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Up-to-date issues and strategies for developing nanometrology standards
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作者 Yan FANG1, Xinju Yang2 Zhanghai Chen2 1 Zhong Shan Hospital,Fudan University, Shanghai XuHui Region 200032 136 Yi Xue Yuan Road 2 Fudan University, Shanghai YangPu Region 200433 220 Han Dan Road 《生物物理学报》 CAS CSCD 北大核心 2009年第S1期171-172,共2页
Unbroken chain of traceability is currently unsettled issues for developing national/ international nanometer scale metrology standards. The present paper will address
关键词 nanometrology Methods STANDARDS TRACEABILITY
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Towards Quantitative Characterisation of the Small Force Transducer Used in Nanoindentation Instruments
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作者 Zhi Li Uwe Brand 《Modern Instrumentation》 2013年第4期61-67,共7页
Quantitative characterization of the mechanical properties of materials in micro-/nano-scale using depth-sensing indentation technique demands high performance of nanoindentation instruments in use. In this paper, the... Quantitative characterization of the mechanical properties of materials in micro-/nano-scale using depth-sensing indentation technique demands high performance of nanoindentation instruments in use. In this paper, the efforts to calibrate the capacitive force transducer of a commercial nanoindentation instrument are presented, where the quasi-static characteristic of the force transducer has been calibrated by a precise compensation balance with a resolution of ~1 nN. To investigate the dynamic response of the transducer, an electrostatic MEMS (Micro-Electro-Mechanical System) based on nano-force transfer standard with nano-Newton (10-9 Newton) resolution and a bandwidth up to 6 kHz have been employed. Preliminary experimental results indicate that 1) the force transducer under calibration has a probing force uncertainty less than 300 nN (1σ) in the calibration range of 1 mN;2) the transient duration at contact points amounts to 10 seconds;3) the overshoot of engagement is pre-load dependent. 展开更多
关键词 nanometrology NANOINDENTATION Instrument Nano-Force TRANSDUCER Microelectromechanical Systems Nano-Force Calibration
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Correction of Interferometric High-Order Nonlinearity Error in Metrological Atomic Force Microscopy
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作者 Gaoliang Dai Xiukun Hu 《Nanomanufacturing and Metrology》 EI 2022年第4期412-422,共11页
Metrological atomic force microscopes(Met.AFMs)with built-in interferometers are one of the main workhorses for versatile dimensional nanometrology.The interferometric nonlinearity error,particularly the high-order(i.... Metrological atomic force microscopes(Met.AFMs)with built-in interferometers are one of the main workhorses for versatile dimensional nanometrology.The interferometric nonlinearity error,particularly the high-order(i.e.,3rd-and 4th-order)nonlinearity errors,is a dominant error source for further improving their metrology performance,which cannot be corrected using the conventional Heydemann correction method.To solve this problem,two new methods were developed.One uses a capacitive sensor embedded in the Met.AFM,and the other applies an external physical artifact with a flat surface.Both methods can be applied very conveniently and can effectively reduce the nonlinearity error.In this paper,the propagation of the(residual)nonlinearity error in step height calibrations is examined.Finally,the performance of the improved tool is verified in the calibration of a highly demanding industrial sample.For the measurements performed at 25 different positions and repeated six times,the standard deviation of the total 150 measured values is 0.08 nm,which includes the contributions from the reproducibility of the metrology tool and sample inhomogeneity.This research has significantly improved our dimensional nanometrology service.For instance,the extended measurement uncertainty(k=2)is reduced from 1.0 to 0.3 nm for the step height or etching depth calibrations. 展开更多
关键词 Dimensional nanometrology Traceable calibration Metrological atomic force microscopy INTERFEROMETRY Nonlinearity error Step height
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