Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorpho...Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorphous to crystalline state. The film thickness was measured with a-stylus surface profiler, the structure and the compositions of the films were confirmed by low angle X-ray diffraction and scanning auger electron microprobe respectively, and the surface topography was characterized by scanning electron microscope and scanning probe microscope. Electrical property of the films was measured by fourpoint probe. The experimental results illustrate that the combined processes of ion beam sputtering and rajid thermal process are effective for fabrication nanoscale Ni-Cr alloy thin film with good properties.展开更多
Thin film thermocouples（TFTCs） can provide fast and accurate surface temperature measurement with minimal impact on the physical characteristics of the supporting components. In this study, NiCr and NiSi films were ...Thin film thermocouples（TFTCs） can provide fast and accurate surface temperature measurement with minimal impact on the physical characteristics of the supporting components. In this study, NiCr and NiSi films were prepared with radio frequency（RF） magnetron sputtering and the influences of vacuum annealing on the resistivity of the films were investigated. Afterward, NiCr-NiSi films were deposited on Ni-based superalloy substrates to form TFTCs. The overall dimension of the thermocouple is 64 mm in length, 8 mm in width and 30 lm in thickness. Compared with those of as-deposited sample, the thermoelectric property and stability of the TFTC are significantly improved by vacuum annealing of NiCr and NiSi films. The variation of the Seebeck coefficient of TFTC was discussed based on the size effect of NiCr and NiSi films. And a lower Seebeck coefficient of TFTC of 38.4 μV·℃^-1 is obtained.展开更多
基金the National Natural Science Foundation of China(No.60371046)
文摘Nanoscale thick amorphous Ni-Cr alloy thin films were fabricated by low-energy ion beam sputtering technology; then the as-deposited samples experienced rapid thermal process to realize the transformation from amorphous to crystalline state. The film thickness was measured with a-stylus surface profiler, the structure and the compositions of the films were confirmed by low angle X-ray diffraction and scanning auger electron microprobe respectively, and the surface topography was characterized by scanning electron microscope and scanning probe microscope. Electrical property of the films was measured by fourpoint probe. The experimental results illustrate that the combined processes of ion beam sputtering and rajid thermal process are effective for fabrication nanoscale Ni-Cr alloy thin film with good properties.
基金financially supported by the National Natural Science Foundation of China (No.61223002)Sichuan Youth Science and Technology Innovation Research Team Funding (No.2011JTD0006)Program for Cooperation of Industry, Education and Academy of Guangdong Province, China (No.2013B090400001)
文摘Thin film thermocouples（TFTCs） can provide fast and accurate surface temperature measurement with minimal impact on the physical characteristics of the supporting components. In this study, NiCr and NiSi films were prepared with radio frequency（RF） magnetron sputtering and the influences of vacuum annealing on the resistivity of the films were investigated. Afterward, NiCr-NiSi films were deposited on Ni-based superalloy substrates to form TFTCs. The overall dimension of the thermocouple is 64 mm in length, 8 mm in width and 30 lm in thickness. Compared with those of as-deposited sample, the thermoelectric property and stability of the TFTC are significantly improved by vacuum annealing of NiCr and NiSi films. The variation of the Seebeck coefficient of TFTC was discussed based on the size effect of NiCr and NiSi films. And a lower Seebeck coefficient of TFTC of 38.4 μV·℃^-1 is obtained.
基金Supported by National Science Funds for Creative Research Groups of China(61421002)National Natural Science Foundation of China(61405027)+1 种基金the Postdoctoral Science Foundation of China(2014M562296)Fundamental Research Funds for the Central Universities(ZYGX2011X012)
