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Direct Tunneling Effect in Metal-Semiconductor Contacts Simulated with Monte Carlo Method 被引量:2
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作者 孙雷 杜刚 +1 位作者 刘晓彦 韩汝琦 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第11期1364-1368,共5页
Considering the tunneling effect and the Schottky effect,the metal semiconductor contact is simulated by using self consistent ensemble Monte Carlo method.Under different biases or at different barrier heights,the i... Considering the tunneling effect and the Schottky effect,the metal semiconductor contact is simulated by using self consistent ensemble Monte Carlo method.Under different biases or at different barrier heights,the investigation into the tunneling current indicates that the tunneling effect is of great importance under reverse biases.The Schottky barrier diode current due to Schottky effect is in agreement with the theoretical one.The barrier lowering is found a profound effect on the current transport at the metal semiconductor interface. 展开更多
关键词 monte carlo device simulation metal semiconductor contact direct tunneling Schottky effect
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Comparison of band-to-band tunneling models in Si and Si–Ge junctions
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作者 矫亦朋 魏康亮 +2 位作者 王泰寰 杜刚 刘晓彦 《Journal of Semiconductors》 EI CAS CSCD 2013年第9期6-10,共5页
We compared several different band-to-band tunneling (BTBT) models with both Sentaurus and the two-dimensional full-band Monte Carlo simulator in Si homo-junctions and Si-Ge hetero-junctions. It was shown that in Si... We compared several different band-to-band tunneling (BTBT) models with both Sentaurus and the two-dimensional full-band Monte Carlo simulator in Si homo-junctions and Si-Ge hetero-junctions. It was shown that in Si homo-junctions, different models could achieve similar results. However, in the Si-Ge hetero-junctions, there were significant differences among these models at high reverse biases (over 2 V). Compared to the nonlocal model, the local models in Sentaurus underrated the BTBT rate distinctly, and the Monte Carlo method was shown to give a better approximation. Additionally, it was found that in the Si region near the interface of the Si-Ge hetero-junctions, the direct tunneling rates increased largely due to the interaction of the band structures of Si and Ge. 展开更多
关键词 hetero-structure monte carlo device simulation carrier transport band-to-band tunneling
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