Cobalt-molybdenum （Co-Mo） amorphous alloy thin films were deposited on copper substrates by the electrochemical method at pH 4.0. Among the experimental electrodeposition parameters,only the concentration ratio of m...Cobalt-molybdenum （Co-Mo） amorphous alloy thin films were deposited on copper substrates by the electrochemical method at pH 4.0. Among the experimental electrodeposition parameters,only the concentration ratio of molybdate to cobalt ions （[MoO4^2-]/[Co^2＋]） was varied to analyze its influence on the mechanism of induced cobalt-molybdenum codeposition. Voltammetry was one of the main techniques,which was used to examine the voltammetric response,revealing that cobalt-molybdenum codeposition depended on the nature of the species in solution. To correlate the type of the film to the electrochemical response,various cobalt-molybdenum alloy thin films obtained from different [MoO4^2-]/[Co^2＋] solutions were tested. Crack-free homogeneous films could be easily obtained from the low molybdate concentrations （[MoO4^2-]/[Co^2＋]≈0.05） applying low deposition potentials. Moreover,the content of molybdenum up to 30wt% could be obtained from high molybdate concentration; in this case,the films showed cracks. The formation of these cracked films could be predicted from the observed distortions in the curves of electric current-time （j-t） deposition transients. The films with amorphous structure were obtained. The hysteresis loops suggested that the easily magnetized axis was parallel to the surface of the films. A saturation magnetization of 137 emu·g^-1 and a coercivity of 87 Oe of the film were obtained when the deposition potential was -1025mV,and [ MoO4^2-]/[Co^2＋] was 0.05 in solution,which exhibited a nicer soft-magnetic response.展开更多
文摘Cobalt-molybdenum （Co-Mo） amorphous alloy thin films were deposited on copper substrates by the electrochemical method at pH 4.0. Among the experimental electrodeposition parameters,only the concentration ratio of molybdate to cobalt ions （[MoO4^2-]/[Co^2＋]） was varied to analyze its influence on the mechanism of induced cobalt-molybdenum codeposition. Voltammetry was one of the main techniques,which was used to examine the voltammetric response,revealing that cobalt-molybdenum codeposition depended on the nature of the species in solution. To correlate the type of the film to the electrochemical response,various cobalt-molybdenum alloy thin films obtained from different [MoO4^2-]/[Co^2＋] solutions were tested. Crack-free homogeneous films could be easily obtained from the low molybdate concentrations （[MoO4^2-]/[Co^2＋]≈0.05） applying low deposition potentials. Moreover,the content of molybdenum up to 30wt% could be obtained from high molybdate concentration; in this case,the films showed cracks. The formation of these cracked films could be predicted from the observed distortions in the curves of electric current-time （j-t） deposition transients. The films with amorphous structure were obtained. The hysteresis loops suggested that the easily magnetized axis was parallel to the surface of the films. A saturation magnetization of 137 emu·g^-1 and a coercivity of 87 Oe of the film were obtained when the deposition potential was -1025mV,and [ MoO4^2-]/[Co^2＋] was 0.05 in solution,which exhibited a nicer soft-magnetic response.
