/cm2 和 30 0mJ/cm2 ,优化结果表明 ,能量密度分别在 4 0 0mJ/cm2 和 6 0 0mJ/cm2 可实现稳定的剥离。同时对剥离后的InGaN多量子阱LD结构薄膜进行了解理 ,SEM观察显示获得的InGaNLD腔面平整光滑。

InGaN/GaN多量子阱热退火的拉曼光谱和荧光光谱

通过拉曼光谱及荧光光谱测量研究了采用低压金属有机化学沉积(MOCVD)方法生长的InGaNGaN多量子阱高温快速热退火处理对量子阱光学性质的影响。观测到退火后InGaNGaN量子阱的拉曼光谱E2,A1(LO)模式的峰位置出现了红移,而且该振动峰的半高宽也有微小变化。温度升高退火效果更明显。退火使量子阱内应力部分消除,同时In,Ga原子扩散出现相分离使拉曼谱表现出变化。在常温和低温下的光荧光谱表明,退火处理的量子阱发光主峰都出现了红移;而且低温退火出现红移,退火温度升高相对低温退火出现蓝移;同时在低温荧光光谱里看到经过退火处理后原发光峰中主峰旁边弱的峰消失了。讨论了退火对多量子阱光学性质的影响。