Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of t...Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of the coating is 40nm. The coatings withdroplet free can be readily obtained, so the surface is smooth. TEM observation shows that Mo and Sialternant deposition coating is compact structure. The fine Mo silicide grains densely distributedin the coating. The coating adherence on silicon is excellent.展开更多
By Ar+ sputtering onto Si wafers which were surrounded by Mo plates, uniform cones over a large area on the Si surface were formed. Scanning electron microscopic study showed that the cones were formed on the entire s...By Ar+ sputtering onto Si wafers which were surrounded by Mo plates, uniform cones over a large area on the Si surface were formed. Scanning electron microscopic study showed that the cones were formed on the entire surface of the Si wafer. The dimensions of the uniform cones were one micrometer in diameter and 5-6 micrometers high. They were further characterized by means of cross-sectional transmission electron microscopy, with the technique of micro-diffractions. It was found that the cone contained a pure Si regime and a Mo-rich regime. In the binary Mo-Si zone, we identified three distinct areas vertically: (1) domains of Mo-induced Si ordered structures, (2) a small volume of a new Mo3Si2 structural variant, intergrown with the Si ordered structure, and (3) a small amount of pure Mo nanoparticles covering the surface of the cones. The formation of the large and uniform cones may provide a new surface configuration for potential applications in surface science and technology.展开更多
The forming process of silicide coatings on pure Mo and Mo-base alloys, obtained by the gas- phase deposition method. has been studied by examining the microstructure of coatings and the relationship between coating t...The forming process of silicide coatings on pure Mo and Mo-base alloys, obtained by the gas- phase deposition method. has been studied by examining the microstructure of coatings and the relationship between coating thickness and process parameters. It was shown that the growth of coatings was diffusion-controlled, the diffusion of silicon to be coated into Mo or Mo-base alloys was mainly responsible for the formation of silicide. The relationship between initial silicide thickness and oxidation resistance was also investigated, and the equation of service life of the coatings at high temperature in air is presented.展开更多
基金This work was supported by 863 High Science & Technology Committee(2001AA38020) The National Natural Science Foundation of
文摘Mo silicides Mo_5Si_3 with high quality were prepared using ion beamdeposition equipment with two Filter Metal Vacuum Are Deposition (FMEVAD). When the number ofalternant deposition times was 198, total thickness of the coating is 40nm. The coatings withdroplet free can be readily obtained, so the surface is smooth. TEM observation shows that Mo and Sialternant deposition coating is compact structure. The fine Mo silicide grains densely distributedin the coating. The coating adherence on silicon is excellent.
文摘By Ar+ sputtering onto Si wafers which were surrounded by Mo plates, uniform cones over a large area on the Si surface were formed. Scanning electron microscopic study showed that the cones were formed on the entire surface of the Si wafer. The dimensions of the uniform cones were one micrometer in diameter and 5-6 micrometers high. They were further characterized by means of cross-sectional transmission electron microscopy, with the technique of micro-diffractions. It was found that the cone contained a pure Si regime and a Mo-rich regime. In the binary Mo-Si zone, we identified three distinct areas vertically: (1) domains of Mo-induced Si ordered structures, (2) a small volume of a new Mo3Si2 structural variant, intergrown with the Si ordered structure, and (3) a small amount of pure Mo nanoparticles covering the surface of the cones. The formation of the large and uniform cones may provide a new surface configuration for potential applications in surface science and technology.
文摘The forming process of silicide coatings on pure Mo and Mo-base alloys, obtained by the gas- phase deposition method. has been studied by examining the microstructure of coatings and the relationship between coating thickness and process parameters. It was shown that the growth of coatings was diffusion-controlled, the diffusion of silicon to be coated into Mo or Mo-base alloys was mainly responsible for the formation of silicide. The relationship between initial silicide thickness and oxidation resistance was also investigated, and the equation of service life of the coatings at high temperature in air is presented.
