InAsSb alloys are grown on n-（100） GaSb （Te-doped） and GaAs substrates by the MOCVD using TMIn, TMSb,and AsH3 sources. The influence of growth parameters such as temperature, Ⅴ/Ⅲ ratio,and buffer layer on the su...InAsSb alloys are grown on n-（100） GaSb （Te-doped） and GaAs substrates by the MOCVD using TMIn, TMSb,and AsH3 sources. The influence of growth parameters such as temperature, Ⅴ/Ⅲ ratio,and buffer layer on the surface morphology and solid composition is studied. The surface morphology is observed by AFM and SEM. The As and Sb concentrations in the solid are characterized by electron microprobe analysis. The crystalline quality of the InAsSb epilayer is characterized by double-crystal X-ray rocking curve diffraction. The electrical properties are observed by the （Van der Pauw） Hall technique at room temperature. An InAsSb epitaxy layer with mirror-like surface and lattice mismatch of 0.4% is obtained.展开更多
文摘InAsSb alloys are grown on n-（100） GaSb （Te-doped） and GaAs substrates by the MOCVD using TMIn, TMSb,and AsH3 sources. The influence of growth parameters such as temperature, Ⅴ/Ⅲ ratio,and buffer layer on the surface morphology and solid composition is studied. The surface morphology is observed by AFM and SEM. The As and Sb concentrations in the solid are characterized by electron microprobe analysis. The crystalline quality of the InAsSb epilayer is characterized by double-crystal X-ray rocking curve diffraction. The electrical properties are observed by the （Van der Pauw） Hall technique at room temperature. An InAsSb epitaxy layer with mirror-like surface and lattice mismatch of 0.4% is obtained.
