The description and function characterization of a flange-on type low energy electron mi- croscope are given. In this microscope a magnetic beam separator with 10° deflection angle is used in order to facilitate ...The description and function characterization of a flange-on type low energy electron mi- croscope are given. In this microscope a magnetic beam separator with 10° deflection angle is used in order to facilitate compacting the instrument on a single 10 in. flange. Mean- while some correcting elements in the electron optical system are simplified to reduce the complexities of construction and operation. The sample is set close to ground potential, so that all the electrostatic lenses are easily to float at high voltages. The performance of the microscope in typical low energy electron microscopy, low energy electron diffraction and photoemission electron microscopy modes is demonstrated through several experiments. A lateral resolution of 51 nm is estimated for low energy electron microscopy imaging. With femtosecond laser as light source, the consequent nonlinear photoemission makes this micro-scope also suitable for the observation of optical near field phenomena and a lateral resolution of 110 nm is obtained.展开更多
The orientation control of graphene overlayers on metal surface is an important issue which remains as a challenge in graphene growth on Ni surface. Here we have demonstrated that epitaxial graphene overlayers can be ...The orientation control of graphene overlayers on metal surface is an important issue which remains as a challenge in graphene growth on Ni surface. Here we have demonstrated that epitaxial graphene overlayers can be obtained by annealing a nickel carbide covered Ni(111)surface using in situ surface imaging techniques. Epitaxial graphene islands nucleate and grow via segregation of dissolved carbon atoms to the top surface at about 400 °C.This is in contrast to a mixture of epitaxial and non-epitaxial graphene domains grown directly on Ni(111) at540 °C. The different growth behaviors are related to the nucleation dynamics which is controlled by local carbon densities in the near surface region.展开更多
Heteroepitaxial growth is a process of profound fundamental importance as well as an avenue to realize nanostructures such as Ge/Si quantum dots(QDs),with appealing properties for applications in opto-and nanoelectron...Heteroepitaxial growth is a process of profound fundamental importance as well as an avenue to realize nanostructures such as Ge/Si quantum dots(QDs),with appealing properties for applications in opto-and nanoelectronics.However,controlling the Ge/Si QD size,shape,and composition remains a major obstacle to their practical implementation.Here,Ge nanostructures on Si(111)were investigated in situ and in real-time by low energy electron microscopy(LEEM),enabling the observation of the transition from wetting layer formation to 3D island growth and decay.The island size,shape,and distribution depend strongly on the growth temperature.As the deposition temperature increases,the islands become larger and sparser,consistent with Brownian nucleation and capture dynamics.At 550◦C,two distinct Ge/Si nanostructures are formed with bright and dark appearances that correspond to flat,atoll-like and tall,faceted islands,respectively.During annealing,the faceted islands increase in size at the expense of the flat ones,indicating that the faceted islands are thermodynamically more stable.In contrast,triangular islands with uniform morphology are obtained from deposition at 600◦C,suggesting that the growth more closely follows the ideal shape.During annealing,the islands formed at 600◦C initially show no change in morphology and size and then rupture simultaneously,signaling a homogeneous chemical potential of the islands.These observations reveal the role of dynamics and energetics in the evolution of Ge/Si QDs,which can serve as a step towards the precise control over the Ge nanostructure size,shape,composition,and distribution on Si(111).展开更多
文摘The description and function characterization of a flange-on type low energy electron mi- croscope are given. In this microscope a magnetic beam separator with 10° deflection angle is used in order to facilitate compacting the instrument on a single 10 in. flange. Mean- while some correcting elements in the electron optical system are simplified to reduce the complexities of construction and operation. The sample is set close to ground potential, so that all the electrostatic lenses are easily to float at high voltages. The performance of the microscope in typical low energy electron microscopy, low energy electron diffraction and photoemission electron microscopy modes is demonstrated through several experiments. A lateral resolution of 51 nm is estimated for low energy electron microscopy imaging. With femtosecond laser as light source, the consequent nonlinear photoemission makes this micro-scope also suitable for the observation of optical near field phenomena and a lateral resolution of 110 nm is obtained.
基金supported by the National Natural Science Foundation of China(21373208,91545204,and 21321002)the National Basic Research Program of China(2016YFA0200200,2013CB834603,and 2013CB933100)the Strategic Priority Research Program of the Chinese Academy of Sciences(XDB17020200)
文摘The orientation control of graphene overlayers on metal surface is an important issue which remains as a challenge in graphene growth on Ni surface. Here we have demonstrated that epitaxial graphene overlayers can be obtained by annealing a nickel carbide covered Ni(111)surface using in situ surface imaging techniques. Epitaxial graphene islands nucleate and grow via segregation of dissolved carbon atoms to the top surface at about 400 °C.This is in contrast to a mixture of epitaxial and non-epitaxial graphene domains grown directly on Ni(111) at540 °C. The different growth behaviors are related to the nucleation dynamics which is controlled by local carbon densities in the near surface region.
基金Fonds de Recherche du Québec-Nature et TechnologiesCanada Research ChairNatural Sciences and Engineering Research Council of Canada Discovery。
文摘Heteroepitaxial growth is a process of profound fundamental importance as well as an avenue to realize nanostructures such as Ge/Si quantum dots(QDs),with appealing properties for applications in opto-and nanoelectronics.However,controlling the Ge/Si QD size,shape,and composition remains a major obstacle to their practical implementation.Here,Ge nanostructures on Si(111)were investigated in situ and in real-time by low energy electron microscopy(LEEM),enabling the observation of the transition from wetting layer formation to 3D island growth and decay.The island size,shape,and distribution depend strongly on the growth temperature.As the deposition temperature increases,the islands become larger and sparser,consistent with Brownian nucleation and capture dynamics.At 550◦C,two distinct Ge/Si nanostructures are formed with bright and dark appearances that correspond to flat,atoll-like and tall,faceted islands,respectively.During annealing,the faceted islands increase in size at the expense of the flat ones,indicating that the faceted islands are thermodynamically more stable.In contrast,triangular islands with uniform morphology are obtained from deposition at 600◦C,suggesting that the growth more closely follows the ideal shape.During annealing,the islands formed at 600◦C initially show no change in morphology and size and then rupture simultaneously,signaling a homogeneous chemical potential of the islands.These observations reveal the role of dynamics and energetics in the evolution of Ge/Si QDs,which can serve as a step towards the precise control over the Ge nanostructure size,shape,composition,and distribution on Si(111).